Patents by Inventor Matthias Maluck

Matthias Maluck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10444477
    Abstract: The wafer stack (100) comprises a first wafer (OW1) referred to as optics wafer and a second wafer (SW) referred to as spacer wafer, said optics wafer (OW1) having manufacturing irregularities. The spacer wafer (SW) is structured such that it at least partially compensates for said manufacturing irregularities. The corresponding method for manufacturing a device, which in particular can be an optical device, comprises carrying out a correction step for at least partially compensating for manufacturing irregularities. Such a correction step comprises providing a wafer (SW) referred to as spacer wafer, wherein that spacer wafer is structured for at least partially compensating for said manufacturing irregularities. Those manufacturing irregularities may comprise a deviation from a nominal value, e.g., a irregularities in focal length. The invention can allow to mass produce high-precision devices at a high yield.
    Type: Grant
    Filed: August 24, 2012
    Date of Patent: October 15, 2019
    Assignee: AMS SENSORS SINGAPORE PTE. LTD.
    Inventors: Hartmut Rudmann, Matthias Maluck, Alexander Bietsch, Peter Roentgen, Stephan Heimgartner
  • Patent number: 9945756
    Abstract: Identifying a location of a focal point of an optical system includes, in some implementations, using a sensor system to detect light that passed through the optical system, and determining a location of a focal point of the optical system based on a location of a focal point of the sensor system that substantially matches the location of the focal point of the optical system.
    Type: Grant
    Filed: February 18, 2014
    Date of Patent: April 17, 2018
    Assignee: Heptagon Micro Optics Pte. Ltd.
    Inventors: Matthias Maluck, Peter Roentgen
  • Publication number: 20160011075
    Abstract: Identifying a location of a focal point of an optical system includes, in some implementations, using a sensor system to detect light that passed through the optical system, and determining a location of a focal point of the optical system based on a location of a focal point of the sensor system that substantially matches the location of the focal point of the optical system.
    Type: Application
    Filed: February 18, 2014
    Publication date: January 14, 2016
    Inventors: Matthias Maluck, Peter Roentgen
  • Patent number: 9237264
    Abstract: Manufacturing optical devices (e.g., for cameras) includes providing and allocating mount elements to lens modules wherein the mount elements are to be arranged within the optical devices to define a fixed separation distance between the lens modules and the image sensor plane. The mount elements have variable mount FFL sections by means of which the geometrical distance between the lens module and the image sensor plane is adjusted for each lens module, individually or in groups dependent on the optical properties of the lens modules, to compensate the variation of the lens module values among the lens modules, so that the focal planes of the lens modules falls into the image sensor plane.
    Type: Grant
    Filed: August 12, 2011
    Date of Patent: January 12, 2016
    Assignee: Heptagon Micro Optics Pte. Ltd.
    Inventors: Hartmut Rudmann, Peter Roentgen, Matthias Maluck, Markus Rossi
  • Publication number: 20140307081
    Abstract: The device (50) comprises an optics member (60) and a spacer member (70), said optics member comprising N?2 sets of passive optical components (65) comprising one or more passive optical components each. The spacer member (70) comprises N light channels (77), each of said N light channels being associated with one of said N sets of passive optical components. All of said N light channels (77) have an at least substantially identical geometrical length (g), and an optical path length of a first of said N light channels is different from an optical path length of at least one second of said N light channels. Methods for manufacturing such devices are described, too. The invention can allow to mass produce high-precision devices (50) at a high yield.
    Type: Application
    Filed: August 24, 2012
    Publication date: October 16, 2014
    Applicant: HEPTAGON MICRO OPTICS PTE. LTD.
    Inventors: Hartmut Rudmann, Matthias Maluck, Alexander Bietsch, Peter Roentgen, Stephan Heimgartner
  • Publication number: 20140299587
    Abstract: The wafer stack (100) comprises a first wafer (OW1) referred to as optics wafer and a second wafer (SW) referred to as spacer wafer, said optics wafer (OW1) having manufacturing irregularities. The spacer wafer (SW) is structured such that it at least partially compensates for said manufacturing irregularities. The corresponding method for manufacturing a device, which in particular can be an optical device, comprises carrying out a correction step for at least partially compensating for manufacturing irregularities. Such a correction step comprises providing a wafer (SW) referred to as spacer wafer, wherein that spacer wafer is structured for at least partially compensating for said manufacturing irregularities. Those manufacturing irregularities may comprise a deviation from a nominal value, e.g., a irregularities in focal length. The invention can allow to mass produce high-precision devices at a high yield.
    Type: Application
    Filed: August 24, 2012
    Publication date: October 9, 2014
    Applicant: Heptagon Micro Optics Pte. Ltd.
    Inventors: Hartmut Rudmann, Matthias Maluck, Alexander Bietsch, Peter Roentgen, Stephan Heimgartner
  • Publication number: 20130242182
    Abstract: Manufacturing optical devices (e.g., for cameras) includes providing and allocating mount elements to lens modules wherein the mount elements are to be arranged within the optical devices to define a fixed separation distance between the lens modules and the image sensor plane. The mount elements have variable mount FFL sections by means of which the geometrical distance between the lens module and the image sensor plane is adjusted for each lens module, individually or in groups dependent on the optical properties of the lens modules, to compensate the variation of the lens module values among the lens modules, so that the focal planes of the lens modules falls into the image sensor plane.
    Type: Application
    Filed: August 12, 2011
    Publication date: September 19, 2013
    Applicant: HEPTAGON MICRO OPTICS PTE. LTD.
    Inventors: Hartmut Rudmann, Peter Roentgen, Matthias Maluck, Markus Rossi