Abstract: A monolithic, three-dimensional (3D) integrated circuit (IC) device includes a sensing layer, a memory layer, and a processing layer. The sensing layer includes a plurality of carbon nanotube field-effect transistors (CNFETs) that are functionalized with at least 50 functional materials to generate data in response to exposure to a gas. The memory layer stores the data generated by the plurality of CNFETs, and the processing layer identifies one or more components of the gas based on the data generated by the plurality of CNFETs.

Abstract: A monolithic, three-dimensional (3D) integrated circuit (IC) device includes a sensing layer, a memory layer, and a processing layer. The sensing layer includes a plurality of carbon nanotube field-effect transistors (CNFETs) that are functionalized with at least 50 functional materials to generate data in response to exposure to a gas. The memory layer stores the data generated by the plurality of CNFETs, and the processing layer identifies one or more components of the gas based on the data generated by the plurality of CNFETs.

Abstract: A carbon nanotube field effect transistor (CNFET), that has a channel formed of carbon nanotubes (CNTs), includes a layered deposit of a nonstoichiometric doping oxide (NDO), such as HfOX, where the concentration of the NDO varies through the thickness of the layer(s). An n-type metal-oxide semiconductor (NMOS) CNFET made in this manner can achieve similar ON-current, OFF-current, and/or threshold voltage magnitudes to a corresponding p-type metal-oxide semiconductor (PMOS) CNFET. Such an NMOS and PMOS can be used to achieve a symmetric complementary metal-oxide semiconductor (CMOS) CNFET design.

Abstract: System and methods to generate a circuit design for an integrated circuit using only allowable pairs of connected logic stages. The allowable pairs of connected logic stages are those pairs of connected logic stages with a static noise margin (SNM) above an SNM threshold. Also presented is a 16-bit microprocessor made entirely from carbon nanotube field effect transistors (CNFET) having such allowable pair of connected logic stages.

Abstract: Described are concepts, systems, circuits, devices, structures and methods for depositing carbon nanotubes (CNTs) uniformly over a substrate. The described concepts, systems, circuits, devices, structures and methods meet at least several requirements; namely, the systems, circuits, devices, structures are: (1) manufacturable; (2) silicon-CMOS compatible; and (3) provide a path for realizing energy efficiency benefits utilizing silicon. In embodiments, described is an illustrative CNT solution-based deposition technique that addresses all of these requirements. Also described is a method for providing carbon nanotube field effect transistors (CNFETs) using uniform and reproducible fabrication techniques suitable for use across industry-standard wafers and which may use the same equipment currently being used to fabricate silicon product wafers. Also described are CNFETs fabricated within commercial silicon manufacturing facilities and having wafer-scale uniformity and reproducibility across multiple wafers.

Abstract: A monolithic, three-dimensional (3D) integrated circuit (IC) device includes a sensing layer, a memory layer, and a processing layer. The sensing layer includes a plurality of carbon nanotube field-effect transistors (CNFETs) that are functionalized with at least 50 functional materials to generate data in response to exposure to a gas. The memory layer stores the data generated by the plurality of CNFETs, and the processing layer identifies one or more components of the gas based on the data generated by the plurality of CNFETs.

Abstract: A back-gate carbon nanotube field effect transistor (CNFETs) provides: (1) reduced parasitic capacitance, which decreases the energy-delay product (EDP) thus improving the energy efficiency of digital systems (e.g., very-large-scale integrated circuits) and (2) scaling of transistors to smaller technology nodes (e.g., sub-3 nm nodes). An exemplary back-gate CNFET includes a channel. A source and a drain are disposed on a first side of the channel. A gate is disposed on a second side of the channel opposite to the first side. In this manner, the contacted gate pitch (CGP) of the back-gate CNFET may be scaled down without scaling the physical gate length (LG) or contact length (LC). The gate may also overlap with the source and/or the drain in this architecture. In one example, an exemplary CNFET was demonstrated to have a CGP less than 30 nm and 1.6× improvement to EDP compared to top-gate CNFETs.

Abstract: A monolithic, three-dimensional (3D) integrated circuit (IC) device includes a sensing layer, a memory layer, and a processing layer. The sensing layer includes a plurality of carbon nanotube field-effect transistors (CNFETs) that are functionalized with at least 50 functional materials to generate data in response to exposure to a gas. The memory layer stores the data generated by the plurality of CNFETs, and the processing layer identifies one or more components of the gas based on the data generated by the plurality of CNFETs.

Abstract: A technology called RINSE (Removal of Incubated Nanotubes through Selective Exfoliation) is demonstrated. RINSE removes carbon nanotube (CNT) aggregates in CNFETs without compromising CNFET performance. In RINSE, CNTs are deposited on a substrate, coated with a thin adhesive layer, and sonicated. The adhesive layer is strong enough to keep the individual CNTs on the substrate, but not the larger CNT aggregates. When combined with a CNFET CMOS process as disclosed here, record CNFET CMOS yield and uniformity can be realized.

Abstract: A technology called RINSE (Removal of Incubated Nanotubes through Selective Exfoliation) is demonstrated. RINSE removes carbon nanotube (CNT) aggregates in CNFETs without compromising CNFET performance. In RINSE, CNTs are deposited on a substrate, coated with a thin adhesive layer, and sonicated. The adhesive layer is strong enough to keep the individual CNTs on the substrate, but not the larger CNT aggregates. When combined with a CNFET CMOS process as disclosed here, record CNFET CMOS yield and uniformity can be realized.

Abstract: A carbon nanotube field effect transistor (CNFET), that has a channel formed of carbon nanotubes (CNTs), includes a layered deposit of a nonstoichiometric doping oxide (NDO), such as HfOX, where the concentration of the NDO varies through the thickness of the layer(s). An n-type metal-oxide semiconductor (NMOS) CNFET made in this manner can achieve similar ON-current, OFF-current, and/or threshold voltage magnitudes to a corresponding p-type metal-oxide semiconductor (PMOS) CNFET. Such an NMOS and PMOS can be used to achieve a symmetric complementary metal-oxide semiconductor (CMOS) CNFET design.

Abstract: System and methods to generate a circuit design for an integrated circuit using only allowable pairs of connected logic stages. The allowable pairs of connected logic stages are those pairs of connected logic stages with a static noise margin (SNM) above an SNM threshold. Also presented is a 16-bit microprocessor made entirely from carbon nanotube field effect transistors (CNFET) having such allowable pair of connected logic stages.

Abstract: A monolithic, three-dimensional (3D) integrated circuit (IC) device includes a sensing layer, a memory layer, and a processing layer. The sensing layer includes a plurality of carbon nanotube field-effect transistors (CNFETs) that are functionalized with at least 50 functional materials to generate data in response to exposure to a gas. The memory layer stores the data generated by the plurality of CNFETs, and the processing layer identifies one or more components of the gas based on the data generated by the plurality of CNFETs.

Abstract: System and methods to generate a circuit design for an integrated circuit using only allowable pairs of connected logic stages. The allowable pairs of connected logic stages are those pairs of connected logic stages with a static noise margin (SNM) above an SNM threshold. Also presented is a 16-bit microprocessor made entirely from carbon nanotube field effect transistors (CNFET) having such allowable pair of connected logic stages.

Abstract: A back-gate carbon nanotube field effect transistor (CNFETs) provides: (1) reduced parasitic capacitance, which decreases the energy-delay product (EDP) thus improving the energy efficiency of digital systems (e.g., very-large-scale integrated circuits) and (2) scaling of transistors to smaller technology nodes (e.g., sub-3 nm nodes). An exemplary back-gate CNFET includes a channel. A source and a drain are disposed on a first side of the channel. A gate is disposed on a second side of the channel opposite to the first side. In this manner, the contacted gate pitch (CGP) of the back-gate CNFET may be scaled down without scaling the physical gate length (LG) or contact length (LC). The gate may also overlap with the source and/or the drain in this architecture. In one example, an exemplary CNFET was demonstrated to have a CGP less than 30 nm and 1.6× improvement to EDP compared to top-gate CNFETs.

Abstract: System and methods to generate a circuit design for an integrated circuit using only allowable pairs of connected logic stages. The allowable pairs of connected logic stages are those pairs of connected logic stages with a static noise margin (SNM) above an SNM threshold. Also presented is a 16-bit microprocessor made entirely from carbon nanotube field effect transistors (CNFET) having such allowable pair of connected logic stages.