Abstract: Techniques are provided herein to form semiconductor devices that include gate cuts with different widths (e.g., at least a 1.5× difference in width) but substantially the same height (e.g., less than 5 nm difference in height). A given gate structure extending over one or more semiconductor regions may be interrupted with any number of gate cuts that each extend through an entire thickness of the gate structure. According to some embodiments, gate cuts of a similar first width are formed via a first etching process while gate cuts of a similar second width that is greater than the first width are formed via a second etching process that is different from the first etching process. Using different etch processes for gate cuts of different widths maintains a similar height for the gate cuts of different widths.

Abstract: Techniques are provided herein to form semiconductor devices that include a gate cut formed after the formation of source/drain contacts. In an example, a semiconductor device includes a gate structure around or otherwise on a semiconductor region that extends from a source region to a drain region. Conductive contacts formed over the source and drain regions along a source/drain trench. The gate structure may be interrupted with a dielectric gate cut that further extends past the gate trench and into the source/drain trench where it can cut into one or more of the contacts. The contacts are formed before the gate cut to ensure complete fill of conductive material when forming the contacts. Accordingly, a liner structure on the conductive contacts is also broken by the intrusion of the gate cut and does not extend further up or down the sidewalls of the gate cut.

Abstract: Techniques are provided herein to form semiconductor devices that include one or more gate cuts having a very high aspect ratio (e.g., an aspect ratio of 5:1 or greater, such as 10:1). In an example, a semiconductor device includes a conductive material that is part of a transistor gate structure around or otherwise on a semiconductor region. The semiconductor region can be, for example, a fin of semiconductor material that extends between a source region and a drain region, or one or more nanowires or nanoribbons of semiconductor material that extend between a source region and a drain region. The gate structure may be interrupted between two transistors with a gate cut that extends through an entire thickness of the gate structure. A particular plasma etching process may be performed to form the gate cut with a very high height-to-width aspect ratio so as to enable densely integrated devices.

Abstract: Techniques are provided to form semiconductor devices that include one or more gate cuts having a layer of polymer material at edges of the gate cut. The polymer layer may be provided as a byproduct of the etching process used to form the gate cut recess through the gate structure, and can protect any exposed portions of the source or drain regions from certain subsequent processes. The gate structure may be interrupted between two transistors with a gate cut that extends through an entire thickness of the gate structure and includes a dielectric material to electrically isolate the portions of the gate structure on either side of the gate cut. The edges of the gate cut may be lined with a polymer layer that is also on any exposed portions of the source or drain regions that were exposed during the etching process used to form the gate cut recess.

Abstract: Techniques are described to form semiconductor devices that include one or more gate cuts having a very high aspect ratio (e.g., an aspect ratio of 5:1 or greater). A semiconductor device includes a conductive material that is part of a transistor gate structure around or otherwise on a semiconductor region. The gate structure may be interrupted between two transistors with a gate cut that extends through an entire thickness of the gate structure. A plasma etching process may be performed to form the gate cut with a very high height-to-width aspect ratio with little to no tapering in its sidewall profile, so as to enable densely integrated devices. Furthermore, an etching process may be performed on a gate masking structure used to pattern the location of the gate cuts to ensure that the gate masking structure has low sidewall taper and sufficiently opened enough to expose the underlying gate.

Abstract: A system, apparatus and method directed to a magnetizer. The magnetizer can include a housing and one or more magnets positioned in an interior of the housing. The housing can include a top face, a bottom face, and a plurality of side faces adjoining the top face and the bottom face. The top face can include a first opening configured to receive a needle, the first opening having a first cross-sectional area. One of the plurality of side faces can include a second opening having a second cross-sectional area. The second cross-sectional area can be at least one third of the first cross-sectional area.

Abstract: Techniques are provided herein to form an integrated circuit having a grating pattern of gate cut structures such that a gate cut structure extends between the gate layers of adjacent semiconductor devices and between the source or drain regions (e.g., epitaxial regions) of the adjacent semiconductor devices. In an example, neighboring semiconductor devices each include a semiconductor region extending between a source region and a drain region, and a gate structure extending over the semiconductor regions of the neighboring semiconductor devices. In some such examples, a gate cut structure is present between each pair of neighboring semiconductor devices thus interrupting the gate structure and isolating the gate electrode of one semiconductor device from the gate electrode of the other semiconductor device. The gate cut structure further extends to separate the source or drain regions of the neighboring semiconductor devices.

Abstract: An ultrasound imaging system includes an ultrasound probe designed to produce an ultrasound image including one or more blood vessels below a skin surface of a patient, and a console with a display. The console is operably coupled to the ultrasound probe. The console includes a memory including instructions capable of causing a processor to determine a depth of the user selected blood vessel and a selection of medical devices based on a user selection including one or both of a minimum dwell length and an angle of insertion. The processor can be configured to determine these parameters prior to insertion of a user selected medical device into a user selected blood vessel from the one or more blood vessels below the skin surface of the patient. The display depicts the ultrasound image, the user selected blood vessel, and the user selected medical device.

Abstract: Disclosed herein is a system, apparatus and method directed to a magnetizer comprising at least one magnet; and a housing, the housing comprising: a top face; a bottom face positioned on an opposite side of the housing from the top face; a plurality of faces adjoining the top face and the bottom face; an interior comprising an interior surface formed at least in part by the top face, the bottom face and the plurality of faces; wherein the top face includes a first opening configured to receive a medical device; and wherein the at least one magnet is positioned within the interior of the housing. A face of the plurality of faces may include a second opening to expose at least a portion of the interior surface through the second opening. The second opening may be larger than the first opening.

Abstract: Disclosed herein is an ultrasound system for accessing a vasculature of a patient. The ultrasound system is configured to depict an enhanced ultrasound image of a subcutaneous portion of the patient including an icon surrounding a target vessel depicted on the display. The icon indicates to a clinician the target vessel is within range of a percentage vessel occupancy or vessel purchase length depending on a size of cannula or angle of insertion. The icon can also indicate blood flow strength, vessel type, or vessel deformation. The enhanced image can further include cannula trajectory guidelines and visual alerts for the clinician if the cannula tip can potentially backwall the vessel. Additional icons can indicate obstructions disposed on the cannula trajectory.

Abstract: Embodiments of the present disclosure describe techniques and configurations to reduce transistor gate short defects. In one embodiment, a method includes forming a plurality of lines, wherein individual lines of the plurality of lines comprise a gate electrode material, depositing an electrically insulative material to fill regions between the individual lines and subsequent to depositing the electrically insulative material, removing a portion of at least one of the individual lines to isolate gate electrode material of a first transistor device from gate electrode material of a second transistor device. Other embodiments may be described and/or claimed.

Abstract: Disclosed herein is an ultrasound system for accessing a vasculature of a patient. The ultrasound system is configured to depict an enhanced ultrasound image of a subcutaneous portion of the patient including an icon surrounding a target vessel depicted on the display. The icon indicates to a clinician the target vessel is within range of a percentage vessel occupancy or vessel purchase length depending on a size of cannula or angle of insertion. The icon can also indicate blood flow strength, vessel type, or vessel deformation. The enhanced image can further include cannula trajectory guidelines and visual alerts for the clinician if the cannula tip can potentially backwall the vessel. Additional icons can indicate obstructions disposed on the cannula trajectory.

Abstract: Embodiments of the present disclosure describe techniques and configurations to reduce transistor gate short defects. In one embodiment, a method includes forming a plurality of lines, wherein individual lines of the plurality of lines comprise a gate electrode material, depositing an electrically insulative material to fill regions between the individual lines and subsequent to depositing the electrically insulative material, removing a portion of at least one of the individual lines to isolate gate electrode material of a first transistor device from gate electrode material of a second transistor device. Other embodiments may be described and/or claimed.

Abstract: An ultrasound probe is disclosed including a body (102), a lens included on head portion (44) of the body, a stabilizing portion (146) extending from the body and configured to stabilize the body on a skin surface of a patient without user assistance, and a finger-grip portion (110) configured to enable a user of the ultrasound probe to grasp and maneuver the ultrasound probe during use thereof with no more than two or three fingers on a single hand of the user. The ultrasound probe may further include a cable conduit (194) and a cable boot (195) configured to house a distal-end portion of a power-and-data cable and to keep the cable away from the head portion. The stabilizing portion may include a latitudinal channel (147) that reduces a surface area of the stabilizing portion intended to face the skin surface of the patient, in order to facilitate movement of the ultrasound probe across the skin surface and to reduce suction hen gel is present and the ultrasound probe is removed from the patient.

Abstract: An ultrasound probe (“probe”) for use with an ultrasound imaging system is disclosed. In particular, the probe is sized and configured so as to be supported and readily used with as little as one finger on a single hand of a user of the imaging system. This configuration enables remaining fingers on the hand of the user to be employed for other purposes, such as skin traction and patient contact. In one embodiment, therefore, an ultrasound probe is disclosed, comprising a body, a lens included on head portion of the body, a stabilizing portion extending from the body and configured to stabilize the body on a skin surface of a patient without user assistance, and a finger grip portion configured to enable a user of the probe to grasp and maneuver the probe during use thereof with no more than two fingers on a single hand of the user.

Abstract: A magnetizing system for use in selectively magnetizing a needle of a medical device is disclosed. Once magnetized, the needle can be tracked by a needle guidance system, which assists the clinician placing the needle by visualizing on a display the position and orientation of the needle after its insertion into a body of a patient. An orientation key system is included with the magnetizing system to ensure the needle is positioned correctly in the magnetizing system. This in turn ensures that the needle is properly magnetized so as to be accurately tracked by the needle guidance system. In one embodiment a first key is included with the magnetizing system and configured to cooperatively mate with a second key included with the needle of the medical device. Various types of keys are disclosed herein.

Abstract: Embodiments disclosed herein are directed to a vessel assessment system configured to image a target vessel and determine which vascular access device (VAD) to use to access the target vessel while remaining within one or more insertion parameters of percentage vessel occupancy, and dwell length given a predetermined range of insertion angles. The system can superimpose a target vessel sizing ring to measure a diameter or cross-sectional area, or to measure a depth of the target vessel. Further, the system can provide a list of VAD's that can access the target vessel within one or more insertion parameters. The system can provide an icon representing the VAD superimposed over the target vessel to provide a visual representation of the vascular access device within the target vessel.

Abstract: Disclosed herein is a system, apparatus and method directed to stabilizing a rollstand for an ultrasound system. The system, apparatus and method pertain to a rollstand comprising a base, an off-center vertical support, and an overhanging support for an ultrasound display of the ultrasound system. The off-center vertical support rises vertically from the base and is offset horizontally from a centroid of the base. A center of gravity of the rollstand may be located above the centroid of the base and above a vascular site of a patient being imaged by the ultrasound system. The overhanging support may be offset horizontally from the centroid of the base in a direction substantially opposite the off-center vertical support.

Abstract: Embodiments of the present disclosure describe techniques and configurations to reduce transistor gate short defects. In one embodiment, a method includes forming a plurality of lines, wherein individual lines of the plurality of lines comprise a gate electrode material, depositing an electrically insulative material to fill regions between the individual lines and subsequent to depositing the electrically insulative material, removing a portion of at least one of the individual lines to isolate gate electrode material of a first transistor device from gate electrode material of a second transistor device. Other embodiments may be described and/or claimed.

Abstract: An ultrasound probe (“probe”) for use with an ultrasound imaging system is disclosed. In particular, the probe is sized and configured so as to be supported and readily used with as little as one finger on a single hand of a user of the imaging system. This configuration enables remaining fingers on the hand of the user to be employed for other purposes, such as skin traction and patient contact. In one embodiment, therefore, an ultrasound probe is disclosed, comprising a body, a lens included on head portion of the body, a stabilizing portion extending from the body and configured to stabilize the body on a skin surface of a patient without user assistance, and a finger grip portion configured to enable a user of the probe to grasp and maneuver the probe during use thereof with no more than two fingers on a single hand of the user.