Patents by Inventor Matthias Schreck

Matthias Schreck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240067759
    Abstract: A mill dried colloidal microcrystalline cellulose (MCC) is obtained in a process comprising the steps of a) providing colloidal MCC having a moisture content of from 20 to 75 percent, based on the total weight of the moist colloidal MCC; and b) mill-drying the moist colloidal MCC in a single device capable of milling and drying in combination. The process can provide mill-dried colloidal microcrystalline cellulose having similar particle size distribution (LEFI, DIFI and EQPC), and a similar or higher tapped/untapped bulk density, a similar or lower Carr index, a similar or higher viscosity and a similar moisture content as the corresponding spray-dried colloidal microcrystalline cellulose.
    Type: Application
    Filed: January 12, 2022
    Publication date: February 29, 2024
    Inventors: Oliver Petermann, Rene Kelling, Olena Vozniuk, Stefan Junge, Michael Schreck, Jing G. Guo, Matthias R. Sprehe
  • Publication number: 20130143022
    Abstract: The present invention relates to a method for producing diamond layers, wherein firstly, in a first growing step, diamond is grown on a growing surface of a off axis or a off-axis heterosubstrate in such a way that a texture width, in particular a polar and/or azimuthal texture width, of a diamond layer produced during the growth decreases with increasing distance from the substrate and then, in a second growing step, diamond is grown in such a way that the texture width of the diamond layer remains substantially constant as the distance from the substrate further increases, and lattice planes of the substrate being inclined by an angle greater than zero with respect to the growing surface.
    Type: Application
    Filed: June 16, 2011
    Publication date: June 6, 2013
    Applicant: UNIVERSITAET AUGSBURG
    Inventors: Matthias Schreck, Stefan Gsell, Martin Fischer
  • Publication number: 20110005454
    Abstract: A plasma reactor and a method for production on wafers over a large area of monocrystalline diamond layers. The plasma reactor includes at least two flat electrodes having surfaces orientated towards each other, the electrodes being delimited respectively by an edge; a plasma region producing a plasma between the surfaces of the electrodes with an ion saturation current density of equal to or greater than 0.001 A/cm2, wherein a gas is introduced into the plasma region; and a device supplying microwaves having at least one frequency, the microwaves radiating into the plasma region and introducing a power into the plasma region contributing to the plasma production. The ion saturation current density of equal to or greater than 0.001 A/cm2 is maintained by controlling at least one of (a) a spacing between the electrodes, (b) the power of the microwaves, and (c) the frequency of the microwaves.
    Type: Application
    Filed: June 16, 2008
    Publication date: January 13, 2011
    Inventors: Matthias Schreck, Stefan Gsell, Martin Fischer
  • Patent number: 7396408
    Abstract: This invention relates to a method for the production of diamond films with low misorientation through the deposition of diamond on a film system, whereby the film system exhibits a substrate film made of monocrystalline silicon or silicon carbide, at least one buffer film arranged on that, and at least one metal film made of a refractory metal arranged on that, whereby the diamond is deposited on the at least one metal film.
    Type: Grant
    Filed: May 3, 2004
    Date of Patent: July 8, 2008
    Assignee: Universität Augsburg
    Inventors: Matthias Schreck, Stefan Gsell, Bernd Stritzker
  • Publication number: 20070084398
    Abstract: This invention relates to a method for the production of diamond films with low misorientation through the deposition of diamond on a film system, whereby the film system exhibits a substrate film made of monocrystalline silicon or silicon carbide, at least one buffer film arranged on that, and at least one metal film made of a refractory metal arranged on that, whereby the diamond is deposited on the at least one metal film.
    Type: Application
    Filed: May 3, 2004
    Publication date: April 19, 2007
    Applicant: UNIVERSITAT AUGSBURG
    Inventors: Matthias Schreck, Stefan Gsell, Bernd Stritzker