Patents by Inventor Matt F. Vernon

Matt F. Vernon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Continuous sloped phase edge architecture fabrication technique using electron or optical beam blur for single phase shift mask ret
    Patent number: 7695872
    Abstract: A phase shift mask may include boundaries between phase shift regions with continuous sloped phase edges. The continuous sloped phase edges may be produced by introducing a predetermined degree of defocus into a beam used during production of the mask to image the pattern on the mask. Such a phase shift mask may be “trimless”, i.e., not require a corresponding binary “trim” mask for a second exposure to remove phase conflicts after exposure with the phase shift mask.
    Type: Grant
    Filed: August 20, 2007
    Date of Patent: April 13, 2010
    Assignee: Intel Corporation
    Inventors: Matt F. Vernon, Wen-Hao Cheng
  • Continuous sloped phase edge architecture fabrication technique using electron or optical beam blur for single phase shift mask ret
    Patent number: 7282306
    Abstract: A phase shift mask may include boundaries between phase shift regions with continuous sloped phase edges. The continuous sloped phase edges may be produced by introducing a predetermined degree of defocus into a beam used during production of the mask to image the pattern on the mask. Such a phase shift mask may be “trimless”, i.e., not require a corresponding binary “trim” mask for a second exposure to remove phase conflicts after exposure with the phase shift mask.
    Type: Grant
    Filed: March 26, 2004
    Date of Patent: October 16, 2007
    Assignee: Intel Corporation
    Inventors: Matt F. Vernon, Wen-Hao Cheng