Patents by Inventor Matthew S. Shafran
Matthew S. Shafran has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230296993Abstract: Systems and methods for managing multi-objective alignments in imprinting (e.g., single-sided or double-sided) are provided. An example system includes rollers for moving a template roll, a stage for holding a substrate, a dispenser for dispensing resist on the substrate, a light source for curing the resist to form an imprint on the substrate when a template of the template roll is pressed into the resist on the substrate, a first inspection system for registering a fiducial mark of the template to determine a template offset, a second inspection system for registering the imprint on the substrate to determine a wafer registration offset between a target location and an actual location of the imprint, and a controller for controlling to move the substrate with the resist below the template based on the template offset, and determine an overlay bias of the imprint on the substrate based on the wafer registration offset.Type: ApplicationFiled: August 6, 2021Publication date: September 21, 2023Inventors: Jeremy Lee SEVIER, Satish SADAM, Joseph Michael IMHOF, Kang LUO, Kangkang WANG, Roy Matthew PATTERSON, Qizhen XUE, Brett William BEST, Charles Scott CARDEN, Matthew S. SHAFRAN, Michael Nevin MILLER
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Patent number: 11679533Abstract: In an example method of forming an optical film for an eyepiece, a curable material is dispensed into a space between a first and a second mold surface. A position of the first mold surface relative to the second mold surface is measured using a plurality of sensors. Each sensor measures a respective relative distance along a respective measurement axis between a respective point on a planar portion of the first mold surface and a respective point on a planar portion of the second mold surface. The measurement axes are parallel to each other, and the points define corresponding triangles on the first and second mold surfaces, respectively. The position of the first mold surface is adjusted relative to the second mold surface based on the measured position, and the curable material is cured to form the optical film.Type: GrantFiled: March 12, 2021Date of Patent: June 20, 2023Assignee: Magic Leap, Inc.Inventors: Jeremy Lee Sevier, Matthew S. Shafran, Satish Sadam, Roy Matthew Patterson, Kangkang Wang, Chieh Chang, Charles Scott Carden
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Publication number: 20230036098Abstract: Systems, apparatus, and methods for double-sided imprinting are provided. An example system includes first rollers for moving a first web including a first template having a first imprinting feature, second rollers for moving a second web including a second template having a second imprinting feature, dispensers for dispensing resist, a locating system for locating reference marks on the first and second webs for aligning the first and second templates, a light source for curing the resist, such that a cured first resist has a first imprinted feature corresponding to the first imprinting feature on one side of the substrate and a cured second resist has a second imprinted feature corresponding to the second imprinting feature on the other side of the substrate, and a moving system for feeding in the substrate between the first and second templates and unloading the double-imprinted substrate from the first and second webs.Type: ApplicationFiled: October 6, 2022Publication date: February 2, 2023Inventors: Roy Patterson, Charles Scott Carden, Satish Sadam, Ryan Christiansen, Matthew S. Shafran, Christopher John Fleckenstein, Vikramjit Singh, Michael Nevin Miller, Kang LUO
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Patent number: 11498261Abstract: Systems, apparatus, and methods for double-sided imprinting are provided. An example system includes first rollers for moving a first web including a first template having a first imprinting feature, second rollers for moving a second web including a second template having a second imprinting feature, dispensers for dispensing resist, a locating system for locating reference marks on the first and second webs for aligning the first and second templates, a light source for curing the resist, such that a cured first resist has a first imprinted feature corresponding to the first imprinting feature on one side of the substrate and a cured second resist has a second imprinted feature corresponding to the second imprinting feature on the other side of the substrate, and a moving system for feeding in the substrate between the first and second templates and unloading the double-imprinted substrate from the first and second webs.Type: GrantFiled: January 20, 2021Date of Patent: November 15, 2022Assignee: Magic Leap, Inc.Inventors: Roy Patterson, Charles Scott Carden, Satish Sadam, Ryan Christiansen, Matthew S. Shafran, Christopher John Fleckenstein, Vikramjit Singh, Michael Nevin Miller, Kang Luo
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Patent number: 11320591Abstract: In an example method of forming a waveguide film, a photocurable material is dispensed into a space between a first mold portion and a second mold portion opposite the first mold portion. Further, a relative separation between a surface of the first mold portion with respect to a surface of the second mold portion opposing the surface of the first mold portion is adjusted. The photocurable material in the space is irradiated with radiation suitable for photocuring the photocurable material to form a cured waveguide film. Concurrent to irradiating the photocurable material, the relative separation between the surface of the first mold portion and the surface of the second mold portion is varied and/or an intensity of the radiation irradiating the photocurable material is varied.Type: GrantFiled: May 17, 2021Date of Patent: May 3, 2022Assignee: Magic Leap, Inc.Inventors: Chieh Chang, Christophe Peroz, Sharad D. Bhagat, Michael Anthony Klug, Charles Scott Carden, Roy Matthew Patterson, Matthew S. Shafran
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Patent number: 11298856Abstract: An example system is configured to photocure a photocurable material to form a polymer film. The system includes a first chuck configured to support a first substantially planar mold, a second chuck configured to support a second substantially planar mold, and an actuable stage coupled to the first chuck and/or the second chuck. The actuable stage is configured to position the first chuck and/or the second chuck so that the first and second molds are separated by a gap. The system also includes a sensor arrangement for obtaining measurement information indicative of a distance between the first and second molds and/or a pressure between the first and second chucks at each of at least three locations. The system also includes a control module configured control the gap between the first and second molds based on the measurement information.Type: GrantFiled: March 15, 2018Date of Patent: April 12, 2022Assignee: Molecular Imprints, Inc.Inventors: Chieh Chang, Christophe Peroz, Roy Matthew Patterson, Matthew S. Shafran, Christopher John Fleckenstein, Charles Scott Carden
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Publication number: 20210283806Abstract: In an example method of forming an optical film for an eyepiece, a curable material is dispensed into a space between a first and a second mold surface. A position of the first mold surface relative to the second mold surface is measured using a plurality of sensors. Each sensor measures a respective relative distance along a respective measurement axis between a respective point on a planar portion of the first mold surface and a respective point on a planar portion of the second mold surface. The measurement axes are parallel to each other, and the points define corresponding triangles on the first and second mold surfaces, respectively. The position of the first mold surface is adjusted relative to the second mold surface based on the measured position, and the curable material is cured to form the optical film.Type: ApplicationFiled: March 12, 2021Publication date: September 16, 2021Inventors: Jeremy Lee Sevier, Matthew S. Shafran, Satish Sadam, Roy Matthew Patterson, Kangkang Wang, Chieh Chang, Charles Scott Carden
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Publication number: 20210271025Abstract: In an example method of forming a waveguide film, a photocurable material is dispensed into a space between a first mold portion and a second mold portion opposite the first mold portion. Further, a relative separation between a surface of the first mold portion with respect to a surface of the second mold portion opposing the surface of the first mold portion is adjusted. The photocurable material in the space is irradiated with radiation suitable for photocuring the photocurable material to form a cured waveguide film. Concurrent to irradiating the photocurable material, the relative separation between the surface of the first mold portion and the surface of the second mold portion is varied and/or an intensity of the radiation irradiating the photocurable material is varied.Type: ApplicationFiled: May 17, 2021Publication date: September 2, 2021Inventors: Chieh Chang, Christophe Peroz, Sharad D. Bhagat, Michael Anthony Klug, Charles Scott Carden, Roy Matthew Patterson, Matthew S. Shafran
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Publication number: 20210170668Abstract: Systems, apparatus, and methods for double-sided imprinting are provided. An example system includes first rollers for moving a first web including a first template having a first imprinting feature, second rollers for moving a second web including a second template having a second imprinting feature, dispensers for dispensing resist, a locating system for locating reference marks on the first and second webs for aligning the first and second templates, a light source for curing the resist, such that a cured first resist has a first imprinted feature corresponding to the first imprinting feature on one side of the substrate and a cured second resist has a second imprinted feature corresponding to the second imprinting feature on the other side of the substrate, and a moving system for feeding in the substrate between the first and second templates and unloading the double-imprinted substrate from the first and second webs.Type: ApplicationFiled: January 20, 2021Publication date: June 10, 2021Inventors: Roy Patterson, Charles Scott Carden, Satish Sadam, Ryan Christiansen, Matthew S. Shafran, Christopher John Fleckenstein, Vikramjit Singh, Michael Nevin Miller, Kang Luo
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Patent number: 11009661Abstract: In an example method of forming a waveguide film, a photocurable material is dispensed into a space between a first mold portion and a second mold portion opposite the first mold portion. Further, a relative separation between a surface of the first mold portion with respect to a surface of the second mold portion opposing the surface of the first mold portion is adjusted. The photocurable material in the space is irradiated with radiation suitable for photocuring the photocurable material to form a cured waveguide film. Concurrent to irradiating the photocurable material, the relative separation between the surface of the first mold portion and the surface of the second mold portion is varied and/or an intensity of the radiation irradiating the photocurable material is varied.Type: GrantFiled: October 16, 2019Date of Patent: May 18, 2021Assignee: Magic Leap, Inc.Inventors: Chieh Chang, Christophe Peroz, Sharad D. Bhagat, Michael Anthony Klug, Charles Scott Carden, Roy Matthew Patterson, Matthew S. Shafran
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Patent number: 10926452Abstract: Systems, apparatus, and methods for double-sided imprinting are provided. An example system includes first rollers for moving a first web including a first template having a first imprinting feature, second rollers for moving a second web including a second template having a second imprinting feature, dispensers for dispensing resist, a locating system for locating reference marks on the first and second webs for aligning the first and second templates, a light source for curing the resist, such that a cured first resist has a first imprinted feature corresponding to the first imprinting feature on one side of the substrate and a cured second resist has a second imprinted feature corresponding to the second imprinting feature on the other side of the substrate, and a moving system for feeding in the substrate between the first and second templates and unloading the double-imprinted substrate from the first and second webs.Type: GrantFiled: May 25, 2018Date of Patent: February 23, 2021Assignee: Magic Leap, Inc.Inventors: Roy Patterson, Charles Scott Carden, Satish Sadam, Ryan Christiansen, Matthew S. Shafran, Christopher John Fleckenstein, Vikramjit Singh, Michael Nevin Miller, Kang Luo
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Publication number: 20200116934Abstract: In an example method of forming a waveguide film, a photocurable material is dispensed into a space between a first mold portion and a second mold portion opposite the first mold portion. Further, a relative separation between a surface of the first mold portion with respect to a surface of the second mold portion opposing the surface of the first mold portion is adjusted. The photocurable material in the space is irradiated with radiation suitable for photocuring the photocurable material to form a cured waveguide film. Concurrent to irradiating the photocurable material, the relative separation between the surface of the first mold portion and the surface of the second mold portion is varied and/or an intensity of the radiation irradiating the photocurable material is varied.Type: ApplicationFiled: October 16, 2019Publication date: April 16, 2020Inventors: Chieh Chang, Christophe Peroz, Sharad D. Bhagat, Michael Anthony Klug, Charles Scott Carden, Roy Matthew Patterson, Matthew S. Shafran
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Patent number: 10558117Abstract: According to a first aspect of the present invention, an imprint apparatus for contacting a mold with a resin applied to a substrate to perform patterning on the substrate is provided that comprises a dispenser configured to apply the resin to the substrate; and a resin supply unit configured to supply the resin to the dispenser, wherein the resin supply unit comprises a resin storage tank configured to store the resin; a pump configured to continuously circulate the resin between the resin storage tank and the dispenser, and a filter arranged at a flow path of circulated resin, configured to remove a foreign matter or a metal ion.Type: GrantFiled: May 20, 2015Date of Patent: February 11, 2020Assignee: CANON KABUSHIKI KAISHAInventors: Van Nguyen Truskett, Matthew S. Shafran, Saul Lee, Yoshikazu Miyajima
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Patent number: 10317806Abstract: Methods, systems, and apparatus for the loading and unloading of substrates, such as semiconductor wafers, involving microlithography and similar nano-fabrication techniques. The system includes two or more pedestals; a substrate chuck including two or more channels; a turntable having a top surface and a first end positioned opposite a second end, each of the first and second ends including a respective opening, each opening including two or more cutouts and two or more tabs, the turntable rotatable between first and second positions and an actuator system to adjust distances between the turntable and the substrate chuck and between the turntable and the pedestals.Type: GrantFiled: June 14, 2018Date of Patent: June 11, 2019Assignee: Molecular Imprints, Inc.Inventors: Roy Patterson, Christopher John Fleckenstein, Matthew S. Shafran, Charles Scott Carden, Satish Sadam, Ryan Christiansen
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Publication number: 20180339437Abstract: Systems, apparatus, and methods for double-sided imprinting are provided. An example system includes first rollers for moving a first web including a first template having a first imprinting feature, second rollers for moving a second web including a second template having a second imprinting feature, dispensers for dispensing resist, a locating system for locating reference marks on the first and second webs for aligning the first and second templates, a light source for curing the resist, such that a cured first resist has a first imprinted feature corresponding to the first imprinting feature on one side of the substrate and a cured second resist has a second imprinted feature corresponding to the second imprinting feature on the other side of the substrate, and a moving system for feeding in the substrate between the first and second templates and unloading the double-imprinted substrate from the first and second webs.Type: ApplicationFiled: May 25, 2018Publication date: November 29, 2018Inventors: Roy Patterson, Charles Scott Carden, Satish Sadam, Ryan Christiansen, Matthew S. Shafran, Christopher John Fleckenstein, Vikramjit Singh, Michael Nevin Miller, Kang Luo
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Publication number: 20180292755Abstract: Methods, systems, and apparatus for the loading and unloading of substrates, such as semiconductor wafers, involving microlithography and similar nano-fabrication techniques. The system includes two or more pedestals; a substrate chuck including two or more channels; a turntable having a top surface and a first end positioned opposite a second end, each of the first and second ends including a respective opening, each opening including two or more cutouts and two or more tabs, the turntable rotatable between first and second positions and an actuator system to adjust distances between the turntable and the substrate chuck and between the turntable and the pedestals.Type: ApplicationFiled: June 14, 2018Publication date: October 11, 2018Inventors: Roy Patterson, Christopher John Fleckenstein, Matthew S. Shafran, Charles Scott Carden, Satish Sadam, Ryan Christiansen
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Publication number: 20180264691Abstract: An example system is configured to photocure a photocurable material to form a polymer film. The system includes a first chuck configured to support a first substantially planar mold, a second chuck configured to support a second substantially planar mold, and an actuable stage coupled to the first chuck and/or the second chuck. The actuable stage is configured to position the first chuck and/or the second chuck so that the first and second molds are separated by a gap. The system also includes a sensor arrangement for obtaining measurement information indicative of a distance between the first and second molds and/or a pressure between the first and second chucks at each of at least three locations. The system also includes a control module configured control the gap between the first and second molds based on the measurement information.Type: ApplicationFiled: March 15, 2018Publication date: September 20, 2018Inventors: Chieh Chang, Christophe Peroz, Roy Matthew Patterson, Matthew S. Shafran, Christopher John Fleckenstein, Charles Scott Carden
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Patent number: 10025202Abstract: Methods, systems, and apparatus for the loading and unloading of substrates, such as semiconductor wafers, involving microlithography and similar nano-fabrication techniques. The system includes two or more pedestals; a substrate chuck including two or more channels; a turntable having a top surface and a first end positioned opposite a second end, each of the first and second ends including a respective opening, each opening including two or more cutouts and two or more tabs, the turntable rotatable between first and second positions and an actuator system to adjust distances between the turntable and the substrate chuck and between the turntable and the pedestals.Type: GrantFiled: June 2, 2017Date of Patent: July 17, 2018Assignee: Molecular Imprints, Inc.Inventors: Roy Patterson, Christopher John Fleckenstein, Matthew S. Shafran, Charles Scott Carden, Satish Sadam, Ryan Christiansen
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Publication number: 20180031976Abstract: Methods, systems, and apparatus for the loading and unloading of substrates, such as semiconductor wafers, involving microlithography and similar nano-fabrication techniques. The system includes two or more pedestals; a substrate chuck including two or more channels; a turntable having a top surface and a first end positioned opposite a second end, each of the first and second ends including a respective opening, each opening including two or more cutouts and two or more tabs, the turntable rotatable between first and second positions and an actuator system to adjust distances between the turntable and the substrate chuck and between the turntable and the pedestals.Type: ApplicationFiled: June 2, 2017Publication date: February 1, 2018Inventors: Roy Patterson, Christopher John Fleckenstein, Matthew S. Shafran, Charles Scott Carden, Satish Sadam, Ryan Christiansen
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Patent number: 9658251Abstract: Disclosed are various embodiments of methods and systems related to stimulus responsive nanoparticles. In one embodiment includes a stimulus responsive nanoparticle system, the system includes a first electrode, a second electrode, and a plurality of elongated electro-responsive nanoparticles dispersed between the first and second electrodes, the plurality of electro-responsive nanorods configured to respond to an electric field established between the first and second electrodes.Type: GrantFiled: May 1, 2015Date of Patent: May 23, 2017Assignee: WEST VIRGINIA UNIVERSITYInventors: Darran Robert Cairns, Wade W. Huebsch, Konstantinos A. Sierros, Matthew S. Shafran