Abstract: A confocal microscope for determination of a layer thickness comprises: a focus adjusting device configured to adjust a relative displacement between a focus position of the illumination light and a specimen position along an optical axis, wherein measurement signals belonging to different settings of the focus adjusting device can be recorded; an evaluation device for determining a specimen layer thickness as follows: determine intensity band positions of two intensity bands in a measurement graph recorded by a light measuring device, the measurement graph indicating a light intensity in dependence of the focus position; determine a layer thickness on the basis of a positional difference between the intensity band positions; and determine the layer thickness using a mathematical model which describes for overlapping intensity bands a dependence of the intensity band positions on a light wavelength and the layer thickness, considering interference of the illumination light at the layer.

Abstract: A confocal microscope for determination of a layer thickness comprises: a focus adjusting device configured to adjust a relative displacement between a focus position of the illumination light and a specimen position along an optical axis, wherein measurement signals belonging to different settings of the focus adjusting device can be recorded; an evaluation device for determining a specimen layer thickness as follows: determine intensity band positions of two intensity bands in a measurement graph recorded by a light measuring device, the measurement graph indicating a light intensity in dependence of the focus position; determine a layer thickness on the basis of a positional difference between the intensity band positions; and determine the layer thickness using a mathematical model which describes for overlapping intensity bands a dependence of the intensity band positions on a light wavelength and the layer thickness, considering interference of the illumination light at the layer.

Abstract: A method for determining roughness data and/or topography data of surfaces in material microscopy, particularly from flat samples, based on a shearing polarization interferometrical sequence with a microscopic “TIC” module (“Total Interference Contrast Module”) of a microscope, wherein the method can be carried out both polychromatically and monochromatically. At least two tilted wave fronts are generated, which after reflection or transmission on a sample generate two images of said sample in the form of fringe patterns, said images being offset relative to one another and interfering with one another, from which roughness values and height topographies of the surface of the sample are determined by application of image evaluation.

Abstract: A method for determining roughness data and/or topography data of surfaces in material microscopy, particularly from flat samples, based on a shearing polarization interferometrical sequence with a microscopic “TIC” module (“Total Interference Contrast Module”) of a microscope, wherein the method can be carried out both polychromatically and monochromatically. At least two tilted wave fronts are generated, which after reflection or transmission on a sample generate two images of said sample in the form of fringe patterns, said images being offset relative to one another and interfering with one another, from which roughness values and height topographies of the surface of the sample are determined by application of image evaluation.

Abstract: The invention relates to a useful improvement of an ellipsometer-type device. For this purpose, an existing ellipsometer is supplemented by a so-called resonance platform on which surface modes are excitable. Contrary to state of the art of known surface plasmons, the inventive modes are laterally localized. In addition, the resonance platform is not necessarily embodied in the form of a metal sheet. The inventive device also can be embodied in the form of an image-forming device. The inventive method consists in placing measurable samples on the platform surface and, afterwards, are exposed to light, thereby being excited in modes. The resonance position of modes is determined by the absorption behavior of a measurable substance.

Abstract: SPR sensor, in particular for detection of a layer of material, essentially consisting of a source for coherent monochromatic electromagnetic waves, a medium with a tunable index of refraction, and an imaging detection system, wherein the medium is designed as an optical resonator that has a first and a second opposing end face, upon each of which is applied at least one coating that is suitable for producing surface plasmon resonances, and wherein the imaging detection system has a polarization device and is designed such that at least one ellipsometric quantity produced by the SPR sensor in the reflected part of the incident coherent monochromatic electromagnetic wave can be detected.

Abstract: SPR sensor, in particular for detection of a layer of material, essentially consisting of a source for coherent monochromatic electromagnetic waves, a medium with a tunable index of refraction, and an imaging detection system, wherein the medium is designed as an optical resonator that has a first and a second opposing end face, upon each of which is applied at least one coating that is suitable for producing surface plasmon resonances, and wherein the imaging detection system has a polarization device and is designed such that at least one ellipsometric quantity produced by the SPR sensor in the reflected part of the incident coherent monochromatic electromagnetic wave can be detected.