Patents by Inventor Matthew A. Gallelli

Matthew A. Gallelli has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multi-disk chemical mechanical polishing pad conditioners and methods
    Patent number: 9308623
    Abstract: A pad conditioner may include multiple independently mounted conditioning elements configured to condition a polishing pad used in, e.g., a chemical mechanical polishing (CMP) process. In some embodiments, the pad conditioner may include a main assembly disk and a main assembly base plate attached to the main assembly disk via a gimbal connection. A plurality of pad conditioner assemblies may be attached to the main assembly base plate. In some embodiments, each pad conditioner assembly may include a pad conditioner disk attached to the main assembly base plate, a pad conditioner base attached to the pad conditioner disk via a gimbal connection, and a conditioning element attached to the pad conditioner base. Methods of conditioning a polishing pad are also provided, as are other aspects.
    Type: Grant
    Filed: April 18, 2014
    Date of Patent: April 12, 2016
    Assignee: Applied Materials, Inc.
    Inventors: Hung Chen, Shou-Sung Chang, Jason Garcheung Fung, Matthew A. Gallelli, Paul D. Butterfield, Kevin Chou
  • MULTI-DISK CHEMICAL MECHANICAL POLISHING PAD CONDITIONERS AND METHODS
    Publication number: 20140315473
    Abstract: A pad conditioner may include multiple independently mounted conditioning elements configured to condition a polishing pad used in, e.g., a chemical mechanical polishing (CMP) process. In some embodiments, the pad conditioner may include a main assembly disk and a main assembly base plate attached to the main assembly disk via a gimbal connection. A plurality of pad conditioner assemblies may be attached to the main assembly base plate. In some embodiments, each pad conditioner assembly may include a pad conditioner disk attached to the main assembly base plate, a pad conditioner base attached to the pad conditioner disk via a gimbal connection, and a conditioning element attached to the pad conditioner base. Methods of conditioning a polishing pad are also provided, as are other aspects.
    Type: Application
    Filed: April 18, 2014
    Publication date: October 23, 2014
    Inventors: Hung Chen, Shou-Sung Chang, Jason Garcheung Fung, Matthew A. Gallelli, Paul D. Butterfield, Kevin Chou