Patents by Inventor Matthias Stepper

Matthias Stepper has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Projection exposure apparatus for semiconductor lithography having an optical element with sensor reference and method for aligning the sensor reference
    Patent number: 11754934
    Abstract: A semiconductor lithography projection exposure apparatus includes a sensor reference including reference elements. The apparatus also includes an optical element, which includes a main body comprising receiving elements receiving the reference elements. The optical element further includes a referential surface that is an optically active surface of the optical element. The reference elements are arranged to determine a position and an orientation of the optical element. A method includes aligning a sensor reference with respect to a referential surface in a semiconductor lithography projection exposure apparatus.
    Type: Grant
    Filed: September 14, 2021
    Date of Patent: September 12, 2023
    Assignee: Carl Zeiss SMT GmbH
    Inventors: Peter Nieland, Matthias Stepper, Hans-Martin Hoevel
  • PROJECTION EXPOSURE APPARATUS FOR SEMICONDUCTOR LITHOGRAPHY HAVING AN OPTICAL ELEMENT WITH SENSOR REFERENCE AND METHOD FOR ALIGNING THE SENSOR REFERENCE
    Publication number: 20220004111
    Abstract: A semiconductor lithography projection exposure apparatus includes a sensor reference including reference elements. The apparatus also includes an optical element, which includes a main body comprising receiving elements receiving the reference elements. The optical element further includes a referential surface that is an optically active surface of the optical element. The reference elements are arranged to determine a position and an orientation of the optical element. A method includes aligning a sensor reference with respect to a referential surface in a semiconductor lithography projection exposure apparatus.
    Type: Application
    Filed: September 14, 2021
    Publication date: January 6, 2022
    Inventors: Peter Nieland, Matthias Stepper, Hans-Martin Hoevel