Patents by Inventor Matti Putkonen
Matti Putkonen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10500580Abstract: Provided is a method forming a catalytic nanocoating on a surface of a metal plate, wherein the method comprises pretreating the surface of the metal plate by means of heat treatment at 500-800° C., forming a metaloxide support by washcoating on the surface of the metal plate, and coating the surface of the metal plate by depositing catalytically active metals and/or metaloxides on the metaloxide support by means of an atomic layer deposition (ALD) method in order to form a thin and conformal catalyst layer on the metal plate. Further, the invention relates to a catalyst and a use.Type: GrantFiled: December 8, 2015Date of Patent: December 10, 2019Assignee: TEKNOLOGIAN TUTKIMUSKESKUS VTT OYInventors: Pekka Simell, Matti Reinikainen, Matti Putkonen, Johanna Kihlman
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Publication number: 20170361311Abstract: Provided is a method forming a catalytic nanocoating on a surface of a metal plate, wherein the method comprises pretreating the surface of the metal plate by means of heat treatment at 500-800° C., forming a metaloxide support by washcoating on the surface of the metal plate, and coating the surface of the metal plate by depositing catalytically active metals and/or metaloxides on the metaloxide support by means of an atomic layer deposition (ALD) method in order to form a thin and conformal catalyst layer on the metal plate. Further, the invention relates to a catalyst and a use.Type: ApplicationFiled: December 8, 2015Publication date: December 21, 2017Applicant: TEKNOLOGIAN TUTKIMUSKESKUS VTT OYInventors: Pekka SIMELL, Matti REINIKAINEN, Matti PUTKONEN, Johanna KIHLMAN
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Patent number: 8894723Abstract: A method for the formation of lithium includes a layer on a substrate using an atomic layer deposition method. The method includes the sequential pulsing of a lithium precursor through a reaction chamber for deposition upon a substrate. Using further oxidizing pulses and or other metal containing precursor pulses, an electrolyte suitable for use in thin film batteries may be manufactured.Type: GrantFiled: December 23, 2008Date of Patent: November 25, 2014Assignee: Universitetet I OsloInventors: Ola Nilsen, Helmer Fjellvåg, Mari Endresen Alnes, Titta Aaltonen, Matti Putkonen
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Patent number: 8780314Abstract: A strengthened structural module (2) and a method for fabricating a strengthened structural module (2). The module comprises an essentially planar glass substrate (1), an essentially planar second substrate (3), and at least one spacer element (5) in between the glass substrate (1) and the second substrate (3). The at least one spacer element (5) keeps the glass substrate (1) and the second substrate (3) separated from each other from the edges of the two substrates and defines a space (7) in between the two substrates in the inside of the module. The module comprises a coating (9) surrounding the module around the outside of the module. The coating (9) is arranged conformally on the surfaces facing the outside of the module, for increasing the strength of the module.Type: GrantFiled: January 31, 2011Date of Patent: July 15, 2014Assignee: Beneq OyInventors: Olli Jylhä, Matti Putkonen, Arto Pakkala
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Patent number: 8758851Abstract: A method for increasing the durability of glass by a coating, according to the present invention comprises the step of coating glass with a coating comprising at least one layer whose thickness is below 5 nanometers, wherein the coating comprises a compound of at least one element.Type: GrantFiled: December 1, 2008Date of Patent: June 24, 2014Assignee: Beneq OyInventors: Markku Rajala, Matti Putkonen
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Publication number: 20130130044Abstract: A decorative coating and a method for forming a decorative coating on a gemstone to change the natural visual appearance of the gemstone. The decorative coating comprises an optically absorbing film. Depositing the absorbing film on the substrate comprises the alternating steps of introducing a first precursor to the reaction space such that at least a portion of the first precursor gets adsorbed onto the surface of the substrate, and subsequently purging the reaction space, and introducing a second precursor to the reaction space such that at least a portion of the second precursor reacts with the portion of the first precursor adsorbed onto the surface of the substrate to form a conformal absorbing film on the substrate comprising the gemstone, and subsequently purging the reaction space. The material of the absorbing film is selected from the group of oxides, carbides, noble metals or a mixture thereof.Type: ApplicationFiled: November 19, 2010Publication date: May 23, 2013Applicant: Beneq OyInventors: Jarmo Maula, Matti Putkonen
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Publication number: 20120307193Abstract: A strengthened structural module (2) and a method for fabricating a strengthened structural module(2). The module comprises an essentially planar glass substrate (1), an essentially planar second substrate (3), and at least one spacer element (5) in between the glass substrate (1) and the second substrate (3). The at least one spacer element (5) keeps the glass substrate (1) and the second substrate (3) separated from each other from the edges of the two substrates and defines a space (7) in between the two substrates in the inside of the module. The module comprises a coating (9) surrounding the module around the outside of the module. The coating (9) is arranged conformally on the surfaces facing the outside of the module, for increasing the strength of the module.Type: ApplicationFiled: January 31, 2011Publication date: December 6, 2012Applicant: Beneq OyInventors: Olli Jylhä, Matti Putkonen, Arto Pakkala
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Publication number: 20120177903Abstract: A multilayer coating and a method for fabricating a multilayer coating on a substrate (3). The coating is arranged to minimize diffusion of atoms through the coating, the method comprising the steps of introducing a substrate (3) to a reaction space, depositing a layer of first material (1) on the substrate (3), and depositing a layer of second material (2) on the layer of first material (1). Depositing the layer of first material (1) and the layer of second material (2) comprises alternately introducing precursors into the reaction space and subsequently purging the reaction space after each introduction of a precursor. The first material being selected from the group of titanium oxide and aluminum oxide, the second material being the other from the group of titanium oxide and aluminum oxide. An interfacial region is formed in between titanium oxide and aluminum oxide.a.Type: ApplicationFiled: September 13, 2010Publication date: July 12, 2012Applicant: Beneq OyInventors: Sami Sneck, Nora Isomäki, Jarmo Maula, Olli Jylhä, Matti Putkonen, Runar Törnqvist, Mikko Söderlund
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Patent number: 7998883Abstract: This invention concerns a process for producing oxide thin film on a substrate by an ALD type process. According to the process, alternating vapour-phase pulses of at least one metal source material, and at least one oxygen source material are fed into a reaction space and contacted with the substrate. According to the invention, an yttrium source material and a zirconium source material are alternately used as the metal source material so as to form an yttrium-stabilised zirconium oxide (YSZ) thin film on a substrate.Type: GrantFiled: June 22, 2010Date of Patent: August 16, 2011Assignee: ASM International N.V.Inventor: Matti Putkonen
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Publication number: 20110111175Abstract: A method for increasing the durability of glass (1) by a coating, according to the present invention comprises the step of coating glass (1) with a coating comprising at least one layer (4, 5, 6) whose thickness is below 5 nanometres, wherein the coating comprises a compound of at least one element. A glass product comprising a coating, according to the present invention is fabricated by coating glass (1) with a coating comprising at least one layer (4, 5, 6) whose thickness is below 5 nanometres. A glass product comprising a coating, according to the present invention comprises surface scratches (2) with a width at the level of the glass (1) surface of below 50 nanometres, the coating residing essentially conformally on the inside of the surface scratches (2) to increase the durability of the glass (1).Type: ApplicationFiled: December 1, 2008Publication date: May 12, 2011Applicant: Beneq OyInventors: Markku Rajala, Matti Putkonen
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Publication number: 20110099798Abstract: The present invention discloses a method for the formation of lithium comprising layer on a substrate using an atomic layer deposition method. The method comprises the sequential pulsing of a lithium precursor through a reaction chamber for deposition upon a substrate. Using further oxidising pulses and or other metal containing precursor pulses, an electrolyte suitable for use in thin film batteries may be manufactured.Type: ApplicationFiled: December 23, 2008Publication date: May 5, 2011Applicant: UNIVERSITETET I OSLOInventors: Ola Nilsen, Helmer Fjellvag, Mari Endresen Alnes, Titta Aaltonen, Matti Putkonen
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Publication number: 20110041556Abstract: Process for improving the chemical durability of glass by modifying at least one surface of a glass substrate. The modification process utilizes crystalline metal oxide particles with a mean aerodynamic particle diameter of less than 1000 nm, which are at least partially embedded on and into the glass surface. Apparatus for depositing crystalline metal oxide particles on glass surface.Type: ApplicationFiled: February 17, 2009Publication date: February 24, 2011Applicant: BENEQ OYInventors: Markku Rajala, Matti Putkonen, Sampo Ahonen, Joe Pimenoff, Anssi Hovinen, Sami Sneck
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Publication number: 20100266751Abstract: This invention concerns a process for producing oxide thin film on a substrate by an ALD type process. According to the process, alternating vapour-phase pulses of at least one metal source material, and at least one oxygen source material are fed into a reaction space and contacted with the substrate. According to the invention, an yttrium source material and a zirconium source material are alternately used as the metal source material so as to form an yttrium-stabilised zirconium oxide (YSZ) thin film on a substrate.Type: ApplicationFiled: June 22, 2010Publication date: October 21, 2010Applicant: ASM International N.V.Inventor: Matti Putkonen
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Patent number: 7754621Abstract: This invention concerns a process for producing oxide thin film on a substrate by an ALD type process. According to the process, alternating vapor-phase pulses of at least one metal source material, and at least one oxygen source material are fed into a reaction space and contacted with the substrate. According to the invention, an yttrium source material and a zirconium source material are alternately used as the metal source material so as to form an yttrium-stabilized zirconium oxide (YSZ) thin film on a substrate.Type: GrantFiled: September 28, 2007Date of Patent: July 13, 2010Assignee: ASM International N.V.Inventor: Matti Putkonen
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Patent number: 7498272Abstract: The present invention concerns a process for depositing rare earth oxide thin films, especially yttrium, lanthanum and gadolinium oxide thin films by an ALD process, according to which invention the source chemicals are cyclopentadienyl compounds or rare earth metals, especially those of yttrium, lanthanum and gadolinium. Suitable deposition temperatures for yttrium oxide are between 200 and 400° C. when the deposition pressure is between 1 and 50 mbar. Most suitable deposition temperatures for lanthanum oxide are between 160 and 165° C. when the deposition pressure is between 1 and 50 mbar.Type: GrantFiled: December 28, 2004Date of Patent: March 3, 2009Assignee: ASM International N.V.Inventors: Jaakko Niinistö, Matti Putkonen, Mikko Ritala, Petri Räisänen, Antti Niskanen, Markku Leskelä
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Publication number: 20090035949Abstract: The present invention concerns a process for depositing rare earth oxide thin films, especially yttrium, lanthanum and gadolinium oxide thin films by an ALD process, according to which invention the source chemicals are cyclopentadienyl compounds or rare earth metals, especially those of yttrium, lanthanum and gadolinium. Suitable deposition temperatures for yttrium oxide are between 200 and 400° C. when the deposition pressure is between 1 and 50 mbar. Most suitable deposition temperatures for lanthanum oxide are between 160 and 165° C. when the deposition pressure is between 1 and 50 mbar.Type: ApplicationFiled: December 28, 2004Publication date: February 5, 2009Inventors: Jaakko Niinisto, Matti Putkonen, Mikko Ritala, Petri Raisanen, Antti Niskanen, Markku Leskela
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Patent number: 7351658Abstract: This invention concerns a process for producing oxide thin film on a substrate by an ALD type process. According to the process, alternating vapour-phase pulses of at least one metal source material, and at least one oxygen source material are fed into a reaction space and contacted with the substrate. According to the invention, an yttrium source material and a zirconium source material are alternately used as the metal source material so as to form an yttrium-stabilised zirconium oxide (YSZ) thin film on a substrate.Type: GrantFiled: August 13, 2004Date of Patent: April 1, 2008Inventor: Matti Putkonen
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Patent number: RE46610Abstract: A method for the formation of lithium includes a layer on a substrate using an atomic layer deposition method. The method includes the sequential pulsing of a lithium precursor through a reaction chamber for deposition upon a substrate. Using further oxidizing pulses and or other metal containing precursor pulses, an electrolyte suitable for use in thin film batteries may be manufactured.Type: GrantFiled: November 23, 2016Date of Patent: November 14, 2017Assignee: Universitetet I OsloInventors: Ola Nilsen, Helmer Fjellvåg, Mari Endresen Alnes, Titta Aaltonen, Matti Putkonen
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Patent number: RE47325Abstract: A method for the formation of lithium includes a layer on a substrate using an atomic layer deposition method. The method includes the sequential pulsing of a lithium precursor through a reaction chamber for deposition upon a substrate. Using further oxidizing pulses and or other metal containing precursor pulses, an electrolyte suitable for use in thin film batteries may be manufactured.Type: GrantFiled: November 8, 2017Date of Patent: March 26, 2019Assignee: Universitetet I OsloInventors: Ola Nilsen, Helmer Fjellvåg, Mari Endresen Alnes, Titta Aaltonen, Matti Putkonen
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Patent number: RE48853Abstract: A method for the formation of lithium includes a layer on a substrate using an atomic layer deposition method. The method includes the sequential pulsing of a lithium precursor through a reaction chamber for deposition upon a substrate. Using further oxidizing pulses and or other metal containing precursor pulses, an electrolyte suitable for use in thin film batteries may be manufactured.Type: GrantFiled: January 25, 2019Date of Patent: December 14, 2021Assignee: Universitetet I OsloInventors: Ola Nilsen, Helmer Fjellvåg, Mari Endresen Alnes, Titta Aaltonen, Matti Putkonen