Patents by Inventor May Wang
May Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 7407893Abstract: Methods are provided for depositing amorphous carbon materials. In one aspect, the invention provides a method for processing a substrate including positioning the substrate in a processing chamber, introducing a processing gas into the processing chamber, wherein the processing gas comprises a carrier gas, hydrogen, and one or more precursor compounds, generating a plasma of the processing gas by applying power from a dual-frequency RF source, and depositing an amorphous carbon layer on the substrate.Type: GrantFiled: February 24, 2005Date of Patent: August 5, 2008Assignee: Applied Materials, Inc.Inventors: Martin Jay Seamons, Wendy H. Yeh, Sudha S. R. Rathi, Deenesh Padhi, Andy (Hsin Chiao) Luan, Sum-Yee Betty Tang, Priya Kulkarni, Visweswaren Sivaramakrishnan, Bok Hoen Kim, Hichem M'Saad, Yuxiang May Wang, Michael Chiu Kwan
-
Patent number: 7335462Abstract: A method of forming an integrated circuit using an amorphous carbon film. The amorphous carbon film is formed by thermally decomposing a gas mixture comprising a hydrocarbon compound and an inert gas. The amorphous carbon film is compatible with integrated circuit fabrication processes. In one integrated circuit fabrication process, the amorphous carbon film is used as a hardmask. In another integrated circuit fabrication process, the amorphous carbon film is an anti-reflective coating (ARC) for deep ultraviolet (DUV) lithography. In yet another integrated circuit fabrication process, a multi-layer amorphous carbon anti-reflective coating is used for DUV lithography.Type: GrantFiled: February 9, 2007Date of Patent: February 26, 2008Assignee: Applied Materials, Inc.Inventors: Kevin Fairbairn, Michael Rice, Timothy Weidman, Christopher S Ngai, Ian Scot Latchford, Christopher Dennis Bencher, Yuxiang May Wang
-
Patent number: 7322554Abstract: A holder for a clothing article, such as a purse, scarf, or glove, the holder generally including a base and a hanger, wherein the hanger supports the clothing article but does not compress the clothing article.Type: GrantFiled: September 3, 2004Date of Patent: January 29, 2008Assignee: C & W Design, LLCInventors: Carol Caroselli, May Wang
-
Patent number: 7223526Abstract: A method of forming an integrated circuit using an amorphous carbon film. The amorphous carbon film is formed by thermally decomposing a gas mixture comprising a hydrocarbon compound and an inert gas. The amorphous carbon film is compatible with integrated circuit fabrication processes. In one integrated circuit fabrication process, the amorphous carbon film is used as a hardmask. In another integrated circuit fabrication process, the amorphous carbon film is an anti-reflective coating (ARC) for deep ultraviolet (DUV) lithography. In yet another integrated circuit fabrication process, a multi-layer amorphous carbon anti-reflective coating is used for DUV lithography.Type: GrantFiled: December 21, 2004Date of Patent: May 29, 2007Assignee: Applied Materials, Inc.Inventors: Kevin Fairbairn, Michael Rice, Timothy Weidman, Christopher S Ngai, Ian Scot Latchford, Christopher Dennis Bencher, Yuxiang May Wang
-
Patent number: 7105460Abstract: Methods are provided for depositing a dielectric material. The dielectric material may be used for an anti-reflective coating or as a hardmask. In one aspect, a method is provided for processing a substrate including introducing a processing gas comprising a silane-based compound and an organosilicon compound to the processing chamber and reacting the processing gas to deposit a nitrogen-free dielectric material on the substrate. The dielectric material comprises silicon and oxygen.Type: GrantFiled: July 11, 2002Date of Patent: September 12, 2006Assignee: Applied MaterialsInventors: Bok Hoen Kim, Sudha Rathi, Sang H. Ahn, Christopher D. Bencher, Yuxiang May Wang, Hichem M'Saad, Mario D. Silvetti
-
Patent number: 6927178Abstract: Methods are provided for depositing a dielectric material. The dielectric material may be used for an anti-reflective coating or as a hardmask. In one aspect, a method is provided for processing a substrate including introducing a processing gas comprising a silane-based compound and an oxygen and carbon containing compound to the processing chamber and reacting the processing gas to deposit a nitrogen-free dielectric material on the substrate. The dielectric material comprises silicon and oxygen. In another aspect, the dielectric material forms one or both layers in a dual layer anti-reflective coating.Type: GrantFiled: December 10, 2003Date of Patent: August 9, 2005Assignee: Applied Materials, Inc.Inventors: Bok Hoen Kim, Sudha Rathi, Sang H. Ahn, Christopher D. Bencher, Yuxiang May Wang, Hichem M'Saad, Mario D. Silvetti, Miguel Fung, Keebum Jung, Lei Zhu
-
Publication number: 20050082319Abstract: A holder for a clothing article, such as a purse, scarf, or glove, the holder generally including a base and a hanger, wherein the hanger supports the clothing article but does not compress the clothing article.Type: ApplicationFiled: September 3, 2004Publication date: April 21, 2005Inventors: Carol Caroselli, May Wang
-
Patent number: 6841341Abstract: A method of forming an integrated circuit using an amorphous carbon film. The amorphous carbon film is formed by thermally decomposing a gas mixture comprising a hydrocarbon compound and an inert gas. The amorphous carbon film is compatible with integrated circuit fabrication processes. In one integrated circuit fabrication process, the amorphous carbon film is used as a hardmask. In another integrated circuit fabrication process, the amorphous carbon film is an anti-reflective coating (ARC) for deep ultraviolet (DUV) lithography. In yet another integrated circuit fabrication process, a multi-layer amorphous carbon anti-reflective coating is used for DUV lithography.Type: GrantFiled: December 17, 2002Date of Patent: January 11, 2005Assignee: Applied Materials, Inc.Inventors: Kevin Fairbairn, Michael Rice, Timothy Weidman, Christopher S Ngai, Ian Scot Latchford, Christopher Dennis Bencher, Yuxiang May Wang
-
Publication number: 20040214446Abstract: Methods are provided for depositing a dielectric material. The dielectric material may be used for an anti-reflective coating or as a hardmask. In one aspect, a method is provided for processing a substrate including introducing a processing gas comprising a silane-based compound and an oxygen and carbon containing compound to the processing chamber and reacting the processing gas to deposit a nitrogen-free dielectric material on the substrate. The dielectric material comprises silicon and oxygen. In another aspect, the dielectric material forms one or both layers in a dual layer anti-reflective coating.Type: ApplicationFiled: December 10, 2003Publication date: October 28, 2004Applicant: APPLIED MATERIALS, INC.Inventors: Bok Hoen Kim, Sudha Rathi, Sang H. Ahn, Christopher D. Bencher, Yuxiang May Wang, Hichem M'Saad, Mario D. Silvetti, Miguel Fung, Keebum Jung, Lei Zhu
-
Publication number: 20040009676Abstract: Methods are provided for depositing a dielectric material. The dielectric material may be used for an anti-reflective coating or as a hardmask. In one aspect, a method is provided for processing a substrate including introducing a processing gas comprising a silane-based compound and an organosilicon compound to the processing chamber and reacting the processing gas to deposit a nitrogen-free dielectric material on the substrate. The dielectric material comprises silicon and oxygen.Type: ApplicationFiled: July 11, 2002Publication date: January 15, 2004Applicant: Applied Materials, Inc.Inventors: Bok Hoen Kim, Sudha Rathi, Sang H. Ahn, Christopher D. Bencher, Yuxiang May Wang, Hichem M'Saad, Mario D. Silvetti
-
Publication number: 20030150889Abstract: A holder for a clothing article, such as a purse, scarf, or glove, the holder generally including a base and a hanger, wherein the hanger supports the clothing article but does not compress the clothing article.Type: ApplicationFiled: February 13, 2002Publication date: August 14, 2003Inventors: Carol Caroselli, May Wang
-
Patent number: 6573030Abstract: A method of forming an integrated circuit using an amorphous carbon film. The amorphous carbon film is formed by thermally decomposing a gas mixture comprising a hydrocarbon compound and an inert gas. The amorphous carbon film is compatible with integrated circuit fabrication processes. In one integrated circuit fabrication process, the amorphous carbon film is used as a hardmask. In another integrated circuit fabrication process, the amorphous carbon film is an anti-reflective coating (ARC) for deep ultraviolet (DUV) lithography. In yet another integrated circuit fabrication process, a multi-layer amorphous carbon anti-reflective coating is used for DUV lithography.Type: GrantFiled: June 8, 2000Date of Patent: June 3, 2003Assignee: Applied Materials, Inc.Inventors: Kevin Fairbairn, Michael Rice, Timothy Weidman, Christopher S Ngai, Ian Scot Latchford, Christopher Dennis Bencher, Yuxiang May Wang
-
Publication number: 20030091938Abstract: A method of forming an integrated circuit using an amorphous carbon film. The amorphous carbon film is formed by thermally decomposing a gas mixture comprising a hydrocarbon compound and an inert gas. The amorphous carbon film is compatible with integrated circuit fabrication processes. In one integrated circuit fabrication process, the amorphous carbon film is used as a hardmask. In another integrated circuit fabrication process, the amorphous carbon film is an anti-reflective coating (ARC) for deep ultraviolet (DUV) lithography. In yet another integrated circuit fabrication process, a multi-layer amorphous carbon anti-reflective coating is used for DUV lithography.Type: ApplicationFiled: December 17, 2002Publication date: May 15, 2003Applicant: Applied Materials, Inc.Inventors: Kevin Fairbairn, Michael Rice, Timothy Weidman, Christopher S. Ngai, Ian Scot Latchford, Christopher Dennis Bencher, Yuxiang May Wang
-
Publication number: 20020086547Abstract: A multilayer antireflective hard mask structure is disclosed. The structure comprises: (a) a CVD organic layer, wherein the CVD organic layer comprises carbon and hydrogen; and (b) a dielectric layer over the CVD organic layer. The dielectric layer is preferably a silicon oxynitride layer, while the CVD organic layer preferably comprises 70-80% carbon, 10-20% hydrogen and 5-15% nitrogen. Also disclosed are methods of forming and trimming such a multilayer antireflective hard mask structure. Further disclosed are methods of etching a substrate structure using a mask structure that contains a CVD organic layer and optionally has a dielectric layer over the CVD organic layer.Type: ApplicationFiled: July 13, 2001Publication date: July 4, 2002Applicant: Applied Materials, Inc.Inventors: David S. Mui, Wei Liu, Thorsten Lill, Christopher Dennis Bencher, Yuxiang May Wang
-
Patent number: 6350866Abstract: The invention provides isolated nucleic acid compounds encoding FtsZ of Streptococcus pneumoniae. Also provided are vectors and transformed host cells for expressing the encoded protein, and a method for identifying compounds that bind and/or inhibit said protein.Type: GrantFiled: December 8, 1997Date of Patent: February 26, 2002Assignee: Eli Lilly and CompanyInventors: Paul Luther Skatrud, Robert Brown Peery, Q May Wang, Paul Robert Rosteck, Jr., Pamela Kay Rockey
-
Patent number: 6192215Abstract: A mechanical puppet show apparatus provides a base unit supporting on its upper surface (stage) one or more mechanical puppets. The puppets are interconnected with a circuit for motion actuation in accordance with a stage play that is programmed into a memory device and controlled by a digital control unit. Manual, remote control and verbal signals may be received for interactive action of the puppets with the audience. A method for use of materials downloaded by packet data transfer from the Internet may be employed in programming.Type: GrantFiled: March 20, 2000Date of Patent: February 20, 2001Inventor: Mai Wang
-
Patent number: 6136557Abstract: The invention provides isolated nucleic acid compounds encoding FtsH of Streptococcus pneumoniae. Also provided are vectors and transformed host cells for expressing the encoded protein, and a method for identifying compounds that bind and/or inhibit said protein.Type: GrantFiled: December 8, 1997Date of Patent: October 24, 2000Assignee: Eli Lilly and CompanyInventors: Robert Brown Peery, Paul Luther Skatrud, Q May Wang, Michele Louise Young Bellido
-
Patent number: 6039625Abstract: A mechanical puppet show apparatus provides a base unit supporting on its upper surface (stage) one or more mechanical puppets. The puppets are interconnected with a circuit for motion actuation in accordance with a stage play that is programmed into a memory device and controlled by a digital control unit. Manual, remote control and verbal signals may be received for interactive action of the puppets with the audience.Type: GrantFiled: October 23, 1998Date of Patent: March 21, 2000Inventor: Mai Wang
-
Patent number: 5958730Abstract: The invention provides isolated nucleic acid compounds encoding FtsY of Streptococcus pneumoniae. Also provided are vectors and transformed host cells for expressing the encoded protein, and a method for identifying compounds that bind and/or inhibit said protein.Type: GrantFiled: December 8, 1997Date of Patent: September 28, 1999Assignee: Eli Lilly and CompanyInventors: Paul Luther Skatrud, Robert Brown Peery, Q May Wang, Paul Robert Rosteck, Jr., Michele Louise Young Bellido
-
Patent number: 5811344Abstract: The present invention relates to a stacked capacitor of a DRAM cell, particully remarkably increasing a surface area of a storage electrode of a stacked capacitor without increasing an occupation area and a complexity of fabrication thereof. According to the invention, by use of depositing a protection polysilicon layer on a rugged polysilicon layer, which can provide an increased surface area of a storage electrode, a chemical oxide layer underlying the rugged polysilicon layer is protected by the protection polysilicon layer during a HF dip and thus a peeling of the rugged polysilicon layer as a result of the chemical oxide loss will not occur, thereby preventing a production yield loss.Type: GrantFiled: January 27, 1997Date of Patent: September 22, 1998Assignee: Mosel Vitelic IncorporatedInventors: Tuby Tu, Kuang-Chao Chen, May Wang