Patents by Inventor Max Kuisl

Max Kuisl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6020217
    Abstract: The invention relates to a semiconductor device which includes a packaged electrical component such as an IC chip, wherein terminal posts are realized within the chip area without additional wafer surface being required beyond the chip edge. A direct feedthrough of the individual electrical connections by way of downwardly extending terminal posts that are connected to bonding pads at the top of the chip results in a small lead length and thus lesser parasitic influences, which in turn results in optimum conditions for use at super-high frequencies. Furthermore, a process for making the semiconductor device offers the option of forming deep vertical trenches on the chip edge and to thus implement separation etching for dicing. During this process, the coverage of the side surface with encapsulating material effects a passivation on the chip edge without further outlay. Expensive rewiring of the connections on the bottom side of the chip is not necessarily due to the terminal posts.
    Type: Grant
    Filed: February 20, 1998
    Date of Patent: February 1, 2000
    Assignee: Daimler-Benz Aktiengesellschaft
    Inventors: Max Kuisl, Karl Strohm, Manfred R.o slashed.sler
  • Patent number: 4735643
    Abstract: A method for producing an aerosol stream, particularly an aerosol stream suitable for the production of a preform for an optical fiber. At least two gas phase reactants are reacted in a reaction chamber to form the aerosol stream. Undesirable deposition of liqid or solid reaction products, particularly at the point of entry into the reaction chamber, is avoided by the addition of at least one gas phase product to at least one of the gas phase reactants.
    Type: Grant
    Filed: August 20, 1986
    Date of Patent: April 5, 1988
    Assignee: Licentia Patent-Verwaltungs-GmbH
    Inventor: Max Kuisl
  • Patent number: 4650693
    Abstract: A process for producing an aerosol stream, which is conducted through an essentially aerosol-free vapor and/or gas stream to prevent undesirable precipitation of particles contained in the aerosol stream, is augmented by additionally employing thermophoresis. For this purpose, the vapor and/or gas stream is heated to a temperature which is higher than the temperature of the aerosol stream. Thermophoresis then causes the particles to be held within the aerosol stream.
    Type: Grant
    Filed: July 22, 1985
    Date of Patent: March 17, 1987
    Assignee: Licentia Patent-Verwaltungs-GmbH
    Inventor: Max Kuisl
  • Patent number: 4636364
    Abstract: A method and apparatus for producing a directed aerosol stream from gaseous and/or vapor phase reactants by conveying the reactants to a reaction site, reacting the reactants at the reaction site in a flame free chemical reaction to produce an aerosol composition, and causing the aerosol composition to flow from the reaction site and immediately surrounding the aerosol composition with a moving, essentially aerosol free gas and/or vapor stream to form a directed aerosol stream enveloped in the aerosol free stream, in which the step of conveying includes conducting each reactant through a respective distributor and then through a discharge element having a substantially higher flow resistance than the distributor in a substantially vertical upward direction to the reaction site, and the step of causing is carried out so that the aerosol composition flows in a substantially vertical upward direction.
    Type: Grant
    Filed: May 3, 1985
    Date of Patent: January 13, 1987
    Assignee: Licentia Patent-Verwaltungs-GmbH
    Inventors: Arthur Geyer, Max Kuisl, Eugen Pfeiffer, Helmut Roese, Werner Klein
  • Patent number: 4597983
    Abstract: The present invention relates to a method for producing a directed aerosol stream by a flame free reaction which is conducted while enveloped within an aerosol free gas and/or vapor stream. It is particularly suitable for use in coating systems, as it permits economical coating without so-called wall deposits.
    Type: Grant
    Filed: July 19, 1984
    Date of Patent: July 1, 1986
    Assignee: Licentia Patent-Verwaltungs-GmbH
    Inventors: Reinhart Kuhne, Max Kuisl
  • Patent number: 4564378
    Abstract: A method of producing a preform for light waveguides wherein glass-forming chlorides, e.g. SiCl.sub.4 and/or GeCl.sub.4, are reacted with water vapor to form a glass forming layer, e.g. SiO.sub.2 soot. This reaction advantageously takes place at relatively low temperatures, e.g. 20.degree. C.-800.degree. C. Surprisingly, almost no SiO.sub.2 deposition takes place on higher heated surfaces, e.g. in the reaction chamber. Elimination of annoying OH.sup.- ions is possible.
    Type: Grant
    Filed: February 9, 1984
    Date of Patent: January 14, 1986
    Assignee: Licentia Patent-Verwaltungs-GmbH
    Inventor: Max Kuisl
  • Patent number: 4490678
    Abstract: A method of measuring ion concentrations in solutions comprises using at least two ion sensitive test electrodes in the solution to be measured, the test electrodes having different sensitivities only in respect of the ion or ion mixture to be measured, setting the operating point of the test electrodes by means of at least one common reference electrode, and evaluating the signals of the test electrodes to produce a measurement result essentially independent of the properties of the reference and test electrodes which would interfere with accurate measurement.The invention also includes apparatus suitable for carrying out the method.
    Type: Grant
    Filed: May 13, 1982
    Date of Patent: December 25, 1984
    Assignee: Licentia Patent-Verwaltungs-G.m.b.H.
    Inventors: Max Kuisl, Manfred Klein
  • Patent number: 3998675
    Abstract: A method of doping a semiconductor body comprises applying to a surface of the semiconductor body a layer through which the doping material can diffuse and provide the layer with a reducing agent to reduce the doping material to its elemental form at areas where doping is not required.
    Type: Grant
    Filed: November 11, 1975
    Date of Patent: December 21, 1976
    Assignee: Licentia Patent-Verwaltungs-G.m.b.H.
    Inventors: Werner Langheinrich, Max Kuisl, Anton Sturmer, Friedrich Lammel