Patents by Inventor Matthieu Sérégé

Matthieu Sérégé has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240111217
    Abstract: The invention relates to a method of directional self-assembly lithography, said method comprising a step of depositing a block copolymer film on a layer (20) neutral with respect the block copolymer, said block copolymer film being for use as a lithography mask, said method being characterized in that it comprises the following steps of: depositing said neutral layer (20) on a surface of a substrate (10), said neutral layer (20) being of the carbon or fluoro-carbon type deposited to a thickness greater than 1.
    Type: Application
    Filed: October 15, 2020
    Publication date: April 4, 2024
    Inventors: Xavier Chevalier, Matthieu Sérégé, Cindy Gomes Correia, Marc Zelsmann, Guillaume Fleury