Abstract: An overhead arm assembly for a patient support apparatus includes a user interface device. The user interface device has a support structure for supporting a personal digital assistant and a charging port for personal digital assistant.

Abstract: A copolymer comprises the polymerized product of a dissolution-rate controlling monomer having the formula (I), an acyclic vinyl ether monomer of the formula (II), and a cyclic vinyl ether monomer of the formula (III): wherein Ra, Rb, Rc, L, X, and Z1 are defined herein. A photoresist composition comprising the copolymer is described, as is an article coated with the photoresist composition, and a method of forming an electronic device using the photoresist composition.

Abstract: Processes for the production of chlorinated propenes are provided. The processes proceed through the production of cyclic intermediate that is thereafter readily converted to a desired chloropropane, e.g., via selective pyrolysis. The process may be conducted using starting materials that are readily commercially available and/or that may be reacted safely in standard laboratory equipment so that capital cost savings may be seen. The process does not require the use of catalysts and yet, process conditions less extreme than many conventional processes for the production of chlorinated propenes are suitable, so that raw material and utility cost savings are also possible.

Abstract: Polymers containing a unit having a particular acetal moiety and photoresist compositions containing such a polymer. Substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, photoresist compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.

Abstract: Processes for the production of chlorinated propenes are provided. The processes proceed through the production of cyclic intermediate that is thereafter readily converted to a desired chloropropane, e.g., via selective pyrolysis. The process may be conducted using starting materials that are readily commercially available and/or that may be reacted safely in standard laboratory equipment so that capital cost savings may be seen. The process does not require the use of catalysts and yet, process conditions less extreme than many conventional processes for the production of chlorinated propenes are suitable, so that raw material and utility cost savings are also possible.

Abstract: A copolymer comprises the polymerized product of a dissolution-rate controlling monomer having the formula (I), an acyclic vinyl ether monomer of the formula (II), and a cyclic vinyl ether monomer of the formula (III): wherein Ra, Rb, Rc, L, X, and Z1 are defined herein. A photoresist composition comprising the copolymer is described, as is an article coated with the photoresist composition, and a method of forming an electronic device using the photoresist composition.

Abstract: The invention provides a film comprising at least two layers, Layer A and Layer B, and wherein Layer(A) is formed from a Composition A comprising at least one compound selected from Formula A: wherein Np is selected from 1-naphthyl or 2-naphthyl, and wherein each R is described herein; and wherein Layer B is formed from a Composition B comprising at least one “HTL compound;” and wherein Layer A is not adjacent to Layer B. The invention also provides a composition comprising at least one compound selected from Formula A: wherein each R is described herein, and wherein the compound has a Tg greater than, or equal to, 115° C.

Abstract: Provided are polymers containing a unit having a particular acetal moiety and photoresist compositions containing such a polymer. Also provided are substrates coated with the photoresist compositions and methods of forming photolithographic patterns. The polymers, photoresist compositions, methods and coated substrates find particular applicability in the manufacture of semiconductor devices.