Patents by Inventor Maurice Henricus Janssen

Maurice Henricus Janssen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithography measurements using scatterometry
    Publication number: 20060192936
    Abstract: A lithographic apparatus includes an illuminator configured to condition a beam of radiation and a support configured to hold a patterning device. The patterning device is configured to pattern the beam of radiation according to a desired pattern. The lithographic apparatus also includes a substrate table configured to hold a substrate and a projection system configured to project the patterned beam onto a target portion of the substrate to form a patterned image on the substrate. The apparatus further includes a sensor configured and arranged to intercept a portion of the beam and to measure a transmission of the beam through at least a portion of the patterning device.
    Type: Application
    Filed: February 14, 2006
    Publication date: August 31, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Koen Schenau, Maurice Henricus Janssen, Antoine Kiers, Hans Laan, Peter Vanoppen