Patents by Inventor Matt Pinnow

Matt Pinnow has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Topcoat material and use thereof in immersion lithography processes
    Patent number: 7521172
    Abstract: Disclosed is a topcoat composition comprising a polymer having a dissolution rate of at least 1500 ?/second in an aqueous alkaline developer, and at least one solvent. The topcoat composition can be used to coat a photoresist layer on a material layer on a substrate, for example, a semiconductor chip. Also disclosed is a method of forming a pattern in the material layer of the coated substrate.
    Type: Grant
    Filed: April 28, 2006
    Date of Patent: April 21, 2009
    Assignee: International Business Machines Corporation
    Inventors: Robert Allen David, Phillip Joe Brock, Sean David Burns, Dario Leonardo Goldfarb, David Medeiros, Dirk Pfeiffer, Matt Pinnow, Ratnam Sooriyakumaran, Linda Karin Sundberg
  • TOPCOAT MATERIAL AND USE THEREOF IN IMMERSION LITHOGRAPHY PROCESSES
    Publication number: 20070254237
    Abstract: Disclosed is a topcoat composition comprising a polymer having a dissolution rate of at least 1500 ?/second in an aqueous alkaline developer, and at least one solvent. The topcoat composition can be used to coat a photoresist layer on a material layer on a substrate, for example, a semiconductor chip. Also disclosed is a method of forming a pattern in the material layer of the coated substrate.
    Type: Application
    Filed: April 28, 2006
    Publication date: November 1, 2007
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: ROBERT ALLEN, PHILLIP BROCK, SEAN BURNS, DARIO GOLDFARB, DAVID MEDEIROS, DIRK PFEIFFER, MATT PINNOW, RATNAM SOORIYAKUMARAN, LINDA SUNDBERG