Patents by Inventor Matthew MaMoody

Matthew MaMoody has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Multiple anode plasma for CVD in a hollow article
    Patent number: 10297425
    Abstract: A method and apparatus for plasma enhanced chemical vapor deposition to an interior region of a hollow, tubular, high aspect ratio workpiece are disclosed. A plurality of anodes are disposed in axially spaced apart arrangement, to the interior of the workpiece. A process gas is introduced into the region. A respective individualized DC or pulsed DC bias is applied to each of the anodes. The bias excites the process gas into a plasma. The workpiece is biased in a hollow cathode arrangement. Pressure is controlled in the interior region to maintain the plasma. An elongated support tube arranges the anodes, and receives a process gas tube. A current splitter provides a respective selected proportion of a total current to each anode. One or more notch diffusers or chamber diffusers may diffuse the process gas or a plasma moderating gas. Plasma impedance and distribution may be controlled using various means.
    Type: Grant
    Filed: April 17, 2014
    Date of Patent: May 21, 2019
    Assignee: SUB-ONE TECHNOLOGY, LLC.
    Inventors: Deepak Upadhyaya, Karthik Boinapally, William J. Boardman, Matthew MaMoody, Thomas B. Casserly, Pankaj Jyoti Hazarika, Duc Doan
  • MULTIPLE ANODE PLASMA FOR CVD IN A HOLLOW ARTICLE
    Publication number: 20140227464
    Abstract: A method and apparatus for plasma enhanced chemical vapor deposition to an interior region of a hollow, tubular, high aspect ratio workpiece are disclosed. A plurality of anodes are disposed in axially spaced apart arrangement, to the interior of the workpiece. A process gas is introduced into the region. A respective individualized DC or pulsed DC bias is applied to each of the anodes. The bias excites the process gas into a plasma. The workpiece is biased in a hollow cathode arrangement. Pressure is controlled in the interior region to maintain the plasma. An elongated support tube arranges the anodes, and receives a process gas tube. A current splitter provides a respective selected proportion of a total current to each anode. One or more notch diffusers or chamber diffusers may diffuse the process gas or a plasma moderating gas. Plasma impedance and distribution may be controlled using various means.
    Type: Application
    Filed: April 17, 2014
    Publication date: August 14, 2014
    Applicant: Sub-One Technology, Inc.
    Inventors: Deepak Upadhyaya, Karthik Boinapally, William J. Boardman, Matthew MaMoody, Thomas B. Casserly, Pankaj Jyoti Hazarika, Duc Doan
  • Chemical vapor deposition for an interior of a hollow article with high aspect ratio
    Patent number: 8715789
    Abstract: A method and apparatus for plasma enhanced chemical vapor deposition to an interior region of a hollow, tubular, high aspect ratio workpiece are disclosed. A plurality of anodes are disposed in axially spaced apart arrangement, to the interior of the workpiece. A process gas is introduced into the region. A respective individualized DC or pulsed DC bias is applied to each of the anodes. The bias excites the process gas into a plasma. The workpiece is biased in a hollow cathode arrangement. Pressure is controlled in the interior region to maintain the plasma. An elongated support tube arranges the anodes, and receives a process gas tube. A current splitter provides a respective selected proportion of a total current to each anode. One or more notch diffusers or chamber diffusers may diffuse the process gas or a plasma moderating gas. Plasma impedance and distribution may be controlled using various means.
    Type: Grant
    Filed: December 16, 2010
    Date of Patent: May 6, 2014
    Assignee: Sub-One Technology, Inc.
    Inventors: Deepak Upadhyaya, Karthik Boinapally, William J. Boardman, Matthew MaMoody, Thomas B. Casserly, Pankaj Jyoti Hazarika, Duc Doan
  • CHEMICAL VAPOR DEPOSITION FOR AN INTERIOR OF A HOLLOW ARTICLE WITH HIGH ASPECT RATIO
    Publication number: 20110151141
    Abstract: A method and apparatus for plasma enhanced chemical vapor deposition to an interior region of a hollow, tubular, high aspect ratio workpiece are disclosed. A plurality of anodes are disposed in axially spaced apart arrangement, to the interior of the workpiece. A process gas is introduced into the region. A respective individualized DC or pulsed DC bias is applied to each of the anodes. The bias excites the process gas into a plasma. The workpiece is biased in a hollow cathode arrangement. Pressure is controlled in the interior region to maintain the plasma. An elongated support tube arranges the anodes, and receives a process gas tube. A current splitter provides a respective selected proportion of a total current to each anode. One or more notch diffusers or chamber diffusers may diffuse the process gas or a plasma moderating gas. Plasma impedance and distribution may be controlled using various means.
    Type: Application
    Filed: December 16, 2010
    Publication date: June 23, 2011
    Applicant: SUB-ONE TECHNOLOGY, INC.
    Inventors: Deepak Upadhyaya, Karthik Boinapally, William J. Boardman, Matthew MaMoody, Thomas B. Casserly, Pankaj Jyoti Hazarika, Duc Doan