Patents by Inventor Matthias Mertens
Matthias Mertens has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200094598Abstract: A printing module configured to print a label on a curved surface of an article includes an expandable printing mechanism configured to be expanded to an open configuration for receiving the article or contracted to a closed configuration placing the curved surface in an operative position with respect to a print head and an article moving assembly configured to grasp and hold the article and effect relative movement between the curved surface and the print head. The printing mechanism includes contact elements, such as rollers, that contact or otherwise engage the article when the printing mechanism is in the closed configuration and maintain the curved surface in the operative position with respect to the print head during relative movement between the curved surface and the print head.Type: ApplicationFiled: November 26, 2019Publication date: March 26, 2020Applicant: Gen-Probe IncorporatedInventors: Rolf SILBERT, Robert J. ROSATI, David BUSE, Olev TAMMER, Matthias MERTEN
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Publication number: 20200094597Abstract: A printing module configured to print a label on a curved surface of an article includes an expandable printing mechanism configured to be expanded to an open configuration for receiving the article or contracted to a closed configuration placing the curved surface in an operative position with respect to a print head and an article moving assembly configured to grasp and hold the article and effect relative movement between the curved surface and the print head. The printing mechanism includes contact elements, such as rollers, that contact or otherwise engage the article when the printing mechanism is in the closed configuration and maintain the curved surface in the operative position with respect to the print head during relative movement between the curved surface and the print head.Type: ApplicationFiled: November 26, 2019Publication date: March 26, 2020Applicant: Gen-Probe IncorporatedInventors: Rolf SILBERT, Robert J. ROSATI, David BUSE, Olev TAMMER, Matthias MERTEN
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Patent number: 10562329Abstract: A printing module configured to print a label on a curved surface of an article includes an expandable printing mechanism configured to be expanded to an open configuration for receiving the article or contracted to a closed configuration placing the curved surface in an operative position with respect to a print head and an article moving assembly configured to grasp and hold the article and effect relative movement between the curved surface and the print head. The printing mechanism includes contact elements, such as rollers, that contact or otherwise engage the article when the printing mechanism is in the closed configuration and maintain the curved surface in the operative position with respect to the print head during relative movement between the curved surface and the print head.Type: GrantFiled: May 4, 2018Date of Patent: February 18, 2020Assignee: Gen-Probe IncorporatedInventors: Rolf Silbert, Robert J. Rosati, David Buse, Olev Tammer, Matthias Merten
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Patent number: 10464360Abstract: A printing module configured to print a label on a curved surface of an article includes an expandable printing mechanism configured to be expanded to an open configuration for receiving the article or contracted to a closed configuration placing the curved surface in an operative position with respect to a print head and an article moving assembly configured to grasp and hold the article and effect relative movement between the curved surface and the print head. The printing mechanism includes contact elements, such as rollers, that contact or otherwise engage the article when the printing mechanism is in the closed configuration and maintain the curved surface in the operative position with respect to the print head during relative movement between the curved surface and the print head.Type: GrantFiled: August 4, 2017Date of Patent: November 5, 2019Assignee: Gen-Probe IncorporatedInventors: Rolf Silbert, Robert Rosati, David Buse, Olev Tammer, Matthias Merten
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Publication number: 20190011473Abstract: A sample processing station includes two or more container holders on a platform that is rotatable about a central axis of rotation. Each holder is configured to rotate about a secondary axis of rotation. The station includes a capping/decapping mechanism to cap or decap a container held in one of the container holders and a drip tray movable between a first position not under the capping/decapping mechanism and a second position under the capping/decamping mechanism.Type: ApplicationFiled: September 11, 2018Publication date: January 10, 2019Applicant: Gen-Probe IncorporatedInventors: Rolf SILBERT, David OPALSKY, David Aaron BUSE, Robert J. ROSATI, Olev TAMMER, Richard CAPELLA, Matthias MERTEN
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Patent number: 10132821Abstract: The present invention provides a processing station for automatically processing a biological sample, a system for automated real-time inventory control of consumables within a biological sample handling or assay instrument, a high throughput random access automated instrument for processing biological samples, an automated instrument for processing or analysis of a sample, and processes for automated mucoid detection and elimination. Methods of using the disclosed instruments, mucoid detection processes, and systems to process and/or analyze samples are also disclosed.Type: GrantFiled: February 26, 2016Date of Patent: November 20, 2018Assignee: GEN-PROBE INCORPORATEDInventors: Rolf Silbert, David Opalsky, David Aaron Buse, Robert J. Rosati, Olev Tammer, Richard Capella, Matthias Merten
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Publication number: 20180292427Abstract: A sample container of patient sample material includes a sample container barcode containing patient-identifying information. The sample container barcode on the sample container is read, and a tubular reaction vessel is provided to a printer module configured to print a barcode directly onto a surface of the tubular reaction vessel. The printer module prints a barcode on the surface of the reaction vessel by a thermal printing method, and the barcode printed onto the reaction vessel is associated with the sample container barcode.Type: ApplicationFiled: June 14, 2018Publication date: October 11, 2018Applicant: Gen-Probe IncorporatedInventors: Rolf Silbert, David Aaron Buse, Robert J. Rosati, Olev Tammer, Matthias Merten
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Publication number: 20180250970Abstract: A printing module configured to print a label on a curved surface of an article includes an expandable printing mechanism configured to be expanded to an open configuration for receiving the article or contracted to a closed configuration placing the curved surface in an operative position with respect to a print head and an article moving assembly configured to grasp and hold the article and effect relative movement between the curved surface and the print head. The printing mechanism includes contact elements, such as rollers, that contact or otherwise engage the article when the printing mechanism is in the closed configuration and maintain the curved surface in the operative position with respect to the print head during relative movement between the curved surface and the print head.Type: ApplicationFiled: May 4, 2018Publication date: September 6, 2018Applicant: Gen-Probe IncorporatedInventors: Rolf SILBERT, Robert ROSATI, David BUSE, Olev TAMMER, Matthias MERTEN
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Patent number: 9939737Abstract: An electrostatic clamp (12) comprising an electrode (2), a layer of resistive material (6) located on the electrode, and a layer of dielectric (8) located on the resistive material, wherein the electrostatic clamp further comprises burls (10) which project from the layer of dielectric.Type: GrantFiled: December 5, 2013Date of Patent: April 10, 2018Assignee: ASML Netherlands B.V.Inventors: Petrus Augustinus Franciscus Klomp, Bastiaan Matthias Mertens, Arnoud Willem Notenboom
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Publication number: 20170254827Abstract: A laboratory automated system can include a host conveyor assembly configured to transport a plurality of carriers and receptacles coupled thereto between at least a sample processing instrument and at least one assay instrument. The system includes an intermediate conveyor assembly configured to transport a plurality of carriers and receptacles coupled thereto from within sample processing instrument to the host conveyor assembly. The system also includes an intermediate conveyor assembly for each assay instrument configured to transport a plurality of carriers from host conveyor assembly to a respective processing position within the assay instrument. The intermediate conveyor assembly coupled to the assay instrument can include a buffer conveyor subassembly configured to receive carriers from the host conveyor assembly, and a spur conveyor assembly configured to transport a carrier to the processing position of the assay instrument.Type: ApplicationFiled: February 16, 2017Publication date: September 7, 2017Inventors: George T. WALKER, Matthias MERTEN, Gary D. LAIR
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Patent number: 9724948Abstract: A printing module configured to print a label on a curved surface of an article includes an expandable printing mechanism configured to be expanded to an open configuration for receiving the article or contracted to a closed configuration placing the curved surface in an operative position with respect to a print head and an article moving assembly configured to grasp and hold the article and effect relative movement between the curved surface and the print head. The printing mechanism includes contact elements, such as rollers, that contact or otherwise engage the article when the printing mechanism is in the closed configuration and maintain the curved surface in the operative position with respect to the print head during relative movement between the curved surface and the print head.Type: GrantFiled: October 21, 2015Date of Patent: August 8, 2017Assignee: GEN-PROBE INCORPORATEDInventors: Rolf Silbert, Robert Rosati, David Buse, Olev Tammer, Matthias Merten
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Publication number: 20140222271Abstract: Systems and method for inductive charging of autonomous mobile robots are provided. The systems and methods increase safety and reduce contaminants such as metal particles in a clean room environment reduce impurities in charging that increase the transfer resistance during charging.Type: ApplicationFiled: February 7, 2014Publication date: August 7, 2014Applicant: MetraLabs Automation, Inc.Inventors: Matthias Merten, Christian Martin, Andreas Bley
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Patent number: 7684012Abstract: A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected from a group including hydrogen, deuterium, heavy hydrogen, deuterated hydrogen, and a mixture of argon and hydrogen.Type: GrantFiled: March 29, 2006Date of Patent: March 23, 2010Assignee: ASML Netherlands B.V.Inventors: Johannes Henricus Wilhelmus Jacobs, Vadim Yevgenyevich Banine, Barrie Dudley Brewster, Vladimir Vitalevitch Ivanov, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors, Robert Gordon Livesey, Bastiaan Theodoor Wolschrijn
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Patent number: 7491951Abstract: The invention relates to a lithographic apparatus that includes a system configured to condition a radiation beam or project a patterned radiation beam onto a target portion of a substrate. The system includes an optically active device configured to direct the radiation beam or the patterned radiation beam, respectively, and a support structure configured to support the optically active device. The apparatus further includes a gas supply for providing a background gas into the system. The radiation beam or patterned radiation beam react with the background gas to form a plasma that includes a plurality of ions. The support structure includes an element that includes a material that has a low sputtering yield, a high sputter threshold energy, or a high ion implantation yield, to reduce sputtering and the creation of sputtering products.Type: GrantFiled: December 28, 2005Date of Patent: February 17, 2009Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Marc Hubertus Lorenz Van Der Velden, Vadim Yevgenyevich Banine, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors, Markus Weiss, Bastiaan Theodoor Wolschrijn, Michiel D. Nijkerk
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Patent number: 7279690Abstract: A lithographic apparatus is arranged to project a beam from a radiation source onto a substrate. The apparatus includes an optical element in a path of the beam, a gas inlet for introducing a gas into the path of the beam so that the gas will be ionized by the beam to create electric fields toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy for sputtering the optical element that is greater than the kinetic energy developed by ions of the gas in the electric fields.Type: GrantFiled: March 31, 2005Date of Patent: October 9, 2007Assignee: ASML Netherlands B.V.Inventors: Levinus Pieter Bakker, Vadim Yevgenyevich Banine, Vladimir Vitalevitch Ivanov, Konstantin Nikolaevitch Koshelev, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors, Frank Jeroen Pieter Schuurmans, Givi Georgievitch Zukavishvili, Bastiaan Theodoor Wolschrijn, Marc Hubertus Lorenz Van Der Velden
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Patent number: 7248340Abstract: A transport box for transporting a lithographic patterning device and a lithographic apparatus adapted to cooperate with the transport box are presented. The transport box is provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. The box also includes a closure part for closing the opening, and a channel system for evacuating and/or feeding gasses from/to the inner space the box.Type: GrantFiled: June 24, 2004Date of Patent: July 24, 2007Assignee: ASML Netherlands B.V.Inventors: Erik Leonardus Ham, Robert Gabriël Maria Lansbergen, Ellart Alexander Meijer, Hendricus Johannes Maria Meijer, Hans Meiling, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors, Gert-Jan Heerens
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Patent number: 7151589Abstract: According to an embodiment, a box for transporting a lithographic patterning device is arranged to cooperate with a lithographic apparatus. The transport box may be provided with a container part having an inner space with a storing position for storing the patterning device and an opening for the transfer of the patterning device. Prior to transfer of the patterning device from the inner space to the apparatus, the inner space is pressurized. The box may also comprise a closure part for closing the opening, and/or a channel system for evacuating and/or feeding gasses from/to the inner space of the box. Other embodiments include a lithographic apparatus comprising and/or configured to cooperate with such a box.Type: GrantFiled: October 26, 2004Date of Patent: December 19, 2006Assignee: ASML Netherlands B.V.Inventors: Erik Leonardus Ham, Gert-Jan Heerens, Robert Gabriël Maria Lansbergen, Ellard Alexander Meijer, Hendricus Johannes Maria Meijer, Hans Meiling, Bastiaan Matthias Mertens, Johannes Hubertus Josephina Moors
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Patent number: 7115886Abstract: In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.Type: GrantFiled: October 27, 2004Date of Patent: October 3, 2006Assignee: ASML Netherlands B.V.Inventors: Willem Van Schaik, Bastiaan Matthias Mertens, Hans Meiling, Norbertus Benedictus Koster
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Patent number: 7116394Abstract: A cleaning system for removing contamination from at least a part of a surface of a component in a lithographic projection apparatus is disclosed. The cleaning system includes an electric field generator that generates an electric field to provide cleaning particles near the surface of the component.Type: GrantFiled: December 19, 2003Date of Patent: October 3, 2006Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Levinus Pieter Bakker, Ralph Kurt, Bastiaan Matthias Mertens, Markus Weiss, Johann Trenkler, Wolfgang Singer
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Patent number: 6862075Abstract: Contaminant particles travelling with a projection beam in a lithographic projection apparatus are ionized. A purge gas may be attracted towards getter plates provided upstream of the purge gas supply. A magnetic field traps electrons generated by the ionizer to improve the ionization of the purge gas. The contaminant particles can be ionized by generating a plasma in a tube having a greater length than width.Type: GrantFiled: August 15, 2003Date of Patent: March 1, 2005Assignee: ASML Netherlands B.V.Inventors: Norbertus Benedictus Koster, Bastiaan Matthias Mertens, Martinus Hendrikus Antonius Leenders, Vladimir Vital′evitch Ivanov, Konstantin Nikolaevitch Koshelev, Vadim Yevgenyevich Banine