Patents by Inventor May Ling Oh

May Ling Oh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240103072
    Abstract: Embodiments described herein may be related to apparatuses, processes, systems, and/or techniques for using x-rays to alter or observe circuits within a semiconductor device before, during or after a test of the semiconductor device. Other embodiments may be described and/or claimed.
    Type: Application
    Filed: September 23, 2022
    Publication date: March 28, 2024
    Inventors: Patrick PARDY, Kimberlee CELIO, Sanchari SEN, May Ling OH, Shuai ZHAO, Joshua W. KEVEK, Evgeny Gregory NISENBOIM, Amir RAVEH, Boris SIMKHOVICH, Charles A. PETERSON, Kevin JOHNSON, Martin Eric Gostasson VON HAARTMAN, Eli ABU AYOB, Xianghong TONG
  • Publication number: 20230317408
    Abstract: Pulsed beam prober systems, devices, and techniques are described herein related to providing a beam detection frequency that is less than a electrical test frequency. An electrical test signal at the electrical test frequency is provided to die under test. A pulsed beam is applied to the die such that the pulsed beam has packets of beam pulses or a frequency delta with respect to the electrical test frequency. The packets of beam pulses or the frequency delta elicits a detectable beam modulation in an imaging signal reflected from the die such that the imaging signal is modulated at a detection frequency less than the electrical test frequency.
    Type: Application
    Filed: April 1, 2022
    Publication date: October 5, 2023
    Applicant: Intel Corporation
    Inventors: Xianghong Tong, Martin Von Haartman, Wen-Hsien Chuang, Zhiyong Ma, Hyuk Ju Ryu, Prasoon Joshi, May Ling Oh, Jennifer Huening, Shuai Zhao, Charles Peterson, Ira Jewell, Hasan Faraby
  • Publication number: 20080081407
    Abstract: A polymer coating material is disposed at a surface of a semiconductor substrate, superimposing a readable mark formed thereupon. A perimeter of the coating material is configured to correspond approximately with a perimeter of the mark, and a thickness of the coating material is configured to be relatively conformal with the surface of the substrate. The mark remains readable through the coating material throughout manufacturing, reliability testing, and normal use. A substrate so formed may constitute a portion of an assembly and/or system (e.g., computer system). Throughout manufacturing, reliability testing and normal use, a readable mark provides product identification, traceability, and other benefits.
    Type: Application
    Filed: September 29, 2006
    Publication date: April 3, 2008
    Inventors: May Ling Oh, Lim Chong Sim