Patents by Inventor Maxime BIRON

Maxime BIRON has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PELLICLE MEMBRANE
    Publication number: 20250004362
    Abstract: A pellicle membrane for a lithographic apparatus, wherein the pellicle membrane includes metal silicide and a reinforcing network. The reinforcing network can be located between metal silicide layers. The reinforcing network can be irregular. The reinforcing network includes windows with a maximum dimension of up to 20 microns. The reinforcing network includes windows having an average size of at least 5 microns.
    Type: Application
    Filed: July 28, 2022
    Publication date: January 2, 2025
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Franciscus Theodorus AGRICOLA, Lourdes FERRE LLIN, Dennis DE GRAAF, Chaitanya Krishna ANDE, Inci DONMEZ NOYAN, Fai Tong SI, Ties Wouter VAN DER WOORD, Anne-Sophie ROLLIER, Maxime BIRON, Adrianus Johannes Maria GIESBERS
  • PELLICLE FOR EUV LITHOGRAPHY
    Publication number: 20240302736
    Abstract: A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidizing environment. In any aspect, the pellicle may include a metal nitride layer.
    Type: Application
    Filed: March 27, 2024
    Publication date: September 12, 2024
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Dennis DE GRAAF, Richard BEAUDRY, Maxime BIRON, Paul JANSSEN, Thijs KATER, Kevin KORNELSEN, Michael Alfred Josephus KUIJKEN, Jan Hendrik Willem KUNTZEL, Stephane MARTEL, Maxim Aleksandrovich NASALEVICH, Guido SALMASO, Pieter-Jan VAN ZWOL
  • Pellicle for EUV lithography
    Patent number: 11977326
    Abstract: A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may include a metal nitride layer.
    Type: Grant
    Filed: April 12, 2019
    Date of Patent: May 7, 2024
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Dennis De Graaf, Richard Beaudry, Maxime Biron, Paul Janssen, Thijs Kater, Kevin Kornelsen, Michael Alfred Josephus Kuijken, Jan Hendrik Willem Kuntzel, Stephane Martel, Maxim Aleksandrovich Nasalevich, Guido Salmaso, Pieter-Jan Van Zwol
  • PELLICLE MEMBRANE
    Publication number: 20220269165
    Abstract: A method of manufacturing a pellicle membrane, the method including: providing a first sacrificial layer on a planar substrate to form a stack; and providing, to at least a portion of the stack, at least one metal silicide or doped metal silicide pellicle core layer which forms at least part of the pellicle membrane is described. Also described is a pellicle membrane assembly having a substrate, a first sacrificial layer, and at least one metal silicide or doped metal silicide pellicle layer which forms at least part of a pellicle core, as well as a lithography apparatus including such a pellicle.
    Type: Application
    Filed: July 24, 2020
    Publication date: August 25, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Paul JANSSEN, Maxime BIRON, Inci DONMEZ NOYAN, Lourdes FERRE LLIN, Adrianus Johannes Maria GIESBERS, Johan Hendrik KLOOTWIJK, Jan Hendrik Willem KUNTZEL, Arnoud Willem NOTENBOOM, Anne-Sophie ROLLIER, Ties Wouter VAN DER WOORD, Pieter-Jan VAN ZWOL
  • PELLICLE FOR EUV LITHOGRAPHY
    Publication number: 20210240070
    Abstract: A wafer including a mask on one face and at least one layer on an opposite face, wherein the mask has at least one scribeline which overlies at least a portion of the opposite face which is substantially free of the at least one layer is described. Also described is a method of preparing a pellicle, the method including: providing a wafer having a mask on one face and at least one layer on an opposite face, defining a scribeline in the mask, and selectively removing a portion of the at least one layer which at least partially overlies the scribeline as well as a method of preparing a pellicle, the method including: providing a pellicle core, and removing at least some material from at least one face of the pellicle core in a non-oxidising environment. In any aspect, the pellicle may include a metal nitride layer.
    Type: Application
    Filed: April 12, 2019
    Publication date: August 5, 2021
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Dennis DE GRAAF, Richard BEAUDRY, Maxime BIRON, Paul JANSSEN, Thijs KATER, Kevin KORNELSEN, Michael Alfred Josephus KUIJKEN, Jan Hendrik Willem KUNTZEL, Stephane MARTEL, Maxim Aleksandrovich NASALEVICH, Guido SALMASO, Pieter-Jan VAN ZWOL