Patents by Inventor Matthias Geissler

Matthias Geissler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230053870
    Abstract: A technique for detection of probes in a microfluidic flow-through chamber involves a plurality of interface pinning reaction vessel formed by micro- or nano-structured relief patterning of a substrate. The relief patterning increases a surface area locally, and defines a plurality of separated interface pinning reaction vessels. The marked detection protocol may be supplied on a single layer of a stacked microfluidic chip, or the chamber may constitute a whole layer. The chip may be designed to be driven mechanically, pneumatically, hydraulically, centrifugally or by capillary action. Each vessel allows for a high density of probes, an effective region for developer-type or fluorescence-based marking, and efficient readout. Suitable probe liquids can be self-limiting to fill one vessel. Suitable developer liquids avoid dye bleeding across vessels during washing.
    Type: Application
    Filed: February 8, 2021
    Publication date: February 23, 2023
    Applicant: National Research Council of Canada
    Inventors: Matthias GEISSLER, Keith J. MORTON, Teodor VERES
  • Patent number: 10046893
    Abstract: A patterned thermoplastic elastomer (TPE) film for fabricating a liquid-filled blister, has a blister-sized cavity in fluid communication with a microfluidic channel via a gating region.
    Type: Grant
    Filed: April 11, 2017
    Date of Patent: August 14, 2018
    Assignee: National Research Council of Canada
    Inventors: Mojra Janta, Xuyen Dai Hoa, Matthias Geissler, Teodor Veres
  • Publication number: 20170291747
    Abstract: A patterned thermoplastic elastomer (TPE) film for fabricating a liquid-filled blister, has a blister-sized cavity in fluid communication with a microfluidic channel via a gating region.
    Type: Application
    Filed: April 11, 2017
    Publication date: October 12, 2017
    Applicant: NATIONAL RESEARCH COUNCIL OF CANADA
    Inventors: Mojra JANTA, Xuyen Dai HOA, Matthias GEISSLER, Teodor VERES
  • Patent number: 8951612
    Abstract: A method for processing a surface involves depositing at least one class of enzymes (2) onto the surface (1); introducing at least a reactant (3) into an environment of the surface (1), and causing interaction between the enzymes (2) and the reactant (3), thereby to cause processing of a region of the surface (1), the processed region of the surface (1) being defined with respect to a region thereof that is proximate (4) to where the enzymes (3) have been deposited.
    Type: Grant
    Filed: October 10, 2013
    Date of Patent: February 10, 2015
    Assignee: International Business Machines Corporation
    Inventors: Emmanuel Delamarche, Matthias Geissler
  • Publication number: 20140038260
    Abstract: A method for processing a surface involves depositing at least one class of enzymes (2) onto the surface (1); introducing at least a reactant (3) into an environment of the surface (1), and causing interaction between the enzymes (2) and the reactant (3), thereby to cause processing of a region of the surface (1), the processed region of the surface (1) being defined with respect to a region thereof that is proximate (4) to where the enzymes (3) have been deposited.
    Type: Application
    Filed: October 10, 2013
    Publication date: February 6, 2014
    Applicant: International Business Machines Corporation
    Inventors: Emmanuel Delamarche, Matthias Geissler
  • Patent number: 8580129
    Abstract: A method for processing a surface involves depositing at least one class of enzymes (2) onto the surface (1); introducing at least a reactant (3) into an environment of the surface (1), and causing interaction between the enzymes (2) and the reactant (3), thereby to cause processing of a region of the surface (1), the processed region of the surface (1) being defined with respect to a region thereof that is proximate (4) to where the enzymes (3) have been deposited.
    Type: Grant
    Filed: June 18, 2012
    Date of Patent: November 12, 2013
    Assignee: International Business Machines Corporation
    Inventors: Emmanuel Delamarche, Matthias Geissler
  • Publication number: 20120255930
    Abstract: A method for processing a surface involves depositing at least one class of enzymes (2) onto the surface (1); introducing at least a reactant (3) into an environment of the surface (1), and causing interaction between the enzymes (2) and the reactant (3), thereby to cause processing of a region of the surface (1), the processed region of the surface (1) being defined with respect to a region thereof that is proximate (4) to where the enzymes (3) have been deposited.
    Type: Application
    Filed: June 18, 2012
    Publication date: October 11, 2012
    Applicant: International Business Machines Corporation
    Inventors: Emmanuel Delamarche, Matthias Geissler
  • Patent number: 8202438
    Abstract: A method for processing a surface involves depositing at least one class of enzymes (2) onto the surface (1); introducing at least a reactant (3) into an environment of the surface (1), and causing interaction between the enzymes (2) and the reactant (3), thereby to cause processing of a region of the surface (1), the processed region of the surface (1) being defined with respect to a region thereof that is proximate (4) to where the enzymes (3) have been deposited.
    Type: Grant
    Filed: December 18, 2007
    Date of Patent: June 19, 2012
    Assignee: International Business Machines Corporation
    Inventors: Emmanuel Delamarche, Matthias Geissler
  • Patent number: 7502598
    Abstract: In a transmitting arrangement a power amplifier is coupled to a radio-frequency antenna arrangement via a controllable matching apparatus. This allows direct impedance transformation of the output of the power amplifier to the input of the radio-frequency antenna arrangement. There is no need for transformation to the 50 ohm standard. The power amplifier, matching apparatus and a control circuit for controlling the impedance of the matching apparatus form a functional unit, which is advantageously in the form of a monolithically integrated structure in a semiconductor body. A receiving arrangement is produced in the same way, comprising an antenna, a filter device and a matching apparatus connected between them.
    Type: Grant
    Filed: May 27, 2005
    Date of Patent: March 10, 2009
    Assignee: Infineon Technologies AG
    Inventors: Rainer Kronberger, Dirk Heberling, Matthias Geissler, Jan-Erik Müller
  • Publication number: 20080245771
    Abstract: A method for processing a surface involves depositing at least one class of enzymes (2) onto the surface (1); introducing at least a reactant (3) into an environment of the surface (1), and causing interaction between the enzymes (2) and the reactant (3), thereby to cause processing of a region of the surface (1), the processed region of the surface (1) being defined with respect to a region thereof that is proximate (4) to where the enzymes (3) have been deposited.
    Type: Application
    Filed: December 18, 2007
    Publication date: October 9, 2008
    Applicant: International Business Machines Corporation
    Inventors: Emmanuel Delamarche, Matthias Geissler
  • Publication number: 20050277399
    Abstract: In a transmitting arrangement a power amplifier is coupled to a radio-frequency antenna arrangement via a controllable matching apparatus. This allows direct impedance transformation of the output of the power amplifier to the input of the radio-frequency antenna arrangement. There is no need for transformation to the 50 ohm standard. The power amplifier, matching apparatus and a control circuit for controlling the impedance of the matching apparatus form a functional unit, which is advantageously in the form of a monolithically integrated structure in a semiconductor body. A receiving arrangement is produced in the same way, comprising an antenna, a filter device and a matching apparatus connected between them.
    Type: Application
    Filed: May 27, 2005
    Publication date: December 15, 2005
    Inventors: Rainer Kronberger, Dirk Heberling, Matthias Geissler, Jan-Erik Muller
  • Patent number: 6893966
    Abstract: There is disclosed a method of patterning an article (10) including a layer (12) of copper formed onto an insulating substrate (11) using a positive microcontact printing (MCP) process. In a preferred embodiment where the metal is copper (Cu) and the substrate is a silicon wafer, the method includes removing the native oxide presents on the Cu in a solution of HCl. Then, a stamp (13?) having a patterned polydimethylsiloxane (PDMS) body (14) is linked with a 0.2 mM solution of pentaerythritol-tetrakis(3-mercaptopropionate) (PTMP) in ethanol for 1 min, to form the inking layer (15?). The stamp is applied on the Cu layer to print a first self-assembled monolayer (SAM) (16?) according to a desired pattern. The article is dipped in a solution of ECT which is then adsorbed only in the non printed regions, forming a second SAM (18) in a configuration that is complementary to the desired pattern. Finally, the printed areas of the Cu layer are removed using a peroxodisulfate etch bath.
    Type: Grant
    Filed: November 27, 2002
    Date of Patent: May 17, 2005
    Assignee: International Business Machines Corporation
    Inventors: Emmanuel Delamarche, Matthias Geissler, Heiko Wolf
  • Patent number: 6770558
    Abstract: Methods and apparatus for forming and/or enabling interconnection in a substrate. An example embodiment of a method comprises forming a via in the substrate. A preconditioning layer is deposited on the substrate. A catalyst layer is then bound to the preconditioning layer. A conductive material is deposited on the catalyst layer by electro-less deposition to fill the via with the conductive material. Deposition of the conductive material is selectively disabled from coating surfaces of the substrate outside the via. Advantageous alternatives are presented.
    Type: Grant
    Filed: February 21, 2003
    Date of Patent: August 3, 2004
    Assignee: International Business Machines Corporation
    Inventors: Emmanuel Delamarche, Michel Despont, Ute Drechsler, Matthias Geissler
  • Publication number: 20040102050
    Abstract: A method is disclosed of patterning the surface of an object. The method comprises the steps of providing an object comprising a substrate having at least one layer formed thereon; forming a first SAM on the layer according to a desired pattern of a first material capable of binding to the layer; forming a second SAM of a second material on a region of the layer that is not covered by the first SAM, in a configuration that is complementary to the desired pattern; and etching the layer through the first SAM. The first material is selected to prevent the formation of the second SAM on the first SAM and to substantially not block the etching of an underlying region of the layer therethrough.
    Type: Application
    Filed: November 27, 2002
    Publication date: May 27, 2004
    Applicant: International Business Machines Corporation
    Inventors: Emmanuel Delamarche, Matthias Geissler, Heiko Wolf
  • Publication number: 20030219970
    Abstract: Methods and apparatus for forming and/or enabling interconnection in a substrate. An example embodiment of a method comprises forming a via in the substrate. A preconditioning layer is deposited on the substrate. A catalyst layer is then bound to the preconditioning layer. A conductive material is deposited on the catalyst layer by electro-less deposition to fill the via with the conductive material. Deposition of the conductive material is selectively disabled from coating surfaces of the substrate outside the via. Advantageous alternatives are presented.
    Type: Application
    Filed: February 21, 2003
    Publication date: November 27, 2003
    Applicant: International Business Machines Corporation
    Inventors: Emmanuel Delamarche, Michel Despont, Ute Drechsler, Matthias Geissler
  • Patent number: 6521285
    Abstract: Methods for electroless deposition of conductive material on a substrate using in both cases a stamp having a patterned surface which is pressed onto the surface of a substrate for printing the substrate and providing a pattern of a catalyst on the substrate on which metal deposition occurs in the course of electroless deposition by immersing the printed substrate in a plating bath are provided. In one case, the stamp is pretreated to render the pattern of the stamp wettable with a catalytic ink which is transformed to the surface of the substrate. In the other case, a catalytic layer is provided on the surface of the substrate which is patterned by the stamp transferring a resist material onto the catalytic layer so that a subsequent etching process lays open the desired pattern of the catalytic layer for electroless deposition.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: February 18, 2003
    Assignee: International Business Machines Corporation
    Inventors: Hans Biebuyck, Emmanuel Delamarche, Matthias Geissler, Hannes Kind, Bruno Michel
  • Publication number: 20020166468
    Abstract: The invention relates to a patterning mask comprising a substantially planar patterned printing layer. The printing layer comprises a substantially inelastic stencil layer and a substantially elastic seal layer that is fixed at the stencil layer. The seal layer when being in contact with a substrate serves as a seal for a liquid or viscous or gaseous material that is fillable through the patterned printing layer onto the substrate. Additionally the mask may comprise a mesh layer. The mesh layer has a two-dimensional regular pattern of openings separated by solid elements such as wires and can provide a rigidity in its mesh plane.
    Type: Application
    Filed: March 22, 2002
    Publication date: November 14, 2002
    Applicant: International Business Machines Corporation
    Inventors: Heinz Schmid, David Juncker, Bruno Michel, Heiko Wolf, Matthias Geissler