Patents by Inventor Maximilian Hoerantner

Maximilian Hoerantner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ALTERNATING MULTI-SOURCE VAPOR TRANSPORT DEPOSITION
    Publication number: 20230366086
    Abstract: Disclosed are vapor transport deposition systems and methods for alternating sequential vapor transport deposition of multi-component perovskite thin-films. The systems include multiple vaporizing sources that are mechanically or digitally controlled for high throughput deposition. Alternating sequential deposition provides faster sequential deposition, and allows for reduced material degradation due to different vapor temperatures.
    Type: Application
    Filed: March 2, 2023
    Publication date: November 16, 2023
    Inventors: Vladimir Bulovic, Maximilian Hoerantner
  • Alternating multi-source vapor transport deposition
    Patent number: 11629405
    Abstract: Disclosed are vapor transport deposition systems and methods for alternating sequential vapor transport deposition of multi-component perovskite thin-films. The systems include multiple vaporizing sources that are mechanically or digitally controlled for high throughput deposition. Alternating sequential deposition provides faster sequential deposition, and allows for reduced material degradation due to different vapor temperatures.
    Type: Grant
    Filed: July 17, 2019
    Date of Patent: April 18, 2023
    Assignee: Massachusetts Institute of Technology
    Inventors: Vladimir Bulovic, Maximilian Hoerantner
  • ALTERNATING MULTI-SOURCE VAPOR TRANSPORT DEPOSITION
    Publication number: 20200024733
    Abstract: Disclosed are vapor transport deposition systems and methods for alternating sequential vapor transport deposition of multi-component perovskite thin-films. The systems include multiple vaporizing sources that are mechanically or digitally controlled for high throughput deposition. Alternating sequential deposition provides faster sequential deposition, and allows for reduced material degradation due to different vapor temperatures.
    Type: Application
    Filed: July 17, 2019
    Publication date: January 23, 2020
    Inventors: Vladimir Bulovic, Maximilian Hoerantner