Abstract: A post chemical-mechanical-polishing (post-CMP) cleaning composition including: (A) polyethylene glycol (PEG) with a mass average molar mass (Mw) in the range of from 400 to 8,000 g/mol, (B) an anionic polymer selected from poly(acrylic acid) (PAA), acrylic acid-maleic acid copolymers, polyaspartic acid (PASA), polyglutamic acid (PGA), polyvinylphosphonic acid, polyvinylsulfonic acid, poly(styrenesulfonic acid), polycarboxylate ethers (PCE), PEG-phosphorous acids, and copolymers of the polymers thereof, and (C) water, where the pH of the composition is from 7.0 to 10.5.

Abstract: A holder for securing at least one rod-shaped substrate body having a variable cross-section along the substrate body has a substrate body region BQ1 comprising a surface to be treated. The holder comprises at least one perforated wall as the front wall, the wall having at least one opening, and also comprises a support element and a retaining element. The support element is constructed and/or secured in the opening in such a way that at least part of the substrate body can be arranged longitudinally and obliquely in the support element and the retaining element is constructed and/or secured in the opening in such a way that the retaining element can retain the substrate body at a point between the region BQ1 and the remainder of the substrate body such that the region BQ1 protrudes from the holder through the opening.

Abstract: Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) cobalt and/or (ii) a cobalt alloy and (iii) Ti N and/or TaN, wherein the CMP composition (Q) comprises (E) Inorganic particles (F) at least one organic compound comprising an amino-group and an acid group (Y), wherein said compound comprises n amino groups and at least n+1 acidic protons, wherein n is a integer?1. (G) at least one oxidizer in an amount of from 0.2 to 2.5 wt.-% based on the total weight of the respective CMP composition, (H) an aqueous medium wherein the CMP composition (Q) has a pH of more than 6 and less than 9.

Abstract: Use of a chemical mechanical polishing (CMP) composition for polishing of cobalt and/or co-balt alloy comprising substrates Abstract Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) cobalt and/or (ii) a cobalt alloy, wherein the CMP composition (Q) comprises (A) Inorganic particles (B) a substituted tetrazole derivative of the general formula (I), wherein R1 is H, hydroxy, alkyl, aryl, alkylaryl, amino, carboxyl, alkylcarboxyl, thio or alkylthio. (C) at least one amino acid (D) at least one oxidizer, (E) an aqueous medium and wherein the CMP composition (Q) has a pH of from 7 to 10.

Abstract: Disclosed herein is a chemical mechanical polishing (CMP) composition (Q) containing (A) inorganic particles, (B) a compound of general formula (I) below, and (C) an aqueous medium, in which the composition (Q) has a pH of from 2 to 6.

Abstract: Use of a chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) comprising (i) cobalt and/or (ii) a cobalt alloy, wherein the CMP composition (Q) comprises (A) Inorganic particles (B) a triazine derivative of the general formula (I) wherein R1, R2, R3, R4, R5 and R6 are independently from each other H, methyl, ethyl, propyl, butyl, pentyl, C2-C10-alkylcarboxylic acid, hydroxymethyl, vinyl or allyl (C) at least one amino acid, (D) at least one oxidizer (E) an aqueous medium and wherein the CMP composition (Q) has a pH of from 7 to 10.

Abstract: A chemical mechanical polishing (CMP) composition (Q) for chemical mechanical polishing of a substrate (S) containing (i) cobalt and/or (ii) a cobalt alloy, wherein the CMP composition (Q) contains: (A) Inorganic particles, (B) a substituted aromatic compound with at least one carboxylic acid function as corrosion inhibitor, (C) at least one amino acid, (D) at least one oxidizer, (E) an aqueous medium, wherein the CMP composition (Q) has a pH of from 7 to 10.

Abstract: A chemical mechanical polishing (CMP) composition comprising (A) Colloidal or fumed inorganic particles or a mixture thereof, (B) a poly (amino acid) and or a salt thereof, and (M) an aqueous medium.

Abstract: A chemical mechanical polishing (CMP) composition (Q) comprising (A) Colloidal or fumed inorganic particles (A) or a mixture thereof in a total amount of from 0.0001 to 2.5 wt.-% based on the total weight of the respective CMP composition (B) at least one amino acid in a total amount of from 0.2 to 1 wt.-% based on the total weight of the respective CMP composition (C) at least one corrosion inhibitor in a total amount of from 0.001 to 0.02 wt.-% based on the total weight of the respective CMP composition (D) hydrogen peroxide as oxidizing agent in a total amount of from 0.0001 to 2 wt.-% based on the total amount of the respective CMP composition (E) aqueous medium wherein the CMP composition (Q) has a pH in the range of from 6 to 9.5.

Abstract: The invention concerns a method for producing pulverulent hardening accelerators by reactive spray drying, where an aqueous phase I comprising calcium ions, and an aqueous phase II comprising sulphate ions, the molar ratio of the calcium ions to the sulphate ions being from 1/5 to 5/1, are contacted at a spray nozzle, and the phases I and II contacted with one another at the spray nozzle are sprayed in a streaming environment of drying gas. Likewise concerned are the pulverulent hardening accelerators producible by the method of the invention, and their use for accelerating the hardening of bassanite and/or anhydrite with formation of gypsum.

Abstract: A holder for securing at least one rod-shaped substrate body having a variable cross-section along the substrate body has a substrate body region BQ1 comprising a surface to be treated. The holder comprises at least one perforated wall as the front wall, the wall having at least one opening, and also comprises a support element and a retaining element. The support element is constructed and/or secured in the opening in such a way that at least part of the substrate body can be arranged longitudinally and obliquely in the support element and the retaining element is constructed and/or secured in the opening in such a way that the retaining element can retain the substrate body at a point between the region BQ1 and the remainder of the substrate body such that the region BQ1 protrudes from the holder through the opening.

Abstract: A composite material comprising at least one amorphous hydrophobic active ingredient in an amorphous salt matrix with a solubility in the neutral aqueous medium of less than 0.02 mol/l, obtained by a reactive spray-drying process, where a liquid phase A, which comprises inorganic cations, and a liquid phase B, which comprises anions which, with the inorganic cations, form a salt that is insoluble in the mixture of the liquid phases are sprayed together using at least one multi-substance nozzle, and where at least one hydrophobic active ingredient is present in dissolved form in at least one liquid spraying phase, and where the salt formed from the cations of phase A and the anions of phase B has a solubility of less than 0.02 mol/l in the neutral aqueous medium.

Abstract: Process for producing composite materials by reactive spray-drying, where a liquid phase A, which comprises inorganic cations, and a liquid phase B, which comprises anions which, with the inorganic cations, form a salt that is insoluble in the mixture of the liquid phases are sprayed together using at least one multi-substance nozzle, and where at least one hydrophobic active ingredient is present in dissolved form in at least one liquid spraying phase, and where the salt formed from the cations of phase A and the anions of phase B has a solubility of less than 0.02 mol/l in the neutral aqueous medium.

Abstract: Process for producing composite materials by reactive spray-drying, where a liquid phase A, which comprises inorganic cations, and a liquid phase B, which comprises anions which, with the inorganic cations, form a salt that is insoluble in the mixture of the liquid phases are sprayed together using at least one multi-substance nozzle, and where at least one hydrophobic active ingredient is present in dissolved form in at least one liquid spraying phase, and where the salt formed from the cations of phase A and the anions of phase B has a solubility of less than 0.02 mol/l in the neutral aqueous medium.

Abstract: A process for the preparation of a microcapsule composition, wherein the shell of the microcapsules is essentially made of silica and the core comprises at least one lipophilic component, comprising the steps of: a) providing an aqueous dispersion comprising at least one lipophilic component (A) and b1) adding to the aqueous dispersion provided in step a) a water glass solution and an acid, or b2) adding to the aqueous dispersion provided in step a) a silicic acid solution and a base, wherein the addition is effected such that the pH of the mixture resulting during the addition of the water glass solution in step b1) or during the addition of silicic acid solution in step b2) is kept in a range of 6 to 9.