Abstract: A plasma processing chamber for depositing a film on an underside surface of a wafer, includes a showerhead pedestal. The showerhead pedestal includes a first zone and a second zone. The first zone is configured for depositing a first film to the underside surface of the wafer and the second zone is configured for depositing a second film to the underside surface of the wafer.

Abstract: Systems, devices, and methods for collimating a neutron beam to specified deliverable formats having targeted beam diameters and direction are described. Examples of a neutron collimator assembly can include numerous components based on location, function, dimension, and/or constituent material. The components can include, neutron beam collimators, a beam stop, a mounting assembly, electro-mechanical actuators, an electronic controller, a safety interlock system, a moveable radiation shield, a safety cover, and an adjustable patient platform. In addition, examples of variable aperture neutron beam collimators such as nested neutron beam collimators and collimators with a diaphragm iris are described. Materials are also described.

Abstract: A plasma processing chamber for depositing a film on an underside surface of a wafer, includes showerhead pedestal. The showerhead pedestal includes a first zone and a second zone. An upper separator fin is disposed over a top surface of the showerhead pedestal and a lower separator fin is disposed under the top surface of the showerhead pedestal and aligned with the upper separator fin. The first zone is configured for depositing a first film to the underside surface of the wafer and the second zone is configured for depositing a second film to the underside surface of the wafer. In another embodiment, a top surface of the showerhead pedestal may be configured to receive a masking plate instead of the upper separator fin. The masking plate is configured with a first area that has openings and a second area that is masked. The first areas is used to provide the process gas to a portion of the underside surface of the wafer for depositing a film.

Abstract: The present invention relates to compounds that inhibit KRas G12C. In particular, the present invention relates to compounds that irreversibly inhibit the activity of KRas G12C, pharmaceutical compositions comprising the compounds and methods of use therefor.

Abstract: The present invention relates to indoline-based compounds that inhibit Rho-associated protein kinase (ROCK) activity. In particular, the present invention relates to compounds, pharmaceutical compositions and methods of use, such as methods of inhibiting ROCK activity and methods for treating, for example cerebral cavernous malformation syndrome (CCM) and cardiovascular diseases using the compounds and pharmaceutical compositions of the present invention.

Abstract: The present invention relates to a process for dehalogenation of a halogenated hydrocarbon comprising: desorbing a halogenated hydrocarbon from a solid phase using a solvent; and dehalogenating the halogenated hydrocarbon in a solvent which comprises the solvent used in the desorption step.