Patents by Inventor Matthias Forster

Matthias Forster has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190202197
    Abstract: A processing machine system has at least one mobile control unit. At least one substance-related feature of the processing machine system can be detected by the mobile control unit. Upon detection of the substance-related feature by the mobile control unit, data which is associated with the feature can be made available to a user by the mobile control unit. A method is provided for operating such a processing machine system. The invention provides an alternative processing machine system or an alternative method for operating a processing machine system. The data associated with the feature contains data concerning at least one consumable of the processing machine system.
    Type: Application
    Filed: March 29, 2018
    Publication date: July 4, 2019
    Applicant: Koenig & Bauer AG
    Inventors: Stefan SINGER, Matthias ENGELMANN, Mario LINDNER, Matthias VOGT, Frank BROSCH, Matthias FÖRSTER
  • Publication number: 20150351583
    Abstract: The invention concerns a system for preparing beverages comprising:—a container enclosing a beverage or food ingredient, wherein the container carries at least one dielectric or conductive pattern said pattern encoding information, and—a dispenser adapted for decoding information encoded by the at least one dielectric or conductive pattern carried by the container and for preparing a food or a beverage from the beverage or food ingredient enclosed in the container.
    Type: Application
    Filed: December 20, 2013
    Publication date: December 10, 2015
    Inventors: Karin Weigelt, Matthias Forster, Falk Bosecke
  • Publication number: 20150286294
    Abstract: The invention describes a modular playing figure which consists of at least a first and a second module, wherein the first module is a basic object and the second module is an identification means, and the identification means has an electrically conductive layer.
    Type: Application
    Filed: October 28, 2013
    Publication date: October 8, 2015
    Applicant: Touchpac Holdings, LLC
    Inventors: Johannes Köpcke, Karin Weigelt, Matthias Förster, Anja Richter
  • Patent number: 6734077
    Abstract: A method for fabricating a trench capacitor for a semiconductor memory includes forming a masking layer in a trench that is disposed in a substrate. Nanocrystallites, which are used to pattern the masking layer, are deposited on the masking layer. Microtrenches are etched into the substrate in a lower region of the trench by the patterned masking layer. The microtrenches form a roughened trench sidewall. As a result, the outer capacitor electrode is formed with a larger surface area, allowing the trench capacitor to have a higher capacitance.
    Type: Grant
    Filed: September 4, 2002
    Date of Patent: May 11, 2004
    Assignee: Infineon Technologies AG
    Inventors: Matthias Förster, Kristin Schupke, Anja Morgenschweis, Anett Moll, Jens-Uwe Sachse
  • Publication number: 20030068867
    Abstract: A method for fabricating a trench capacitor for a semiconductor memory includes forming a masking layer in a trench that is disposed in a substrate. Nanocrystallites, which are used to pattern the masking layer, are deposited on the masking layer. Microtrenches are etched into the substrate in a lower region of the trench by the patterned masking layer. The microtrenches form a roughened trench sidewall. As a result, the outer capacitor electrode is formed with a larger surface area, allowing the trench capacitor to have a higher capacitance.
    Type: Application
    Filed: September 4, 2002
    Publication date: April 10, 2003
    Inventors: Matthias Forster, Kristin Schupke, Anja Morgenschweis, Anett Moll, Jens-Uwe Sachse
  • Patent number: 6455369
    Abstract: A method for fabricating a trench capacitor, that includes steps of: providing a silicon substrate; forming a trench, having a lower region and a surface, in the silicon substrate; and forming a doped layer in the silicon substrate in the lower region of the trench. In addition, a roughened silicon layer that has silicon grains with a diameter ranging from essentially 10 to 100 nm is produced in the lower region of the trench. A dielectric intermediate layer is applied on the roughened silicon layer, and the trench is filled with a doped layer.
    Type: Grant
    Filed: August 20, 2001
    Date of Patent: September 24, 2002
    Assignee: Infineon Technologies AG
    Inventors: Matthias Förster, Jörn Lützen, Martin Gutsche, Anja Morgenschweis
  • Publication number: 20020081801
    Abstract: A microroughness on a surface is produced in a single process step by forming semiconductor grains directly from a process gas. The semiconductor grains are finely distributed on the surface. As a result of forming the microroughness in a single process step, time and costs are saved during fabrication.
    Type: Application
    Filed: July 9, 2001
    Publication date: June 27, 2002
    Inventors: Matthias Forster, Anja Morgenschweis, Torsten Martini, Jens-Uwe Sachse
  • Publication number: 20020072171
    Abstract: A method for fabricating a trench capacitor, that includes steps of: providing a silicon substrate; forming a trench, having a lower region and a surface, in the silicon substrate; and forming a doped layer in the silicon substrate in the lower region of the trench. In addition, a roughened silicon layer that has silicon grains with a diameter ranging from essentially 10 to 100 nm is produced in the lower region of the trench. A dielectric intermediate layer is applied on the roughened silicon layer, and the trench is filled with a doped layer.
    Type: Application
    Filed: August 20, 2001
    Publication date: June 13, 2002
    Inventors: Matthias Forster, Jorn Lutzen, Martin Gutsche, Anja Morgenschweis
  • Patent number: 5479013
    Abstract: STM probe, in particular for use in an SEM for examining a surface of a sle by STM and/or SEM operation, comprising an outer and an inner piezotube; an object carrier plate mounted on the annular top face of the inner piezotube; a triangular head plate mounted on the annular top face of the outer piezotube and having a recess substantially concentric with the tubes in the triangle side crossing the tubes, the object carrier plate being arranged in this recess with play on all sides; a triangular test-prod attachment plate arranged at a space above the head plate and having a test-prod attachment made of an insulating material in the triangle side passing above the object carrier plate, for receiving a test prod; the corner areas of the plates being provided with fine-thread spindles for setting the space between the plates; and the two plates being held together by means of three springs engaging the corners.
    Type: Grant
    Filed: August 24, 1994
    Date of Patent: December 26, 1995
    Assignee: Max-Planck-Gesellschaft zur Forderung der Wissenschaften e.V.
    Inventors: Matthias Forster, Bernd Tesche