Abstract: The present disclosure relates to a process for the purification of a perfluorocarbon composition from a mixture comprising the perfluorocarbon composition and at least one non-perfluorinated hydrofluorocarbon compound, wherein the process comprises the steps of: A. providing a continuous reactor comprising at least one reaction channel and mixing means; B. providing reactants and reagents comprising: a) a mixture comprising a perfluorocarbon composition and at least one non-perfluorinated hydrofluorocarbon compound; b) a basic compound; and c) optionally, a liquid medium; and C. incorporating the reactants and reagents into the reaction channel of the continuous reactor, thereby forming a reaction product stream comprising the purified perfluorocarbon composition.

Abstract: The present disclosure relates to a process for the manufacturing of a 3-5 halopropionylhalide, wherein the process comprises the steps of: a) providing a flow reactor comprising a reaction chamber; b) providing reactants comprising: i. acrylic acid; ii. a reaction co-agent selected from the group consisting of N,N-0 disubstituted amides; and iii. a halogenating agent; and c) incorporating the reactants into the reaction chamber of the flow reactor, thereby forming a reaction product stream comprising a 3-halopropionyl-halide; wherein the molar ratio of acrylic acid to the halogenating agent is 1 to at least 5 0.8; wherein the temperature of the reaction chamber of the flow reactor is greater than 60° C.; and wherein the residence time of the reaction product stream comprising the 3-halopropionylhalide in the reaction chamber of the flow reactor is greater than 10 minutes.

Abstract: The present disclosure relates to a process for the manufacturing of a compound comprising a (meth)acryloyl group, wherein the process comprises the steps of: a) providing a multi-screw extruder comprising a reaction chamber; b) providing reactants and reagents comprising: i. an alcohol or a primary or secondary amine; ii. a base; and iii. a (meth)acryloyl halide or a 3-halopropionyl halide; and c) incorporating the reactants and reagents into the reaction chamber of the multi-screw extruder, thereby forming a reaction product stream comprising the compound comprising a (meth)acryloyl group.

Abstract: The present disclosure relates to a process for the manufacturing of a (meth)acrylic anhydride, wherein the process comprises the steps of: A. providing a flow reactor comprising a reaction chamber; B. providing reactants and reagents comprising: a) a (meth)acryloyl halide; b) an organic solvent; c) a (meth)acrylic acid; d) and either: i. a tertiary amine; or ii. an inorganic base and a polar solvent; and C. incorporating the reactants and reagents into the reaction chamber of the flow reactor, thereby forming a reaction product stream comprising the (meth)acrylic anhydride. In another aspect, the present disclosure is directed to the use of a polar solvent for the manufacturing of a (meth)acrylic anhydride in a flow reactor.

Abstract: The present disclosure relates to a process for the manufacturing of a compound comprising a (meth)acryloyl group, wherein the process comprises the steps of: a) providing a multi-screw extruder comprising a reaction chamber; b) providing reactants and reagents comprising: i. an alcohol or a primary or secondary amine; ii. a base; and iii. a (meth)acryloyl halide or a 3-halopropionyl halide; and c) incorporating the reactants and reagents into the reaction chamber of the multi-screw extruder, thereby forming a reaction product stream comprising the compound comprising a (meth)acryloyl group.

Abstract: The present disclosure relates to a process for the manufacturing of a 3-5 halopropionylhalide, wherein the process comprises the steps of: a) providing a flow reactor comprising a reaction chamber; b) providing reactants comprising: i. acrylic acid; ii. a reaction co-agent selected from the group consisting of N,N-0 disubstituted amides; and iii. a halogenating agent; and c) incorporating the reactants into the reaction chamber of the flow reactor, thereby forming a reaction product stream comprising a 3-halopropionyl-halide; wherein the molar ratio of acrylic acid to the halogenating agent is 1 to at least 5 0.8; wherein the temperature of the reaction chamber of the flow reactor is greater than 60° C.; and wherein the residence time of the reaction product stream comprising the 3-halopropionylhalide in the reaction chamber of the flow reactor is greater than 10 minutes.

Abstract: The present disclosure relates to a process for the manufacturing of an acid halide, wherein the process comprises the steps of: a) providing a flow reactor comprising a reaction chamber; b) providing reactants comprising: i. a carboxylic acid; ii. a reaction co-agent selected from the group consisting of N,N-disubstituted amides; and iii. a phosphoryl halide; c) incorporating the reactants into the reaction chamber of the flow reactor, wherein the molar ratio of the carboxylic acid to the phosphoryl halide is 1 to at least 0.8, and the molar ratio of the carboxylic acid to the co-agent is 1 to at least 0.5; and d) producing a reaction product stream comprising the acid halide. In another aspect, the present disclosure is directed to the use of a phosphoryl halide for the manufacturing of an acid halide in a flow reactor.

Abstract: A spacer displacement device for a wafer illumination unit comprises an actuator, a spacer which can be displaced between an active and an inactive position by the actuator, and a force transmission element which is coupled to the actuator. The force transmission element consists of wire.

Abstract: A spacer displacement device for a wafer illumination unit comprises an actuator, a spacer which can be displaced between an active and an inactive position by the actuator, and a force transmission element which is coupled to the actuator. The force transmission element consists of wire.

Abstract: The invention relates to a chuck and a method for suction and holding a wafer by said chuck, wherein the chuck comprises: a flat top face being subdivided into several suction segments, wherein the suction segments are each configured for suctioning a fluid; and a bottom face. The method comprises the steps: bringing, within a fluid, wafer and top face of the chuck into vicinity such that two or more of the suction segments are covered, at least loosely covered, by the wafer; choosing, from the suction segments not yet been activated, a suction segment having a minimal distance to the wafer; activating the suction segment chosen in the previous step; once the wafer in the area of the last-activated suction segment tightly touches the top face of the chuck and as long as at least one suction segment is not yet activated: repeating the foregoing steps.

Abstract: The invention relates to a method and device for expanding the travel or control displacement of linear actuators that is available during an imprinting or embossing stroke. The wedge error compensating head (2) comprises a movable part (4), a stationary part (3) and at least three linear actuators (8). Each linear actuator (8) is connected to one of the parts (3, 4) at one end and to the other of the two parts (4, 3) by wedges (9) at the other end. By means of the wedges (9), it is possible to coarsely or roughly compensate for wedge errors and possible tolerances of individual subcomponents of the system. The linear actuators (8) are only used for fine or precision compensation for the wedge error. In this way, sufficient control displacement is available for the imprinting stroke with the linear actuators.

Abstract: The invention relates to a method and device for expanding the travel or control displacement of linear actuators that is available during an imprinting or embossing stroke. The wedge error compensating head (2) comprises a movable part (4), a stationary part (3) and at least three linear actuators (8). Each linear actuator (8) is connected to one of the parts (3, 4) at one end and to the other of the two parts (4, 3) by wedges (9) at the other end. By means of the wedges (9), it is possible to coarsely or roughly compensate for wedge errors and possible tolerances of individual subcomponents of the system. The linear actuators (8) are only used for fine or precision compensation for the wedge error. In this way, sufficient control displacement is available for the imprinting stroke with the linear actuators.