Patents by Inventor Matthew Peter Dobson

Matthew Peter Dobson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of implanting a substrate and an ion implanter for performing the method
    Patent number: 7611975
    Abstract: An implanter provides two-dimensional scanning of a substrate relative to an implant beam so that the beam draws a raster of scan lines on the substrate. The beam current is measured at turnaround points off the substrate and the current value is used to control the subsequent fast scan speed so as to compensate for the effect of any variation in beam current on dose uniformity in the slow scan direction. The scanning may produce a raster of non-intersecting uniformly spaced parallel scan lines and the spacing between the lines is selected to ensure appropriate dose uniformity.
    Type: Grant
    Filed: September 27, 2006
    Date of Patent: November 3, 2009
    Assignee: Applied Materials, Inc.
    Inventors: Adrian Murrell, Peter Michael Banks, Matthew Peter Dobson, Peter Kindersley, Takao Sakase, Marvin Farley, Shu Satoh, Geoffrey Ryding
  • Ion sources for ion implantation apparatus
    Patent number: 6818909
    Abstract: The invention relates to an ion source for an ion implanter in which source material for providing desired ions is provided in the form of a plate or liner which can be fitted into the reactant chamber of the ion source.
    Type: Grant
    Filed: November 7, 2003
    Date of Patent: November 16, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Adrian Murrell, Peter Michael Banks, Andrew Allen, Neil L. Clarke, Matthew Peter Dobson
  • Ion sources for ion implantation apparatus
    Publication number: 20040144932
    Abstract: The invention relates to an ion source for an ion implanter in which source material for providing desired ions is provided in the form of a plate or liner which can be fitted into the reactant chamber of the ion source.
    Type: Application
    Filed: November 7, 2003
    Publication date: July 29, 2004
    Inventors: Adrian Murrell, Peter Michael Banks, Andrew Allen, Neil L. Clarke, Matthew Peter Dobson
  • Ion sources for ion implantation apparatus
    Patent number: 6686601
    Abstract: The invention relates to an ion source for an ion implanter in which source material for providing desired ions is provided in the form of a plate or liner which can be fitted into the reactant chamber of the ion source.
    Type: Grant
    Filed: December 2, 2002
    Date of Patent: February 3, 2004
    Assignee: Applied Materials, Inc.
    Inventors: Adrian Murrell, Peter Michael Banks, Andrew Allen, Neil L. Clarke, Matthew Peter Dobson
  • Ion sources for ion implantation apparatus
    Publication number: 20030122089
    Abstract: The invention relates to an ion source for an ion implanter in which source material for providing desired ions is provided in the form of a plate or liner which can be fitted into the reactant chamber of the ion source.
    Type: Application
    Filed: December 2, 2002
    Publication date: July 3, 2003
    Inventors: Adrian Murrell, Peter Michael Banks, Andrew Allen, Neil L. Clarke, Matthew Peter Dobson