Abstract: It is known that in particular components or component accessories are stored in a storage in industrial production. To this end, a depot storage unit for storing small parts is proposed, having a base frame, a rotary table, wherein the rotary table is rotatably supported on the base frame and is rotatable relative to the base frame and wherein the rotary table includes a base plate, a drive device, wherein the drive device is operatively connected to the rotary table, so that the drive device rotates the rotary table, a plurality of receiving boxes, wherein the receiving boxes are arranged on the base plate in the direction of rotation, wherein the depot storage unit includes at least or exactly one sensor device for detecting a weight of at least or exactly one of the receiving boxes.

Abstract: The invention relates to a method for the adjustment of the beam axis of a laser head and an apparatus for this purpose. The method includes the steps of introducing the laser head (3) into a mounting (8), determining the set/actual deviation of the beam axis (2), determining of motions (6A and/or 6B) necessary for reduction of the deviation, and adjustment of the beam axis (2) by driving the adjusting device (4) to generate the adjusting motions (6A and/or 6B), and transmitting the adjusting motions (6A and/or 6B) via the both arms (7A, 7B) of the adjusting lever (7) to the laser head (3) which is arranged in the mounting (8).

Abstract: The invention relates to a method for etching substrates (4) received in an etching solution (2). Said method comprises the following steps: A basin (1) which can receive the etching solution (2) is prepared, the substrate (4) is completely immersed in the etching solution (2), a flow which surrounds the substrate (4) is produced and the speed and/or direction of the flow can be periodically altered.

Abstract: The present invention is directed to a device for retaining substrates (S), such as wafers or silicon substrates for the production of photovoltaic elements. The device includes opposing walls (1) that are interconnected by at least two rod-like carrier elements (2, 3) that are provided with a retaining means (5) for retaining the substrates (S) in a vertical position oriented parallel to the walls (1). At least one rod-like counter carrier element (4) is also provided and interconnects the two walls (1). The counter carrier element (4) is positioned in relation to the carrier elements (2, 3) so that vertical movement of the substrates (S) relative to the walls (1) is limited and loading or unloading of the substrates (S) is possible at a slant in relation to the vertical direction (V).

Abstract: The present invention is directed to a device for retaining substrates (S), such as wafers or silicon substrates for the production of photovoltaic elements. The device includes opposing walls (1) that are interconnected by at least two rod-like carrier elements (2, 3) that are provided with a retaining means (5) for retaining the substrates (S) in a vertical position oriented parallel to the walls (1). At least one rod-like counter carrier element (4) is also provided and interconnects the two walls (1). The counter carrier element (4) is positioned in relation to the carrier elements (2, 3) so that vertical movement of the substrates (S) relative to the walls (1) is limited and loading or unloading of the substrates (S) is possible at a slant in relation to the vertical direction (V).