Patents by Inventor Matthew C. Putman
Matthew C. Putman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240241957Abstract: A simulated process is initiated. The simulated process includes generating, by an emulator, a control signal based on external inputs. The simulated process further includes processing, by a simulator, the control signal to generate simulated response data. The simulated process further includes generating, by a deep learning processor, expected behavioral pattern data based on the simulated response data. An actual process is initiated by initializing setpoints for a process station in a manufacturing system. The actual process includes generating, by the deep learning processor, actual behavioral pattern data based on actual process data from the at least one process station. The deep learning processor compares the expected behavioral pattern to the actual behavioral pattern. Based on the comparing, the deep learning processor determines that anomalous activity is present in the manufacturing system. Based on the anomalous activity being present, the deep learning processor initiates an alert protocol.Type: ApplicationFiled: March 29, 2024Publication date: July 18, 2024Applicant: Nanotronics Imaging, Inc.Inventors: John B. Putman, Joanna Lee, Matthew C. Putman
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Patent number: 12038743Abstract: Aspects of the disclosed technology encompass the use of a deep learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving a plurality of control values from two or more stations, at a deep learning controller, wherein the control values are generated at the two or more stations deployed in a manufacturing process, predicting an expected value for an intermediate or final output of an article of manufacture, based on the control values, and determining if the predicted expected value for the article of manufacture is in-specification. In some aspects, the process can further include steps for generating control inputs if the predicted expected value for the article of manufacture is not in-specification. Systems and computer-readable media are also provided.Type: GrantFiled: June 5, 2023Date of Patent: July 16, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
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Patent number: 12039750Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to dynamically adjust processing parameters of each step of the multi-step manufacturing process to achieve a desired final quality metric for the component.Type: GrantFiled: March 9, 2021Date of Patent: July 16, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Andrew Sundstrom, Aswin Raghav Nirmaleswaran, Eun-Sol Kim
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Patent number: 12039040Abstract: A manufacturing system is disclosed herein. The manufacturing system includes one or more stations, a monitoring platform, and a control module. Each station of the one or more stations is configured to perform at least one step in a multi-step manufacturing process for a component. The monitoring platform is configured to monitor progression of the component throughout the multi-step manufacturing process. The control module is configured to detect a cyberattack to the manufacturing system. The control module is configured to perform operations. The operations include receiving control values for a first station of the one or more stations. The operations further include determining that there is a cyberattack based on the control values for the first station using one or more machine learning algorithms. The operations further include generating an alert to cease processing of the component. In some embodiments, the operations further include correcting errors caused by the cyberattack.Type: GrantFiled: November 20, 2020Date of Patent: July 16, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom
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Patent number: 12036363Abstract: A positive airway pressure device includes a blower, a chamber, a sensor, and a controller. The controller is configured to perform operations. The operations include determining a baseline respiratory response for a patient. The operations further include initializing the blower to deliver a therapy pressure to the patient. The operations further include receiving, from the sensor, real-time respiratory response data while delivering therapy to the patient. The operations further include analyzing the real-time respiratory response data to determine whether a sleep disruption has occurred by comparing the real-time respiratory response data to the baseline respiratory response for the patient. The operations further include, based on the analyzing, determining that a sleep disruption has occurred based on an anomaly detected in the real-time respiratory response data. The operations further include, based on the determining, initiating an action to account for the sleep disruption.Type: GrantFiled: April 22, 2022Date of Patent: July 16, 2024Assignee: Nanotronics Health, LLC.Inventors: John B. Putman, Matthew C. Putman, Julie A. Orlando
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Patent number: 12032365Abstract: Aspects of the disclosed technology encompass the use of a deep-learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving control values associated with a process station in a manufacturing process, predicting an expected value for an article of manufacture output from the process station, and determining if the deep-learning controller can control the manufacturing process based on the expected value. Systems and computer-readable media are also provided.Type: GrantFiled: July 24, 2023Date of Patent: July 9, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
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Patent number: 12029851Abstract: A positive airway pressure device is disclosed herein. The positive airway pressure device includes a blower, a buffer chamber, a gas manifold, a first sensor, a second sensor, and a controller. The buffer chamber is downstream of the blower. The buffer chamber configured to receive gas generated by the blower and output the gas to a patient. The gas manifold is fluidly coupling the blower to the buffer chamber. The first sensor is at least partially disposed in the gas manifold. The first sensor is configured to measure a first pressure in the gas manifold. The second sensor is at least partially disposed in the buffer chamber. The second sensor is configured to measure a second sensor in the buffer chamber.Type: GrantFiled: June 12, 2023Date of Patent: July 9, 2024Assignee: Nanotronics Health, LLC.Inventors: John B. Putman, Matthew C. Putman, Julie A. Orlando
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Patent number: 12034742Abstract: A system including a deep learning processor obtains response data of at least two data types from a set of process stations performing operations as part of a manufacturing process. The system analyzes factory operation and control data to generate expected behavioral pattern data. Further, the system uses the response data to generate actual behavior pattern data for the process stations. Based on an analysis of the actual behavior pattern data in relation to the expected behavioral pattern data, the system determines whether anomalous activity has occurred as a result of the manufacturing process. If it is determined that anomalous activity has occurred, the system provides an indication of this anomalous activity.Type: GrantFiled: June 23, 2021Date of Patent: July 9, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Patent number: 12026251Abstract: A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.Type: GrantFiled: June 28, 2023Date of Patent: July 2, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Patent number: 11995802Abstract: An inspection apparatus includes a specimen stage, one or more imaging devices and a set of lights, all controllable by a control system. By translating or rotating the one or more imaging devices or specimen stage, the inspection apparatus can capture a first image of the specimen that includes a first imaging artifact to a first side of a reference point and then capture a second image of the specimen that includes a second imaging artifact to a second side of the reference point. The first and second imaging artifacts can be cropped from the first image and the second image respectively, and the first image and the second image can be digitally stitched together to generate a composite image of the specimen that lacks the first and second imaging artifacts.Type: GrantFiled: May 26, 2023Date of Patent: May 28, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, John Moffitt, Michael Moskie, Jeffrey Andresen, Scott Pozzi-Loyola, Julie Orlando
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Patent number: 11989288Abstract: A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.Type: GrantFiled: June 28, 2023Date of Patent: May 21, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge, Andrew Sundstrom, James Williams, III
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Publication number: 20240160002Abstract: A method and system for mapping fluid objects on a substrate using a microscope inspection system that includes a light source, imaging device, stage for moving a substrate disposed on the stage, and a control module. A computer analysis system includes an object identification module that identifies for each of the objects on the substrate, an object position on the substrate including a set of X, Y, and ? coordinates using algorithms, networks, machines and systems including artificial intelligence and image processing algorithms. At least one of the objects is fluid and has shifted from a prior position or deformed from a prior size.Type: ApplicationFiled: November 13, 2023Publication date: May 16, 2024Inventors: Matthew C. Putman, John B. Putman, John Cruickshank, Julie Orlando, Adele Frankel, Brandon Scott
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Patent number: 11961210Abstract: An inspection apparatus includes a specimen stage configured to retain a specimen, at least three imaging devices arranged in a triangular array positioned above the specimen stage, each of the at least three imaging devices configured to capture an image of the specimen, one or more sets of lights positioned between the specimen stage and the at least three imaging devices, and a control system in communication with the at least three imaging devices.Type: GrantFiled: February 27, 2023Date of Patent: April 16, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Jonathan Lee, Damas Limoge, Matthew C. Putman, John B. Putman, Michael Moskie
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Patent number: 11953863Abstract: A training set that includes at least two data types corresponding to operations and control of a manufacturing process is obtained. A deep learning processor is trained to predict expected characteristics of output control signals that correspond with one or more corresponding input operating instructions. A first input operating instruction is received from a first signal splitter. A first output control signal is received from a second signal splitter. The deep learning processor correlates the first input operating instruction and the first output control signal. Based on the correlating, the deep learning processor determines that the first output control signal is not within a range of expected values based on the first input operating instruction. Responsive to the determining, an indication of an anomalous activity is provided as a result of detection of the anomalous activity in the manufacturing process.Type: GrantFiled: June 5, 2023Date of Patent: April 9, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Jonathan Lee, Damas Limoge
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Patent number: 11953893Abstract: Aspects of the disclosed technology encompass the use of a deep learning controller for monitoring and improving a manufacturing process. In some aspects, a method of the disclosed technology includes steps for: receiving a plurality of control values from two or more stations, at a deep learning controller, wherein the control values are generated at the two or more stations deployed in a manufacturing process, predicting an expected value for an intermediate or final output of an article of manufacture, based on the control values, and determining if the predicted expected value for the article of manufacture is in-specification. In some aspects, the process can further include steps for generating control inputs if the predicted expected value for the article of manufacture is not in-specification. Systems and computer-readable media are also provided.Type: GrantFiled: June 5, 2023Date of Patent: April 9, 2024Assignee: Nanotronics Imaging, Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Damas Limoge
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Patent number: 11955686Abstract: A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.Type: GrantFiled: June 28, 2023Date of Patent: April 9, 2024Assignee: Nanotronics Imaging, Inc.Inventors: John B. Putman, Matthew C. Putman, Damas Limoge, Michael Moskie, Jonathan Lee
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Patent number: 11947671Abstract: A simulated process is initiated. The simulated process includes generating, by an emulator, a control signal based on external inputs. The simulated process further includes processing, by a simulator, the control signal to generate simulated response data. The simulated process further includes generating, by a deep learning processor, expected behavioral pattern data based on the simulated response data. An actual process is initiated by initializing setpoints for a process station in a manufacturing system. The actual process includes generating, by the deep learning processor, actual behavioral pattern data based on actual process data from the at least one process station. The deep learning processor compares the expected behavioral pattern to the actual behavioral pattern. Based on the comparing, the deep learning processor determines that anomalous activity is present in the manufacturing system. Based on the anomalous activity being present, the deep learning processor initiates an alert protocol.Type: GrantFiled: June 5, 2023Date of Patent: April 2, 2024Assignee: Nanotronics Imaging, Inc.Inventors: John B. Putman, Jonathan Lee, Matthew C. Putman
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Patent number: 11948270Abstract: Systems, methods, and computer-readable media for feedback on and improving the accuracy of super-resolution imaging. In some embodiments, a low resolution image of a specimen can be obtained using a low resolution objective of a microscopy inspection system. A super-resolution image of at least a portion of the specimen can be generated from the low resolution image of the specimen using a super-resolution image simulation. Subsequently, an accuracy assessment of the super-resolution image can be identified based on one or more degrees of equivalence between the super-resolution image and one or more actually scanned high resolution images of at least a portion of one or more related specimens identified using a simulated image classifier. Based on the accuracy assessment of the super-resolution image, it can be determined whether to further process the super-resolution image. The super-resolution image can be further processed if it is determined to further process the super-resolution image.Type: GrantFiled: August 31, 2023Date of Patent: April 2, 2024Assignee: Nanotronics Imaging , Inc.Inventors: Matthew C. Putman, John B. Putman, Vadim Pinskiy, Joseph R. Succar
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Patent number: 11894596Abstract: A system is disclosed herein. The system includes a splitter board. The splitter board includes a microprocessor, a converter, and a bypass relay. The converter includes analog-to-digital circuitry and digital-to-analog circuitry. The bypass relay is configurable between a first state and a second state. In the first state, the bypass relay is configured to direct an input signal to the converter. The converter converts the input signal to a converted input signal and splits the converted input signal into a first portion and a second portion. The first portion is directed to the microprocessor. The second portion is directed to an output port of the splitter board for downstream processes. In the second state, the bypass relay is configured to cause the input signal to bypass the converter. The bypass relay directs the input signal to the output port of the splitter board for the downstream processes.Type: GrantFiled: August 7, 2023Date of Patent: February 6, 2024Assignee: Nanotronics Imaging, Inc.Inventors: John B. Putman, Matthew C. Putman, Damas Limoge, Michael Moskie, Jonathan Lee
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Patent number: D1027508Type: GrantFiled: December 14, 2021Date of Patent: May 21, 2024Inventors: Matthew C. Putman, Valerie Rose Putman