Abstract: A method for verifying repairs on masks for photolithography is provided. A mask fabricated based on a mask layout is inspected for defects, and the positions at which defects are found on the mask are stored in a position file. In a repair step, the defects are repaired and, for each repaired position, in a verification step, an aerial image of the mask is taken at that position and the aerial image is analyzed to determine whether at that position the mask meets tolerance criteria established for one or more selected target parameters, and if the tolerance criteria have been met, the repair is verified. The verification can include a) based on the position file, a desired structure is defined in the mask layout at the repaired position, b) an aerial image is simulated for the desired structure, c) the captured aerial image is compared with the simulated one, and d) based on the comparison, a decision is made as to whether the repair at that position is verified.

Abstract: The goal of the present invention is to improve the useful data efficiency and reliability in the use of commercially available ETHERNET controllers, in a distributed real time computer system, by a number of node computers communicating via one or more communication channels by means of TT ETHERNET messages. To achieve this goal, a distinction is made between the node computer send time (KNSZPKT) and the network send time (NWSZPKT) of a message. The KNSZPKT must wait for the NWSZPKT, so that under all circumstances, the start of the message has arrived in the TT star coupler at the NWSZPKT, interpreted by the clock in the TT star coupler. The TT star coupler is modified, so that a message arriving from a node computer is delayed in an intelligent port of the TT star coupler until the NWSZPKT can send it precisely at the NWSZPKT into the TT network.

Abstract: A method for verifying repairs on masks for photolithography is provided. A mask fabricated based on a mask layout is inspected for defects, and the positions at which defects are found on the mask are stored in a position file. In a repair step, the defects are repaired and, for each repaired position, in a verification step, an aerial image of the mask is taken at that position and the aerial image is analyzed to determine whether at that position the mask meets tolerance criteria established for one or more selected target parameters, and if the tolerance criteria have been met, the repair is verified. The verification can include a) based on the position file, a desired structure is defined in the mask layout at the repaired position, b) an aerial image is simulated for the desired structure, c) the captured aerial image is compared with the simulated one, and d) based on the comparison, a decision is made as to whether the repair at that position is verified.