Patents by Inventor Maxim Mikhailovich NOGINOV
Maxim Mikhailovich NOGINOV has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 9805965Abstract: Implementations described herein provide a chucking circuit for a pixilated electrostatic chuck which enables both lateral and azimuthal tuning of the RF coupling between an electrostatic chuck and a substrate placed thereon. In one embodiment, a chucking circuit for an electrostatic chuck (ESC) has one or more chucking electrodes disposed in a dielectric body of the ESC, a plurality of pixel electrodes disposed in the dielectric body, and a chucking circuit having the one or more chucking electrodes and the plurality of pixel electrodes, the chucking circuit operable to electrostatically chuck a substrate to a workpiece support surface of the ESC, the chucking circuit having a plurality of secondary circuits, wherein each secondary circuit includes at least one capacitor of a plurality of capacitors, each secondary circuit is configured to independently control an impedance between one of the pixel electrodes and a ground.Type: GrantFiled: December 30, 2016Date of Patent: October 31, 2017Assignee: APPLIED MATERIALS, INC.Inventors: Reza Sadjadi, Wendell Glen Boyd, Jr., Vijay D. Parkhe, Maxim Mikhailovich Noginov
-
Patent number: 9646843Abstract: Implementations described herein provide a magnetic ring which enables both lateral and azimuthal tuning of the plasma in a processing chamber. In one embodiment, the magnetic ring has a body. The body has a top surface and a bottom surface, and a plurality of magnets are disposed on the bottom surface of the body.Type: GrantFiled: August 19, 2015Date of Patent: May 9, 2017Assignee: APPLIED MATERIALS, INC.Inventors: Andrew Nguyen, Tza-Jing Gung, Haitao Wang, Maxim Mikhailovich Noginov, Reza Sadjadi, Chunlei Zhang, Xue Yang
-
Publication number: 20170110358Abstract: Implementations described herein provide a chucking circuit for a pixilated electrostatic chuck which enables both lateral and azimuthal tuning of the RF coupling between an electrostatic chuck and a substrate placed thereon. In one embodiment, a chucking circuit for an electrostatic chuck (ESC) has one or more chucking electrodes disposed in a dielectric body of the ESC, a plurality of pixel electrodes disposed in the dielectric body, and a chucking circuit having the one or more chucking electrodes and the plurality of pixel electrodes, the chucking circuit operable to electrostatically chuck a substrate to a workpiece support surface of the ESC, the chucking circuit having a plurality of secondary circuits, wherein each secondary circuit includes at least one capacitor of a plurality of capacitors, each secondary circuit is configured to independently control an impedance between one of the pixel electrodes and a ground.Type: ApplicationFiled: December 30, 2016Publication date: April 20, 2017Inventors: S. M. Reza SADJADI, Wendell Glen BOYD, JR., Vijay D. PARKHE, Maxim Mikhailovich NOGINOV
-
Publication number: 20170004988Abstract: Implementations described herein provide a chucking circuit for a pixilated electrostatic chuck which enables both lateral and azimuthal tuning of the RF coupling between an electrostatic chuck and a substrate placed thereon. In one embodiment, a chucking circuit for an electrostatic chuck (ESC) has one or more chucking electrodes disposed in a dielectric body of the ESC, a plurality of pixel electrodes disposed in the dielectric body, and a chucking circuit having the one or more chucking electrodes and the plurality of pixel electrodes, the chucking circuit operable to electrostatically chuck a substrate to a workpiece support surface of the ESC, the chucking circuit having a plurality of secondary circuits, wherein each secondary circuit includes at least one capacitor of a plurality of capacitors, each secondary circuit is configured to independently control an impedance between one of the pixel electrodes and a ground.Type: ApplicationFiled: September 16, 2016Publication date: January 5, 2017Inventors: Reza SADJADI, Wendell Glen BOYD, JR., Vijay D. PARKHE, Maxim Mikhailovich NOGINOV
-
Patent number: 9536769Abstract: Implementations described herein provide a chucking circuit for a pixilated electrostatic chuck which enables both lateral and azimuthal tuning of the RF coupling between an electrostatic chuck and a substrate placed thereon. In one embodiment, a chucking circuit for an electrostatic chuck (ESC) has one or more chucking electrodes disposed in a dielectric body of the ESC, a plurality of pixel electrodes disposed in the dielectric body, and a chucking circuit having the one or more chucking electrodes and the plurality of pixel electrodes, the chucking circuit operable to electrostatically chuck a substrate to a workpiece support surface of the ESC, the chucking circuit having a plurality of secondary circuits, wherein each secondary circuit includes at least one capacitor of a plurality of capacitors, each secondary circuit is configured to independently control an impedance between one of the pixel electrodes and a ground.Type: GrantFiled: September 16, 2016Date of Patent: January 3, 2017Assignee: APPLIED MATERIALS, INC.Inventors: Reza Sadjadi, Wendell Glen Boyd, Jr., Vijay D. Parkhe, Maxim Mikhailovich Noginov
-
Patent number: 9472410Abstract: Implementations described herein provide a pixilated electrostatic chuck which enables both lateral and azimuthal tuning of the RF coupling between an electrostatic chuck and a substrate placed thereon. In one embodiment, the pixilated electrostatic chuck (ESC) may include a dielectric body having a workpiece support surface configured to accept a substrate thereon, one or more chucking electrodes disposed in the pixilated ESC, and a plurality of pixel electrodes. The plurality of pixel electrodes are switchable between a floating state and a grounded state, having variable capacitance to ground, or both. The pixel electrodes and the chucking electrodes form a circuit operable to electrostatically chuck the substrate to the workpiece support surface.Type: GrantFiled: May 13, 2014Date of Patent: October 18, 2016Assignee: APPLIED MATERIALS, INC.Inventors: Reza Sadjadi, Wendell Glen Boyd, Jr., Vijay D. Parkhe, Maxim Mikhailovich Noginov
-
Publication number: 20160163511Abstract: Implementations described herein provide a magnetic ring which enables both lateral and azimuthal tuning of the plasma in a processing chamber. In one embodiment, the magnetic ring has a body. The body has a top surface and a bottom surface, and a plurality of magnets are disposed on the bottom surface of the body.Type: ApplicationFiled: August 19, 2015Publication date: June 9, 2016Applicant: APPLIED MATERIALS, INC.Inventors: Andrew NGUYEN, Tza-Jing GUNG, Haitao WANG, Maxim Mikhailovich NOGINOV, Reza SADJADI, Chunlei ZHANG, Xue YANG
-
Publication number: 20150311105Abstract: Implementations described herein provide a pixilated electrostatic chuck which enables both lateral and azimuthal tuning of the RF coupling between an electrostatic chuck and a substrate placed thereon. In one embodiment, the pixilated electrostatic chuck (ESC) may include a dielectric body having a workpiece support surface configured to accept a substrate thereon, one or more chucking electrodes disposed in the pixilated ESC, and a plurality of pixel electrodes. The plurality of pixel electrodes are switchable between a floating state and a grounded state, having variable capacitance to ground, or both. The pixel electrodes and the chucking electrodes form a circuit operable to electrostatically chuck the substrate to the workpiece support surface.Type: ApplicationFiled: May 13, 2014Publication date: October 29, 2015Inventors: Reza SADJADI, Wendell Glen BOYD, JR., Vijay D. PARKHE, Maxim Mikhailovich NOGINOV