Patents by Inventor Matthew P. McClellan

Matthew P. McClellan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9012337
    Abstract: A system and method for maintain a desired degree of platen flatness is disclosed. A laser system is used to measure the flatness of a platen. The temperature of the platen is then varied to achieve the desired level of flatness. In some embodiments, this laser system is only used during a set up period and the resulting desired temperature is then used during normal operation. In other embodiments, a laser system is used to measure the flatness of the platen, even while the workpiece is being processed.
    Type: Grant
    Filed: October 11, 2011
    Date of Patent: April 21, 2015
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Shengwu Chang, Joseph C. Olson, Frank Sinclair, Matthew P. McClellan, Antonella Cucchetti
  • Patent number: 8663331
    Abstract: A transforaminal lumbar interbody fusion (TLIF) implant to be placed in an intervertebral space includes a front member and a back member. The front member includes a first end having a hinge, a second end, a pair of lateral portions, a top wall and a bottom wall, an opening configured through the pair of lateral portions and a plurality of openings in each of the top wall and the bottom wall. The back member includes a first end having an arcuately-shaped attachment head comprising a receptor dimensioned and configured to accommodate the hinge of the front member, a second end, a pair of lateral portions, a top wall, a bottom wall and an opening configured through the pair of lateral portions. The top wall and the bottom wall of the back member further comprise a plurality of openings.
    Type: Grant
    Filed: November 30, 2007
    Date of Patent: March 4, 2014
    Assignee: Custom Spine, Inc.
    Inventors: John W. McClellan, III, Matthew P. McClellan
  • Patent number: 8330125
    Abstract: A beam line ion implanter includes an ion source configured to generate an ion beam, a scanner configured to scan the ion beam to produce a scanned ion beam having trajectories which diverge from a scan origin, and a focusing element having a focusing field positioned upstream of the scanner configured to focus the ion beam to a focal point at the scan origin. A method of ion beam tuning includes generating an ion beam, focusing the ion beam to a focal point positioned at a scan origin, and scanning the ion beam to produce a scanned ion beam having trajectories which diverge from the scan origin.
    Type: Grant
    Filed: September 21, 2010
    Date of Patent: December 11, 2012
    Assignee: Varian Semiconductor Equipment Associates, Inc.
    Inventors: Shengwu Chang, Joseph C. Olson, Frank Sinclair, Matthew P. McClellan
  • Publication number: 20120088035
    Abstract: A system and method for maintain a desired degree of platen flatness is disclosed. A laser system is used to measure the flatness of a platen. The temperature of the platen is then varied to achieve the desired level of flatness. In some embodiments, this laser system is only used during a set up period and the resulting desired temperature is then used during normal operation. In other embodiments, a laser system is used to measure the flatness of the platen, even while the workpiece is being processed.
    Type: Application
    Filed: October 11, 2011
    Publication date: April 12, 2012
    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.
    Inventors: Shengwu Chang, Joseph C. Olson, Frank Sinclair, Matthew P. McClellan, Antonella Cucchetti
  • Publication number: 20120068081
    Abstract: A beam line ion implanter includes an ion source configured to generate an ion beam, a scanner configured to scan the ion beam to produce a scanned ion beam having trajectories which diverge from a scan origin, and a focusing element having a focusing field positioned upstream of the scanner configured to focus the ion beam to a focal point at the scan origin. A method of ion beam tuning includes generating an ion beam, focusing the ion beam to a focal point positioned at a scan origin, and scanning the ion beam to produce a scanned ion beam having trajectories which diverge from the scan origin.
    Type: Application
    Filed: September 21, 2010
    Publication date: March 22, 2012
    Applicant: VARIAN SEMICONDUCTOR EQUIPMENT ASSOCISTES, INC.
    Inventors: Shengwu Chang, Joseph C. Olson, Frank Sinclair, Matthew P. McClellan
  • Publication number: 20090143859
    Abstract: A transforaminal lumbar interbody fusion (TLIF) implant to be placed in an intervertebral space includes a front member and a back member. The front member includes a first end having a hinge, a second end, a pair of lateral portions, a top wall and a bottom wall, an opening configured through the pair of lateral portions and a plurality of openings in each of the top wall and the bottom wall. The back member includes a first end having an arcuately-shaped attachment head comprising a receptor dimensioned and configured to accommodate the hinge of the front member, a second end, a pair of lateral portions, a top wall, a bottom wall and an opening configured through the pair of lateral portions. The top wall and the bottom wall of the back member further comprise a plurality of openings.
    Type: Application
    Filed: November 30, 2007
    Publication date: June 4, 2009
    Inventors: John W. McClellan, III, Matthew P. McClellan