Patents by Inventor Matthew Colbum

Matthew Colbum has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • High resolution overlay alignment systems for imprint lithography
    Publication number: 20040086793
    Abstract: A method of determining and correcting alignment during imprint lithography process is described. During an imprint lithographic process the template may be aligned with the substrate by the use of alignment marks disposed on both the template and substrate. The alignment may be determined and corrected for before the layer is processed.
    Type: Application
    Filed: May 27, 2003
    Publication date: May 6, 2004
    Applicant: University of Texas System Board of Regents, UT System
    Inventors: S. V. Sreenivasan, Byung J. Choi, Matthew Colbum, Todd Bailey