Patents by Inventor Matthias Geissler
Matthias Geissler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230053870Abstract: A technique for detection of probes in a microfluidic flow-through chamber involves a plurality of interface pinning reaction vessel formed by micro- or nano-structured relief patterning of a substrate. The relief patterning increases a surface area locally, and defines a plurality of separated interface pinning reaction vessels. The marked detection protocol may be supplied on a single layer of a stacked microfluidic chip, or the chamber may constitute a whole layer. The chip may be designed to be driven mechanically, pneumatically, hydraulically, centrifugally or by capillary action. Each vessel allows for a high density of probes, an effective region for developer-type or fluorescence-based marking, and efficient readout. Suitable probe liquids can be self-limiting to fill one vessel. Suitable developer liquids avoid dye bleeding across vessels during washing.Type: ApplicationFiled: February 8, 2021Publication date: February 23, 2023Applicant: National Research Council of CanadaInventors: Matthias GEISSLER, Keith J. MORTON, Teodor VERES
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Pattenred film for forming fluid-filled blister, microfluidic blister, and kit and method of forming
Patent number: 10046893Abstract: A patterned thermoplastic elastomer (TPE) film for fabricating a liquid-filled blister, has a blister-sized cavity in fluid communication with a microfluidic channel via a gating region.Type: GrantFiled: April 11, 2017Date of Patent: August 14, 2018Assignee: National Research Council of CanadaInventors: Mojra Janta, Xuyen Dai Hoa, Matthias Geissler, Teodor Veres -
PATTENRED FILM FOR FORMING FLUID-FILLED BLISTER, MICROFLUIDIC BLISTER, AND KIT AND METHOD OF FORMING
Publication number: 20170291747Abstract: A patterned thermoplastic elastomer (TPE) film for fabricating a liquid-filled blister, has a blister-sized cavity in fluid communication with a microfluidic channel via a gating region.Type: ApplicationFiled: April 11, 2017Publication date: October 12, 2017Applicant: NATIONAL RESEARCH COUNCIL OF CANADAInventors: Mojra JANTA, Xuyen Dai HOA, Matthias GEISSLER, Teodor VERES -
Patent number: 8951612Abstract: A method for processing a surface involves depositing at least one class of enzymes (2) onto the surface (1); introducing at least a reactant (3) into an environment of the surface (1), and causing interaction between the enzymes (2) and the reactant (3), thereby to cause processing of a region of the surface (1), the processed region of the surface (1) being defined with respect to a region thereof that is proximate (4) to where the enzymes (3) have been deposited.Type: GrantFiled: October 10, 2013Date of Patent: February 10, 2015Assignee: International Business Machines CorporationInventors: Emmanuel Delamarche, Matthias Geissler
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Publication number: 20140038260Abstract: A method for processing a surface involves depositing at least one class of enzymes (2) onto the surface (1); introducing at least a reactant (3) into an environment of the surface (1), and causing interaction between the enzymes (2) and the reactant (3), thereby to cause processing of a region of the surface (1), the processed region of the surface (1) being defined with respect to a region thereof that is proximate (4) to where the enzymes (3) have been deposited.Type: ApplicationFiled: October 10, 2013Publication date: February 6, 2014Applicant: International Business Machines CorporationInventors: Emmanuel Delamarche, Matthias Geissler
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Patent number: 8580129Abstract: A method for processing a surface involves depositing at least one class of enzymes (2) onto the surface (1); introducing at least a reactant (3) into an environment of the surface (1), and causing interaction between the enzymes (2) and the reactant (3), thereby to cause processing of a region of the surface (1), the processed region of the surface (1) being defined with respect to a region thereof that is proximate (4) to where the enzymes (3) have been deposited.Type: GrantFiled: June 18, 2012Date of Patent: November 12, 2013Assignee: International Business Machines CorporationInventors: Emmanuel Delamarche, Matthias Geissler
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Publication number: 20120255930Abstract: A method for processing a surface involves depositing at least one class of enzymes (2) onto the surface (1); introducing at least a reactant (3) into an environment of the surface (1), and causing interaction between the enzymes (2) and the reactant (3), thereby to cause processing of a region of the surface (1), the processed region of the surface (1) being defined with respect to a region thereof that is proximate (4) to where the enzymes (3) have been deposited.Type: ApplicationFiled: June 18, 2012Publication date: October 11, 2012Applicant: International Business Machines CorporationInventors: Emmanuel Delamarche, Matthias Geissler
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Patent number: 8202438Abstract: A method for processing a surface involves depositing at least one class of enzymes (2) onto the surface (1); introducing at least a reactant (3) into an environment of the surface (1), and causing interaction between the enzymes (2) and the reactant (3), thereby to cause processing of a region of the surface (1), the processed region of the surface (1) being defined with respect to a region thereof that is proximate (4) to where the enzymes (3) have been deposited.Type: GrantFiled: December 18, 2007Date of Patent: June 19, 2012Assignee: International Business Machines CorporationInventors: Emmanuel Delamarche, Matthias Geissler
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Patent number: 7502598Abstract: In a transmitting arrangement a power amplifier is coupled to a radio-frequency antenna arrangement via a controllable matching apparatus. This allows direct impedance transformation of the output of the power amplifier to the input of the radio-frequency antenna arrangement. There is no need for transformation to the 50 ohm standard. The power amplifier, matching apparatus and a control circuit for controlling the impedance of the matching apparatus form a functional unit, which is advantageously in the form of a monolithically integrated structure in a semiconductor body. A receiving arrangement is produced in the same way, comprising an antenna, a filter device and a matching apparatus connected between them.Type: GrantFiled: May 27, 2005Date of Patent: March 10, 2009Assignee: Infineon Technologies AGInventors: Rainer Kronberger, Dirk Heberling, Matthias Geissler, Jan-Erik Müller
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Publication number: 20080245771Abstract: A method for processing a surface involves depositing at least one class of enzymes (2) onto the surface (1); introducing at least a reactant (3) into an environment of the surface (1), and causing interaction between the enzymes (2) and the reactant (3), thereby to cause processing of a region of the surface (1), the processed region of the surface (1) being defined with respect to a region thereof that is proximate (4) to where the enzymes (3) have been deposited.Type: ApplicationFiled: December 18, 2007Publication date: October 9, 2008Applicant: International Business Machines CorporationInventors: Emmanuel Delamarche, Matthias Geissler
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Publication number: 20050277399Abstract: In a transmitting arrangement a power amplifier is coupled to a radio-frequency antenna arrangement via a controllable matching apparatus. This allows direct impedance transformation of the output of the power amplifier to the input of the radio-frequency antenna arrangement. There is no need for transformation to the 50 ohm standard. The power amplifier, matching apparatus and a control circuit for controlling the impedance of the matching apparatus form a functional unit, which is advantageously in the form of a monolithically integrated structure in a semiconductor body. A receiving arrangement is produced in the same way, comprising an antenna, a filter device and a matching apparatus connected between them.Type: ApplicationFiled: May 27, 2005Publication date: December 15, 2005Inventors: Rainer Kronberger, Dirk Heberling, Matthias Geissler, Jan-Erik Muller
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Patent number: 6893966Abstract: There is disclosed a method of patterning an article (10) including a layer (12) of copper formed onto an insulating substrate (11) using a positive microcontact printing (MCP) process. In a preferred embodiment where the metal is copper (Cu) and the substrate is a silicon wafer, the method includes removing the native oxide presents on the Cu in a solution of HCl. Then, a stamp (13?) having a patterned polydimethylsiloxane (PDMS) body (14) is linked with a 0.2 mM solution of pentaerythritol-tetrakis(3-mercaptopropionate) (PTMP) in ethanol for 1 min, to form the inking layer (15?). The stamp is applied on the Cu layer to print a first self-assembled monolayer (SAM) (16?) according to a desired pattern. The article is dipped in a solution of ECT which is then adsorbed only in the non printed regions, forming a second SAM (18) in a configuration that is complementary to the desired pattern. Finally, the printed areas of the Cu layer are removed using a peroxodisulfate etch bath.Type: GrantFiled: November 27, 2002Date of Patent: May 17, 2005Assignee: International Business Machines CorporationInventors: Emmanuel Delamarche, Matthias Geissler, Heiko Wolf
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Patent number: 6770558Abstract: Methods and apparatus for forming and/or enabling interconnection in a substrate. An example embodiment of a method comprises forming a via in the substrate. A preconditioning layer is deposited on the substrate. A catalyst layer is then bound to the preconditioning layer. A conductive material is deposited on the catalyst layer by electro-less deposition to fill the via with the conductive material. Deposition of the conductive material is selectively disabled from coating surfaces of the substrate outside the via. Advantageous alternatives are presented.Type: GrantFiled: February 21, 2003Date of Patent: August 3, 2004Assignee: International Business Machines CorporationInventors: Emmanuel Delamarche, Michel Despont, Ute Drechsler, Matthias Geissler
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Publication number: 20040102050Abstract: A method is disclosed of patterning the surface of an object. The method comprises the steps of providing an object comprising a substrate having at least one layer formed thereon; forming a first SAM on the layer according to a desired pattern of a first material capable of binding to the layer; forming a second SAM of a second material on a region of the layer that is not covered by the first SAM, in a configuration that is complementary to the desired pattern; and etching the layer through the first SAM. The first material is selected to prevent the formation of the second SAM on the first SAM and to substantially not block the etching of an underlying region of the layer therethrough.Type: ApplicationFiled: November 27, 2002Publication date: May 27, 2004Applicant: International Business Machines CorporationInventors: Emmanuel Delamarche, Matthias Geissler, Heiko Wolf
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Publication number: 20030219970Abstract: Methods and apparatus for forming and/or enabling interconnection in a substrate. An example embodiment of a method comprises forming a via in the substrate. A preconditioning layer is deposited on the substrate. A catalyst layer is then bound to the preconditioning layer. A conductive material is deposited on the catalyst layer by electro-less deposition to fill the via with the conductive material. Deposition of the conductive material is selectively disabled from coating surfaces of the substrate outside the via. Advantageous alternatives are presented.Type: ApplicationFiled: February 21, 2003Publication date: November 27, 2003Applicant: International Business Machines CorporationInventors: Emmanuel Delamarche, Michel Despont, Ute Drechsler, Matthias Geissler
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Patent number: 6521285Abstract: Methods for electroless deposition of conductive material on a substrate using in both cases a stamp having a patterned surface which is pressed onto the surface of a substrate for printing the substrate and providing a pattern of a catalyst on the substrate on which metal deposition occurs in the course of electroless deposition by immersing the printed substrate in a plating bath are provided. In one case, the stamp is pretreated to render the pattern of the stamp wettable with a catalytic ink which is transformed to the surface of the substrate. In the other case, a catalytic layer is provided on the surface of the substrate which is patterned by the stamp transferring a resist material onto the catalytic layer so that a subsequent etching process lays open the desired pattern of the catalytic layer for electroless deposition.Type: GrantFiled: June 27, 2001Date of Patent: February 18, 2003Assignee: International Business Machines CorporationInventors: Hans Biebuyck, Emmanuel Delamarche, Matthias Geissler, Hannes Kind, Bruno Michel
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Publication number: 20020166468Abstract: The invention relates to a patterning mask comprising a substantially planar patterned printing layer. The printing layer comprises a substantially inelastic stencil layer and a substantially elastic seal layer that is fixed at the stencil layer. The seal layer when being in contact with a substrate serves as a seal for a liquid or viscous or gaseous material that is fillable through the patterned printing layer onto the substrate. Additionally the mask may comprise a mesh layer. The mesh layer has a two-dimensional regular pattern of openings separated by solid elements such as wires and can provide a rigidity in its mesh plane.Type: ApplicationFiled: March 22, 2002Publication date: November 14, 2002Applicant: International Business Machines CorporationInventors: Heinz Schmid, David Juncker, Bruno Michel, Heiko Wolf, Matthias Geissler