Patents by Inventor Matthias Mertens

Matthias Mertens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200094598
    Abstract: A printing module configured to print a label on a curved surface of an article includes an expandable printing mechanism configured to be expanded to an open configuration for receiving the article or contracted to a closed configuration placing the curved surface in an operative position with respect to a print head and an article moving assembly configured to grasp and hold the article and effect relative movement between the curved surface and the print head. The printing mechanism includes contact elements, such as rollers, that contact or otherwise engage the article when the printing mechanism is in the closed configuration and maintain the curved surface in the operative position with respect to the print head during relative movement between the curved surface and the print head.
    Type: Application
    Filed: November 26, 2019
    Publication date: March 26, 2020
    Applicant: Gen-Probe Incorporated
    Inventors: Rolf SILBERT, Robert J. ROSATI, David BUSE, Olev TAMMER, Matthias MERTEN
  • Publication number: 20200094597
    Abstract: A printing module configured to print a label on a curved surface of an article includes an expandable printing mechanism configured to be expanded to an open configuration for receiving the article or contracted to a closed configuration placing the curved surface in an operative position with respect to a print head and an article moving assembly configured to grasp and hold the article and effect relative movement between the curved surface and the print head. The printing mechanism includes contact elements, such as rollers, that contact or otherwise engage the article when the printing mechanism is in the closed configuration and maintain the curved surface in the operative position with respect to the print head during relative movement between the curved surface and the print head.
    Type: Application
    Filed: November 26, 2019
    Publication date: March 26, 2020
    Applicant: Gen-Probe Incorporated
    Inventors: Rolf SILBERT, Robert J. ROSATI, David BUSE, Olev TAMMER, Matthias MERTEN
  • Patent number: 10562329
    Abstract: A printing module configured to print a label on a curved surface of an article includes an expandable printing mechanism configured to be expanded to an open configuration for receiving the article or contracted to a closed configuration placing the curved surface in an operative position with respect to a print head and an article moving assembly configured to grasp and hold the article and effect relative movement between the curved surface and the print head. The printing mechanism includes contact elements, such as rollers, that contact or otherwise engage the article when the printing mechanism is in the closed configuration and maintain the curved surface in the operative position with respect to the print head during relative movement between the curved surface and the print head.
    Type: Grant
    Filed: May 4, 2018
    Date of Patent: February 18, 2020
    Assignee: Gen-Probe Incorporated
    Inventors: Rolf Silbert, Robert J. Rosati, David Buse, Olev Tammer, Matthias Merten
  • Patent number: 10464360
    Abstract: A printing module configured to print a label on a curved surface of an article includes an expandable printing mechanism configured to be expanded to an open configuration for receiving the article or contracted to a closed configuration placing the curved surface in an operative position with respect to a print head and an article moving assembly configured to grasp and hold the article and effect relative movement between the curved surface and the print head. The printing mechanism includes contact elements, such as rollers, that contact or otherwise engage the article when the printing mechanism is in the closed configuration and maintain the curved surface in the operative position with respect to the print head during relative movement between the curved surface and the print head.
    Type: Grant
    Filed: August 4, 2017
    Date of Patent: November 5, 2019
    Assignee: Gen-Probe Incorporated
    Inventors: Rolf Silbert, Robert Rosati, David Buse, Olev Tammer, Matthias Merten
  • Publication number: 20190011473
    Abstract: A sample processing station includes two or more container holders on a platform that is rotatable about a central axis of rotation. Each holder is configured to rotate about a secondary axis of rotation. The station includes a capping/decapping mechanism to cap or decap a container held in one of the container holders and a drip tray movable between a first position not under the capping/decapping mechanism and a second position under the capping/decamping mechanism.
    Type: Application
    Filed: September 11, 2018
    Publication date: January 10, 2019
    Applicant: Gen-Probe Incorporated
    Inventors: Rolf SILBERT, David OPALSKY, David Aaron BUSE, Robert J. ROSATI, Olev TAMMER, Richard CAPELLA, Matthias MERTEN
  • Patent number: 10132821
    Abstract: The present invention provides a processing station for automatically processing a biological sample, a system for automated real-time inventory control of consumables within a biological sample handling or assay instrument, a high throughput random access automated instrument for processing biological samples, an automated instrument for processing or analysis of a sample, and processes for automated mucoid detection and elimination. Methods of using the disclosed instruments, mucoid detection processes, and systems to process and/or analyze samples are also disclosed.
    Type: Grant
    Filed: February 26, 2016
    Date of Patent: November 20, 2018
    Assignee: GEN-PROBE INCORPORATED
    Inventors: Rolf Silbert, David Opalsky, David Aaron Buse, Robert J. Rosati, Olev Tammer, Richard Capella, Matthias Merten
  • Publication number: 20180292427
    Abstract: A sample container of patient sample material includes a sample container barcode containing patient-identifying information. The sample container barcode on the sample container is read, and a tubular reaction vessel is provided to a printer module configured to print a barcode directly onto a surface of the tubular reaction vessel. The printer module prints a barcode on the surface of the reaction vessel by a thermal printing method, and the barcode printed onto the reaction vessel is associated with the sample container barcode.
    Type: Application
    Filed: June 14, 2018
    Publication date: October 11, 2018
    Applicant: Gen-Probe Incorporated
    Inventors: Rolf Silbert, David Aaron Buse, Robert J. Rosati, Olev Tammer, Matthias Merten
  • Publication number: 20180250970
    Abstract: A printing module configured to print a label on a curved surface of an article includes an expandable printing mechanism configured to be expanded to an open configuration for receiving the article or contracted to a closed configuration placing the curved surface in an operative position with respect to a print head and an article moving assembly configured to grasp and hold the article and effect relative movement between the curved surface and the print head. The printing mechanism includes contact elements, such as rollers, that contact or otherwise engage the article when the printing mechanism is in the closed configuration and maintain the curved surface in the operative position with respect to the print head during relative movement between the curved surface and the print head.
    Type: Application
    Filed: May 4, 2018
    Publication date: September 6, 2018
    Applicant: Gen-Probe Incorporated
    Inventors: Rolf SILBERT, Robert ROSATI, David BUSE, Olev TAMMER, Matthias MERTEN
  • Patent number: 9939737
    Abstract: An electrostatic clamp (12) comprising an electrode (2), a layer of resistive material (6) located on the electrode, and a layer of dielectric (8) located on the resistive material, wherein the electrostatic clamp further comprises burls (10) which project from the layer of dielectric.
    Type: Grant
    Filed: December 5, 2013
    Date of Patent: April 10, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Petrus Augustinus Franciscus Klomp, Bastiaan Matthias Mertens, Arnoud Willem Notenboom
  • Publication number: 20170254827
    Abstract: A laboratory automated system can include a host conveyor assembly configured to transport a plurality of carriers and receptacles coupled thereto between at least a sample processing instrument and at least one assay instrument. The system includes an intermediate conveyor assembly configured to transport a plurality of carriers and receptacles coupled thereto from within sample processing instrument to the host conveyor assembly. The system also includes an intermediate conveyor assembly for each assay instrument configured to transport a plurality of carriers from host conveyor assembly to a respective processing position within the assay instrument. The intermediate conveyor assembly coupled to the assay instrument can include a buffer conveyor subassembly configured to receive carriers from the host conveyor assembly, and a spur conveyor assembly configured to transport a carrier to the processing position of the assay instrument.
    Type: Application
    Filed: February 16, 2017
    Publication date: September 7, 2017
    Inventors: George T. WALKER, Matthias MERTEN, Gary D. LAIR
  • Patent number: 9724948
    Abstract: A printing module configured to print a label on a curved surface of an article includes an expandable printing mechanism configured to be expanded to an open configuration for receiving the article or contracted to a closed configuration placing the curved surface in an operative position with respect to a print head and an article moving assembly configured to grasp and hold the article and effect relative movement between the curved surface and the print head. The printing mechanism includes contact elements, such as rollers, that contact or otherwise engage the article when the printing mechanism is in the closed configuration and maintain the curved surface in the operative position with respect to the print head during relative movement between the curved surface and the print head.
    Type: Grant
    Filed: October 21, 2015
    Date of Patent: August 8, 2017
    Assignee: GEN-PROBE INCORPORATED
    Inventors: Rolf Silbert, Robert Rosati, David Buse, Olev Tammer, Matthias Merten
  • Publication number: 20140222271
    Abstract: Systems and method for inductive charging of autonomous mobile robots are provided. The systems and methods increase safety and reduce contaminants such as metal particles in a clean room environment reduce impurities in charging that increase the transfer resistance during charging.
    Type: Application
    Filed: February 7, 2014
    Publication date: August 7, 2014
    Applicant: MetraLabs Automation, Inc.
    Inventors: Matthias Merten, Christian Martin, Andreas Bley
  • Patent number: 7684012
    Abstract: A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.
    Type: Grant
    Filed: March 29, 2006
    Date of Patent: March 23, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Johannes Henricus Wilhelmus Jacobs, Vadim Yevgenyevich Banine, Barrie Dudley Brewster, Vladimir Vitalevitch Ivanov, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors, Robert Gordon Livesey, Bastiaan Theodoor Wolschrijn
  • Patent number: 7491951
    Abstract: The invention relates to a lithographic apparatus that includes a system configured to condition a radiation beam or project a patterned radiation beam onto a target portion of a substrate. The system includes an optically active device configured to direct the radiation beam or the patterned radiation beam, respectively, and a support structure configured to support the optically active device. The apparatus further includes a gas supply for providing a background gas into the system. The radiation beam or patterned radiation beam react with the background gas to form a plasma that includes a plurality of ions. The support structure includes an element that includes a material that has a low sputtering yield, a high sputter threshold energy, or a high ion implantation yield, to reduce sputtering and the creation of sputtering products.
    Type: Grant
    Filed: December 28, 2005
    Date of Patent: February 17, 2009
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Marc Hubertus Lorenz Van Der Velden, Vadim Yevgenyevich Banine, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors, Markus Weiss, Bastiaan Theodoor Wolschrijn, Michiel D. Nijkerk
  • Patent number: 7279690
    Abstract: A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.
    Type: Grant
    Filed: March 31, 2005
    Date of Patent: October 9, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors, Frank Jeroen Pieter Schuurmans, Givi Georgievitch Zukavishvili, Bastiaan Theodoor Wolschrijn, Marc Hubertus Lorenz Van Der Velden
  • Patent number: 7248340
    Abstract: A transport box for transporting a lithographic patterning device and a lithographic apparatus adapted to cooperate with the transport box are presented. The transport box is provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. The box also includes a closure part for closing the opening, and a channel system for evacuating and/or feeding gasses from/to the inner space the box.
    Type: Grant
    Filed: June 24, 2004
    Date of Patent: July 24, 2007
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Leonardus Ham, Robert Gabriël Maria Lansbergen, Ellart Alexander Meijer, Hendricus Johannes Maria Meijer, Hans Meiling, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors, Gert-Jan Heerens
  • Patent number: 7151589
    Abstract: According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. Prior to transfer of the patterning device from the inner space to the apparatus, the inner space is pressurized. The box may also comprise a closure part for closing the opening, and/or a channel system for evacuating and/or feeding gasses from/to the inner space of the box. Other embodiments include a lithographic apparatus comprising and/or configured to cooperate with such a box.
    Type: Grant
    Filed: October 26, 2004
    Date of Patent: December 19, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Leonardus Ham, Gert-Jan Heerens, Robert Gabriël Maria Lansbergen, Ellard Alexander Meijer, Hendricus Johannes Maria Meijer, Hans Meiling, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors
  • Patent number: 7115886
    Abstract: In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.
    Type: Grant
    Filed: October 27, 2004
    Date of Patent: October 3, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Willem Van Schaik, Bastiaan Matthias Mertens, Hans Meiling, Norbertus Benedictus Koster
  • Patent number: 7116394
    Abstract: A cleaning system for removing contamination from at least a part of a surface of a component in a lithographic projection apparatus is disclosed. The cleaning system includes an electric field generator that generates an electric field to provide cleaning particles near the surface of the component.
    Type: Grant
    Filed: December 19, 2003
    Date of Patent: October 3, 2006
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Levinus Pieter Bakker, Ralph Kurt, Bastiaan Matthias Mertens, Markus Weiss, Johann Trenkler, Wolfgang Singer
  • Patent number: 6862075
    Abstract: Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge gas. The contaminant particles can be ionized by generating a plasma in a tube having a greater length than width.
    Type: Grant
    Filed: August 15, 2003
    Date of Patent: March 1, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Norbertus Benedictus Koster, Bastiaan Matthias Mertens, Martinus Hendrikus Antonius Leenders, Vladimir Vital′evitch Ivanov, Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine