Patents by Inventor Matsuo Nakashima

Matsuo Nakashima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Novel ester compounds polymers, resist compositions and patterning process
    Publication number: 20030198891
    Abstract: An ester compound of the following formula (1) is provided.
    Type: Application
    Filed: March 19, 2003
    Publication date: October 23, 2003
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Koji Hasegawa, Tsunehiro Nishi, Takeshi Kinsho, Takeru Watanabe, Matsuo Nakashima, Seiichiro Tachibana, Jun Hatakeyama
  • Novel lactone compounds having alicyclic structure and their manufacturing method
    Publication number: 20020016477
    Abstract: Lactone compounds of formula (1) are novel and useful as monomers to form base resins for use in chemically amplified resist compositions adapted for micropatterning lithography.
    Type: Application
    Filed: July 5, 2001
    Publication date: February 7, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takeshi Kinsho, Takeru Watanabe, Koji Hasegawa, Tsunehiro Nishi, Matsuo Nakashima, Seiichiro Tachibana, Jun Hatakeyama
  • Novel ester compounds, polymers, resist compositions and patterning process
    Publication number: 20020004178
    Abstract: An ester compound of the following formula (1) is provided.
    Type: Application
    Filed: April 19, 2001
    Publication date: January 10, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Koji Hasegawa, Tsunehiro Nishi, Takeshi Kinsho, Takeru Watanabe, Matsuo Nakashima, Seiichiro Tachibana, Jun Hatakeyama
  • Styrene derivatives
    Patent number: 6333436
    Abstract: Styrene derivatives of formula (1) are novel wherein R1 is H, F, C1-20 alkyl or fluorinated C1-20 alkyl, R2 in cis or trans conformation is F, C1-20 alkyl or fluorinated C1-20 alkyl, R3 is a phenol protecting group, p, q and r are integers in the range of 0≦p<5, 0≦q<5, 0<r<5, and 0≦p+q<5. Polymers obtained by polymerizing the styrene derivatives are useful as the base polymer of resist compositions.
    Type: Grant
    Filed: October 12, 2000
    Date of Patent: December 25, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Matsuo Nakashima, Jun Hatakeyama, Jun Watanabe, Yuji Harada