Abstract: A display device comprises a waveguide configured to guide light in a lateral direction parallel to an output surface of the waveguide. The waveguide is further configured to outcouple the guided light through the output surface. The display device additionally comprises a broadband adaptive lens assembly configured to incouple and to diffract therethrough the outcoupled light from the waveguide. The broadband adaptive lens assembly comprises a first waveplate lens comprising a liquid crystal (LC) layer arranged such that the waveplate lens has birefringence (?n) that varies in a radially outward direction from a central region of the first waveplate lens and configured to diffract the outcoupled light at a diffraction efficiency greater than 90% within a wavelength range including at least 450 nm to 630 nm. The broadband adaptive lens assembly is configured to be selectively switched between a plurality of states having different optical powers.

Abstract: A display device includes a waveguide assembly comprising a waveguide configured to outcouple light out of a major surface of the waveguide to form an image in the eyes of a user. An adaptive lens assembly has a major surface facing the output surface and a waveplate lens and a switchable waveplate assembly. The switchable waveplate assembly includes quarter-wave plates on opposing sides of a switchable liquid crystal layer, and electrodes on the quarter-wave plates in the volume between the quarter-wave plates. The electrodes can selectively establish an electric field and may serve as an alignment structure for molecules of the liquid crystal layer. Portions of the adaptive lens assembly may be manufactured by roll-to-roll processing in which a substrate roll is unwound, and alignment layers and liquid crystal layers are formed on the substrate as it moves towards a second roller, to be wound on that second roller.

Abstract: In some embodiments, a head-mounted, near-eye display system comprises a stack of waveguides having integral spacers separating the waveguides. The waveguides may each include diffractive optical elements that are formed simultaneously with the spacers by imprinting. The spacers are disposed on one major surface of each of the waveguides and indentations are provided on an opposite major surface of each of the waveguides. The indentations are sized and positioned to align with the spacers, thereby forming a self-aligned stack of waveguides. Tops of the spacers may be provided with light scattering features, anti-reflective coatings, and/or light absorbing adhesive to prevent light leakage between the waveguides. As seen in a top-down view, the spacers may be elongated along the same axis as the diffractive optical elements. The waveguides may include structures (e.g.

Abstract: An imprint lithography system includes: a first chuck configured to support a first substrate; a first bushing surrounding the first chuck and configured to pneumatically suspend the first chuck laterally within the first bushing; one or more supportive mechanisms disposed beneath the first chuck and configured to support the first chuck vertically within the first bushing, wherein the first chuck is configured to be forced in a downward direction against first vertical resistive forces provided by the one or more supportive mechanisms, while the first chuck is suspended laterally within the first bushing and while the first chuck is maintained in the first fixed rotational orientation.

Abstract: An example system for molding a photocurable material into a planar object includes a first mold structure having a first mold surface, a second mold structure having a second mold surface, and one or more protrusions disposed along at least one of the first mold surface or the second mold surface. During operation, the system is configured to position the first and second mold structures such that the first and second mold surfaces face each other with the one or more protrusions contacting the opposite mold surface, and a volume having a total thickness variation (TTV) of 500 nm or less is defined between the first and second mold surfaces. The system is further configured to receive the photocurable material in the volume, and direct radiation at the one or more wavelengths into the volume.

Abstract: A wear indicator system may include a switch assembly having a housing, a wear indicator circuit, and an actuator assembly. The housing may connect to a collector shoe assembly having a collector shoe that slides in contact along a conductor bar of a conductor bar assembly, for transferring electrical power between the collector shoe and the conductor bar. The wear indicator circuit may include a communication unit and a switch unit. The actuator assembly may be operably coupled to the housing and to the switch unit and may track along the conductor bar assembly when the collector shoe assembly moves and may contact the conductor bar assembly to depress to a position to activate the switch unit responsive to the collector shoe reaching a designated wear level. The communication unit may communicate a signal indicative of the designated wear level responsive to the switch unit being activated.

Abstract: An example system for molding a photocurable material into a planar object includes a first mold structure having a first mold surface, a second mold structure having a second mold surface, and one or more protrusions disposed along at least one of the first mold surface or the second mold surface. During operation, the system is configured to position the first and second mold structures such that the first and second mold surfaces face each other with the one or more protrusions contacting the opposite mold surface, and a volume having a total thickness variation (TTV) of 500 nm or less is defined between the first and second mold surfaces. The system is further configured to receive the photocurable material in the volume, and direct radiation at the one or more wavelengths into the volume.

Abstract: Systems and methods for managing multi-objective alignments in imprinting (e.g., single-sided or double-sided) are provided. An example system includes rollers for moving a template roll, a stage for holding a substrate, a dispenser for dispensing resist on the substrate, a light source for curing the resist to form an imprint on the substrate when a template of the template roll is pressed into the resist on the substrate, a first inspection system for registering a fiducial mark of the template to determine a template offset, a second inspection system for registering the imprint on the substrate to determine a wafer registration offset between a target location and an actual location of the imprint, and a controller for controlling to move the substrate with the resist below the template based on the template offset, and determine an overlay bias of the imprint on the substrate based on the wafer registration offset.

Abstract: A heat exchanger includes a first manifold, aa second manifold, at least one heat exchange tube segment extending between and fluidly coupling the first manifold and the second manifold, and a fin having a non-linear configuration. A portion of the fin is affixed to an adjacent surface of the at least one heat exchange tube segment via a braze joint. The braze joint has a length, measured parallel to a length of the at least one heat exchange tube segment, less than or equal to 650 micrometers.

Abstract: In an example method of forming an optical film for an eyepiece, a curable material is dispensed into a space between a first and a second mold surface. A position of the first mold surface relative to the second mold surface is measured using a plurality of sensors. Each sensor measures a respective relative distance along a respective measurement axis between a respective point on a planar portion of the first mold surface and a respective point on a planar portion of the second mold surface. The measurement axes are parallel to each other, and the points define corresponding triangles on the first and second mold surfaces, respectively. The position of the first mold surface is adjusted relative to the second mold surface based on the measured position, and the curable material is cured to form the optical film.

Abstract: An imprint lithography system includes: a first chuck configured to support a first substrate; a first bushing surrounding the first chuck and configured to pneumatically suspend the first chuck laterally within the first bushing; one or more supportive mechanisms disposed beneath the first chuck and configured to support the first chuck vertically within the first bushing, wherein the first chuck is configured to be forced in a downward direction against first vertical resistive forces provided by the one or more supportive mechanisms, while the first chuck is suspended laterally within the first bushing and while the first chuck is maintained in the first fixed rotational orientation.

Abstract: An imprint lithography method for positioning substrates includes supporting first and second substrates respectively atop first and second chucks, pneumatically suspending the first and second chucks laterally within first and second bushings, supporting the first and second chucks vertically within the first and second bushings, maintaining the first and second chucks respectively in first and second fixed rotational orientations, and forcing the first and second chucks in a downward direction independently of each other respectively against first and second vertical resistive forces until first and second top surfaces of the first and second substrates are coplanar, while maintaining the first and second chucks suspended laterally within the first and second bushings and while maintaining the first and second chucks in the first and second fixed rotational orientations.

Abstract: In some examples, a method includes downloading, from an application provider, a patch to be applied to a first application element and a stripped version of the application that does not include one or more application elements to be reused during installation of the application, decompressing the first application element to generate a decompressed version of the first application element, and decompressing the patch to generate a decompressed version of the patch. The method may also include applying the decompressed version of the patch to the decompressed version of the first application element to generate a patched application element, compressing the patched application element to generate a compressed patched application element, and installing the application using the compressed patched application element, the stripped version of the application, and the one or more application elements other than the first application element.

Abstract: A method and system of activating a fan for an air conditioning system is disclosed. Upon the sensing of rain in the proximity of the air conditioning system, such as a condenser, a fan is activated. The fan is configured to drive air and rain through the condenser. The fan can be configured to operate periodically or for a pre-set amount of time while rain is being sensed.

Abstract: In some examples, a method includes downloading, from an application provider, a patch to be applied to a first application element and a stripped version of the application that does not include one or more application elements to be reused during installation of the application, decompressing the first application element to generate a decompressed version of the first application element, and decompressing the patch to generate a decompressed version of the patch. The method may also include applying the decompressed version of the patch to the decompressed version of the first application element to generate a patched application element, compressing the patched application element to generate a compressed patched application element, and installing the application using the compressed patched application element, the stripped version of the application, and the one or more application elements other than the first application element.

Abstract: An example system for molding a photocurable material into a planar object includes a first mold structure having a first mold surface, a second mold structure having a second mold surface, and one or more protrusions disposed along at least one of the first mold surface or the second mold surface. During operation, the system is configured to position the first and second mold structures such that the first and second mold surfaces face each other with the one or more protrusions contacting the opposite mold surface, and a volume having a total thickness variation (TTV) of 500 nm or less is defined between the first and second mold surfaces. The system is further configured to receive the photocurable material in the volume, and direct radiation at the one or more wavelengths into the volume.

Abstract: A display device comprises a waveguide configured to guide light in a lateral direction parallel to an output surface of the waveguide. The waveguide is further configured to outcouple the guided light through the output surface. The display device additionally comprises a broadband adaptive lens assembly configured to incouple and to diffract therethrough the outcoupled light from the waveguide. The broadband adaptive lens assembly comprises a first waveplate lens comprising a liquid crystal (LC) layer arranged such that the waveplate lens has birefringence (?n) that varies in a radially outward direction from a central region of the first waveplate lens and configured to diffract the outcoupled light at a diffraction efficiency greater than 90% within a wavelength range including at least 450 nm to 630 nm. The broadband adaptive lens assembly is configured to be selectively switched between a plurality of states having different optical powers.

Abstract: In some examples, a method includes downloading, from an application provider, a patch to be applied to a first application element and a stripped version of the application that does not include one or more application elements to be reused during installation of the application, decompressing the first application element to generate a decompressed version of the first application element, and decompressing the patch to generate a decompressed version of the patch. The method may also include applying the decompressed version of the patch to the decompressed version of the first application element to generate a patched application element, compressing the patched application element to generate a compressed patched application element, and installing the application using the compressed patched application element, the stripped version of the application, and the one or more application elements other than the first application element.

Abstract: In an example method of forming a waveguide film, a photocurable material is dispensed into a space between a first mold portion and a second mold portion opposite the first mold portion. Further, a relative separation between a surface of the first mold portion with respect to a surface of the second mold portion opposing the surface of the first mold portion is adjusted. The photocurable material in the space is irradiated with radiation suitable for photocuring the photocurable material to form a cured waveguide film. Concurrent to irradiating the photocurable material, the relative separation between the surface of the first mold portion and the surface of the second mold portion is varied and/or an intensity of the radiation irradiating the photocurable material is varied.

Abstract: An example system for molding a photocurable material into a planar object includes a first mold structure having a first mold surface, a second mold structure having a second mold surface, and one or more protrusions disposed along at least one of the first mold surface or the second mold surface. During operation, the system is configured to position the first and second mold structures such that the first and second mold surfaces face each other with the one or more protrusions contacting the opposite mold surface, and a volume having a total thickness variation (TTV) of 500 nm or less is defined between the first and second mold surfaces. The system is further configured to receive the photocurable material in the volume, and direct radiation at the one or more wavelengths into the volume.