Patents by Inventor Max Lau

Max Lau has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Phase-shift photomask and patterning method
    Publication number: 20110159411
    Abstract: A phase shift photomask blank has a quartz substrate, a lower chrome layer, a light-absorbing MoSi layer, and an upper chrome layer. This mask can be patterned in various ways to form a patterned photomask with both phase shift and binary areas.
    Type: Application
    Filed: December 30, 2009
    Publication date: June 30, 2011
    Inventors: Bennett Olson, Max Lau, Cheng-hsin Ma, Jian Ma, Andrew T. Jamieson
  • Dynamic sampling with efficient model for overlay
    Patent number: 7571420
    Abstract: The present invention describes a method including: determining field-clustering scheme; selecting initial sample plan; establishing initial model of overlay, the initial model of overlay comprising components; and establishing efficient model of overlay from the initial model of overlay including: constructing matrices; identifying redundant components and eliminating the redundant components; and identifying highly-correlated components and determining whether to eliminate the highly-correlated components.
    Type: Grant
    Filed: February 16, 2007
    Date of Patent: August 4, 2009
    Assignee: Intel Corporation
    Inventors: Alan Wong, Jeff Drautz, Joseph D. Shindler, Max Lau, George Chen
  • DYNAMIC SAMPLING WITH EFFICIENT MODEL FOR OVERLAY
    Publication number: 20080201117
    Abstract: The present invention describes a method including: determining field-clustering scheme; selecting initial sample plan; establishing initial model of overlay, the initial model of overlay comprising components; and establishing efficient model of overlay from the initial model of overlay including: constructing matrices; identifying redundant components and eliminating the redundant components; and identifying highly-correlated components and determining whether to eliminate the highly-correlated components.
    Type: Application
    Filed: February 16, 2007
    Publication date: August 21, 2008
    Inventors: Alan Wong, Jeff Drautz, Joseph D. Shindler, Max Lau, George Chen
  • Optimization of sample plan for overlay
    Patent number: 7197722
    Abstract: The present invention describes a method including: determining field-clustering scheme; selecting initial sample plan; establishing initial model of overlay, the initial model of overlay comprising components; and establishing efficient model of overlay from the initial model of overlay including: constructing matrices; identifying redundant components and eliminating the redundant components; and identifying highly-correlated components and determining whether to eliminate the highly-correlated components.
    Type: Grant
    Filed: September 30, 2004
    Date of Patent: March 27, 2007
    Assignee: Intel Corporation
    Inventors: Alan Wong, Jeff Drautz, Joseph D. Shindler, Max Lau, George Chen
  • Optimization of sample plan for overlay
    Publication number: 20060074611
    Abstract: The present invention describes a method including: determining field-clustering scheme; selecting initial sample plan; establishing initial model of overlay, the initial model of overlay comprising components; and establishing efficient model of overlay from the initial model of overlay including: constructing matrices; identifying redundant components and eliminating the redundant components; and identifying highly-correlated components and determining whether to eliminate the highly-correlated components.
    Type: Application
    Filed: September 30, 2004
    Publication date: April 6, 2006
    Inventors: Alan Wong, Jeff Drautz, Joseph Shindler, Max Lau, George Chen