Patents by Inventor Matthew SAHA

Matthew SAHA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250113736
    Abstract: A cantilever may include a first dielectric layer that has a first intrinsic stress and a second dielectric layer overlying the first dielectric layer that has a second intrinsic stress that is different than the first intrinsic stress. The difference between the first and second intrinsic stresses may cause the cantilever to curve. A second dielectric layer can comprise a plurality of crossbars oriented at an angle relative to a length of the cantilever to reduce curvature in a width direction of the cantilever. The second dielectric layer can be patterned with a waveguide. The cantilever may be piezoelectrically actuated.
    Type: Application
    Filed: September 27, 2024
    Publication date: April 3, 2025
    Applicants: The MITRE Corporation, Massachusetts Institute of Technology
    Inventors: Henry WEN, Andrew Greenspon, Matthew Saha, Dirk Englund
  • Patent number: 12254429
    Abstract: Systems and methods for evaluating construction of structures are disclosed. Building information modeling (BIM) data is received in a non-standardized format for a set of structures undergoing construction. Scheduling data is received associated with construction of each structure in the set of structures. A database is accessed that stores construction data that associates multiple elements of construction projects in a hierarchical configuration. Using the BIM data and the scheduling data, a model is generated that standardizes how particular elements of a particular structure relate to the multiple elements in the hierarchical configuration. Using the generated model, a status of construction of the particular structure is generated. In some implementations, the model is generated and/or trained using machine learning.
    Type: Grant
    Filed: May 31, 2022
    Date of Patent: March 18, 2025
    Assignee: Doxel, Inc.
    Inventors: Arunava Saha, Dobromir Voyager Montauk, Richard William Turner, Matthew Paul Orban
  • Patent number: 12208569
    Abstract: The present disclosure relates to a method for performing an additive manufacturing operation to form a structure by processing a photopolymer resist material. A laser beam is directed at a tunable mask. At least one emergent beam is collected from a plurality of emergent beams emerging from the tunable mask. The at least one emergent beam is collimated to create a collimated beam. Each emergent beam from the tunable mask has a plurality of beam lets of varying or identical intensity, and each beam let emerges from a unique subsection or region of the tunable mask. The collimated beam is focused into a laser beam which is projected as an image plane onto or within the photopolymer resist material, such that the same optical path length is created between the tunable mask and the focused image plane for all optical frequencies of the focused laser beam.
    Type: Grant
    Filed: September 18, 2020
    Date of Patent: January 28, 2025
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: Sourabh Kumar Saha, Robert Matthew Panas, Shih-Chi Chen
  • Publication number: 20250026952
    Abstract: Coating compositions may combine durability and stain resistance with reduced environmental emissions and health risks. A coating composition may comprise an isocyanate component, an amine-functional resin comprising an aspartic amine, a reactive silicone component having a molecular weight of at least of 500, and TiO2 in an amount of at least 5 wt. %. The coating composition may further comprise a cure retardant in an amount of at least 5 wt. % and a solvent in an amount of up to 20 wt. %.
    Type: Application
    Filed: June 7, 2023
    Publication date: January 23, 2025
    Applicant: PPG Industries Ohio, Inc.
    Inventors: Chinming Hui, Edward R. Millero, JR., John M. Bennett, Patricia Olivia Trevino Suarez del Real, David J. Schmidt, Chandler L. Johnson, Wells B. Warren, III, Gobinda Saha, William Earl Ishmael, JR., Matthew Pell
  • Publication number: 20230351235
    Abstract: A method for controlling a qubit encoded in an atom-like defect in a solid-state host may comprise applying an electrical signal to a piezoelectric cantilever that is mechanically coupled to a photonic waveguide comprising one or more embedded point defect sites. The photonic waveguide may be optically coupled to a photonic chip. Applying the electrical signal to the piezoelectric cantilever may induce movement in the piezoelectric cantilever, which may induce a strain in the photonic waveguide. The applied electrical signal may be determined by a defect site with excitation light, measuring a frequency of a photon emitted by the excited defect site, determining a frequency shift based on the measured frequency of the emitted photon, and determining the electrical signal to be applied to the piezoelectric cantilever based on the frequency shift.
    Type: Application
    Filed: April 28, 2023
    Publication date: November 2, 2023
    Applicants: The MITRE Corporation, National Technology & Engineering Solution of Sandia, LLC, MIT - Massachusetts Institute of Technology
    Inventors: Genevieve CLARK, Matthew KOPPA, Kevin CHEN, Andrew LEENHEER, Linsen LI, Daniel DOMINQUEZ, Mark DONG, Matthew SAHA, Andrew GOLTER, Gerald GILBERT, Matthew EICHENFIELD, Dirk ENGLUND