Abstract: Driver laser systems for EUV radiation producing apparatuses are disclosed that include a beam source for producing laser radiation propagating in a first direction, an amplifier arrangement comprising at least one optical amplifier for amplifying the laser radiation propagating in the first direction, and at least one optical isolator. The optical isolator includes a chamber filled with a gas, through which chamber the laser radiation propagating in the first direction passes, and a plasma generating device configured for the pulsed ignition of a plasma in the gas of the chamber to suppress passage of laser radiation propagating in a second direction, opposite to the first direction, through the chamber. EUV radiation producing apparatuses that include such driver laser systems are also disclosed.

Abstract: Methods, devices, and systems for amplifying laser pulses having different wavelengths in a drive laser assembly for an extreme ultraviolet (EUV) radiation generating device are provided. The drive laser assembly includes a radiation source configured to generate a first laser pulse having a first wavelength and a second laser pulse having a second wavelength, and an amplifier assembly having at least one optical amplifier for amplifying the first laser pulse and the second laser pulse. The amplifier assembly has at least one wavelength-selective optical element configured to attenuate the first laser pulse at the first wavelength more strongly than the second laser pulse at the second wavelength.

Abstract: Systems, methods, and apparatus, including non-transitory computer-readable storage medium, for amplifying pulsed laser radiation in an EUV laser driver are provided. An example EUV laser driver includes a beam source configured to produce the pulsed laser radiation with at least one laser frequency, an amplifier arrangement with at least one optical amplifier for amplifying the pulsed laser radiation, the at least one optical amplifier having a frequency-dependent gain with a maximum gain at a maximum frequency, at least one frequency shifter configured to produce a frequency shift for the laser frequency of the pulsed laser radiation relative to the maximum frequency, and a controller configured to set the frequency shift such that a gain of the at least one optical amplifier for the pulsed laser radiation is reduced to less than a percentage, e.g., 90%, 70%, or 50%, of the maximum gain.

Abstract: Driver laser systems for EUV radiation producing apparatuses are disclosed that include a beam source for producing laser radiation propagating in a first direction, an amplifier arrangement comprising at least one optical amplifier for amplifying the laser radiation propagating in the first direction, and at least one optical isolator. The optical isolator includes a chamber filled with a gas, through which chamber the laser radiation propagating in the first direction passes, and a plasma generating device configured for the pulsed ignition of a plasma in the gas of the chamber to suppress passage of laser radiation propagating in a second direction, opposite to the first direction, through the chamber. EUV radiation producing apparatuses that include such driver laser systems are also disclosed.

Abstract: Methods, devices, and systems for amplifying laser pulses having different wavelengths in a drive laser assembly for an extreme ultraviolet (EUV) radiation generating device are provided. The drive laser assembly includes a radiation source configured to generate a first laser pulse having a first wavelength and a second laser pulse having a second wavelength, and an amplifier assembly having at least one optical amplifier for amplifying the first laser pulse and the second laser pulse. The amplifier assembly has at least one wavelength-selective optical element configured to attenuate the first laser pulse at the first wavelength more strongly than the second laser pulse at the second wavelength.

Abstract: Systems, methods, and apparatus, including non-transitory computer-readable storage medium, for amplifying pulsed laser radiation in an EUV laser driver are provided. An example EUV laser driver includes a beam source configured to produce the pulsed laser radiation with at least one laser frequency, an amplifier arrangement with at least one optical amplifier for amplifying the pulsed laser radiation, the at least one optical amplifier having a frequency-dependent gain with a maximum gain at a maximum frequency, at least one frequency shifter configured to produce a frequency shift for the laser frequency of the pulsed laser radiation relative to the maximum frequency, and a controller configured to set the frequency shift such that a gain of the at least one optical amplifier for the pulsed laser radiation is reduced to less than a percentage, e.g., 90%, 70%, or 50%, of the maximum gain.

Abstract: Systems, methods, and apparatus, including non-transitory computer-readable storage medium, for amplifying pulsed laser radiation in an EUV laser driver are provided. An example EUV laser driver includes a beam source configured to produce the pulsed laser radiation with at least one laser frequency, an amplifier arrangement with at least one optical amplifier for amplifying the pulsed laser radiation, the at least one optical amplifier having a frequency-dependent gain with a maximum gain at a maximum frequency, at least one frequency shifter configured to produce a frequency shift for the laser frequency of the pulsed laser radiation relative to the maximum frequency, and a controller configured to set the frequency shift such that a gain of the at least one optical amplifier for the pulsed laser radiation is reduced to less than a percentage, e.g., 90%, 70%, or 50%, of the maximum gain.