Abstract: Flow enhancement plugs and electrostatic chucks having the same are disclosed herein that that inhibit gas light-up while providing excellent flow conductance for the delivery of backside gases to the substrate support surface of the electrostatic chuck. The flow enhancement plugs advantageously prevents line of sight passage through the plug. The flow enhancement plugs described herein have high conductance flow structures selected from one, two or all of a network of engineered gas passages, external gas passages and internal gas passages. As a result, the high conductance flow structures of the flow enhancement plugs disclosed herein beneficially have a conductance that is much lower than conventional porous plug.

Abstract: A gas delivery system includes a substrate. The substrate includes a first substrate portion of a first gas stick. The first substrate portion includes a first inlet configured to receive a first gas. The first gas stick is to control first flow of the first gas. The substrate further includes a second substrate portion of a second gas stick. The second substrate portion includes a second inlet configured to receive a second gas. The second gas stick is to control second flow of the second gas separate from the first flow of the first gas. The gas delivery system is to provide the first gas and the second gas to a chamber of a substrate processing system.