Abstract: Provided is an agricultural or horticultural fungicide that has low toxicity to humans and animals, that is excellent in handling safety, and that has an excellent controlling effect against a wide range of plant diseases and a high antimicrobial action against plant disease fungi. The agricultural or horticultural fungicide of the present invention includes, as an active ingredient, an azole derivative represented by the following general formula (I) and other active ingredients.

Abstract: An antibody has as a target molecule a ubiquitin protein comprising a phosphorylated serine residue at position 65. In addition, a method is provided for specifically detecting Parkinson's disease at an early stage, in which a target molecule is a ubiquitin protein comprising a phosphorylated serine residue at position 65, a pharmaceutical composition for definitively treating or preventing Parkinson's disease, and a method for screening for the pharmaceutical composition.

Abstract: A antibody has as a target molecule a ubiquitin protein comprising a phosphorylated serine residue at position 65. In addition, a method is provided for specifically detecting Parkinson's disease at an early stage, in which a target molecule is a ubiquitin protein comprising a phosphorylated serine residue at position 65, a pharmaceutical composition for definitively treating or preventing Parkinson's disease, and a method for screening for the pharmaceutical composition.

Abstract: A antibody has as a target molecule a ubiquitin protein comprising a phosphorylated serine residue at position 65. In addition, a method is provided for specifically detecting Parkinson's disease at an early stage, in which a target molecule is a ubiquitin protein comprising a phosphorylated serine residue at position 65, a pharmaceutical composition for definitively treating or preventing Parkinson's disease, and a method for screening for the pharmaceutical composition.

Abstract: This invention is concerning an etchant composition used to etch a silicon-containing film formed on a target substrate. The etchant composition includes at least one selected from the group consisting of an organic compound containing a hydroxyl group, an organic compound containing a carbonyl group, an inorganic acid and inorganic salt, hydrofluoric acid, ammonium fluoride and an organic acid.

Abstract: This invention is concerning an etchant composition used to etch a silicon-containing film formed on a target substrate. The etchant composition includes at least one selected from the group consisting of an organic compound containing a hydroxyl group, an organic compound containing a carbonyl group, an inorganic acid and inorganic salt, hydrofluoric acid, ammonium fluoride and an organic acid.

Abstract: A metal film such as an aluminum film or an aluminum alloy film is etched with good controllability, preventing a resist from bleeding, to have a proper taper configuration and superior flatness. A water solution containing a phosphoric acid, a nitric acid, and an organic acid salt is used as an etching liquid composition used to etch the metal film on a substrate. The organic acid salt is composed of one kind selected from a group consisting of an aliphatic monocarboxylic acid, an aliphatic polycarboxylic acid, an aliphatic oxicarboxylic acid, an aromatic monocarboxylic acid, an aromatic polycarboxylic acid and an aromatic oxycarboxylic acid, and one kind selected from a group consisting of an ammonium salt, an amine salt, a quaternary ammonium salt, and an alkali metal salt. In addition, a concentration of the organic acid salt ranges from 0.1% to 20% by weight.

Abstract: An optical recording medium having excellent light resistance that includes a substrate; and a recording layer which is provided on the substrate directly or on another layer provided on the substrate, wherein the recording layer is capable of recording and/or reading information by irradiating light thereon, the recording layer including a metal complex compound comprising an azo compound having a coupler component with a Meldrum's acid structure and a diazo component with a nitrogen-containing heterocyclic aromatic ring structure, and a metal ion coordinated to the azo compound.

Abstract: [Problem]: An optical recording medium having a capability of recording and/or reading high density optical information using a short wavelength laser light is provided. [Means to Address the Problem]: The optical recording medium has a capability of recording and/or reading high density optical information using a short wavelength laser light having a wavelength of 350 nm to 530 nm. The optical recording medium has a recording layer containing a metal complex compound and formed on a substrate. The metal complex compound is composed of a cyclic ?-diketone azo compound represented by the general formula (I) or general formula (II) and a divalent metal ion coordinated to the cyclic ?-diketone azo compound.

Abstract: An optical recording medium having excellent light resistance that includes a substrate; and a recording layer which is provided on the substrate directly or on another layer provided on the substrate, wherein the recording layer is capable of recording and/or reading information by irradiating light thereon, the recording layer includes a metal complex compound with an azo compound having a coupler component with indandione and a diazo component with a nitrogen-containing heterocyclic aromatic ring structure, and a nickel or cobalt ion coordinated to the azo compound.

Abstract: A metal film such as an aluminum film or an aluminum alloy film is etched with good controllability, preventing a resist from bleeding, to have a proper taper configuration and superior flatness. A water solution containing a phosphoric acid, a nitric acid, and an organic acid salt is used as an etching liquid composition used to etch the metal film on a substrate. The organic acid salt is composed of one kind selected from a group consisting of an aliphatic monocarboxylic acid, an aliphatic polycarboxylic acid, an aliphatic oxicarboxylic acid, an aromatic monocarboxylic acid, an aromatic polycarboxylic acid and an aromatic oxycarboxylic acid, and one kind selected from a group consisting of an ammonium salt, an amine salt, a quaternary ammonium salt, and an alkali metal salt. In addition, a concentration of the organic acid salt ranges from 0.1% to 20% by weight.

Abstract: [Problem]: An optical recording medium having a capability of recording and/or reading high density optical information using a short wavelength laser light is provided. [Means to Address the Problem]: The optical recording medium has a capability of recording and/or reading high density optical information using a short wavelength laser light having a wavelength of 350 nm to 530 nm. The optical recording medium has a recording layer containing a metal complex compound and formed on a substrate. The metal complex compound is composed of a cyclic ?-diketone azo compound represented by the general formula (I) or general formula (II) and a divalent metal ion coordinated to the cyclic ?-diketone azo compound.

Abstract: An etchant composition contains (a) an alkaline compound mixture of an organic alkaline compound and inorganic alkaline compound and (b) a silicon-containing compound. The organic alkaline compound is composed of one or more ingredients from quaternary ammonium hydroxide and ethylenediamine. The inorganic alkaline compound is composed of one or more ingredients from sodium hydroxide, potassium hydroxide, ammonia and hydrazine. The silicon-containing inorganic compound is composed of one or more ingredients from metal silicon, fumed silica, colloidal silica, silica gel, silica sol, diatomaceous earth, acid clay and activated clay, and the silicon-containing organic compound is composed of one or more ingredients from quaternary ammonium salts of alkyl silicate and quaternary ammonium salts of alkyl silicic acid.

Abstract: An absorbent sheet 10 including a fibrous material 11 and superabsorbent polymer particles 12. The superabsorbent polymer particles 12 are held by the fibrous material 11 and distributed in the thickness direction of the absorbent sheet 10. The superabsorbent polymer particles 12 are not substantially exposed on the surface of the absorbent sheet 10. The absorbent sheet 10 contains, around at least part of the superabsorbent polymer particles 12, voids 13 having size sufficient to accommodate a swell of the polymer particles 12 due to liquid absorption. The superabsorbent polymer particles 12 preferably have a particle size distribution in which 40% by weight or more of the particles have a particle size of 250 ?m or greater.

Abstract: The present invention provides a process of preparing a compound of the formula [I]: wherein X is a group of the formula: —N? or —CH?; R1 is a hydrogen atom, a halogen atom, a lower alkyl group, a lower alkoxy group, a cyano group or an amino group optionally substituted by a lower alkyl group; Ring A is a nitrogen-containing heterocyclic group; Ring B is an optionally substituted benzene ring or an optionally substituted pyridine ring; and R3 is a hydrogen atom or a lower alkyl group, or a pharmaceutically acceptable salt thereof, which is useful as an inhibitor of activated blood coagulation factor X.

Abstract: The present invention provides a process of preparing a compound of the formula [I]: wherein X is a group of the formula: —N? or —CH?; R1 is a hydrogen atom, a halogen atom, a lower alkyl group, a lower alkoxy group, a cyano group or an amino group optionally substituted by a lower alkyl group; Ring A is a nitrogen-containing heterocyclic group; Ring B is an optionally substituted benzene ring or an optionally substituted pyridine ring; and R3 is a hydrogen atom or a lower alkyl group, or a pharmaceutically acceptable salt thereof, which is useful as an inhibitor of activated blood coagulation factor X.

Abstract: A semiconductor surface cleaning agent containing a compound the molecule of which has a nitrogen atom having an unshared electron pair and used for cleaning the surface of a semiconductor on which copper wiring is provided, and a method for cleaning the surface of a semiconductor characterized by treating the surface of a semiconductor on which copper wiring is provided with such a cleaning agent. The cleaning agent does not corrode the copper wiring (copper thin film) on the semiconductor and SiO2 of the interlayer insulating film, does not impair the flatness of the surface, and is effective in removing CuO and particles adhering to the surface of the Cu-CMP step.

Abstract: An absorbent sheet 10 of the invention is a thin sheet having a first surface 10A and a second surface 10B and containing a fibrous material 11 and superabsorbent polymer particles 12. The polymer particles 12 are dispersed in the thickness direction of the absorbent sheet 10 in a state of being held by the fibrous material 11. When the portion in the thickness direction of the absorbent sheet 10 where the polymer particles 12 are dispersed is divided into regions by at least one plane perpendicular to the thickness direction of the sheet 10, the average particle size of the superabsorbent polymer particles 12 dispersed in each region decreases from the region that is the nearest to the first surface 10A to the region that is the nearest to the second surface 10B of the absorbent sheet.

Abstract: A composition used for removing a photoresist, polymeric material, or residue from a substrate contains a corrosion inhibitor that is a derivative of gallic acid that is soluble in water-miscible organic solvents, water, at least one organic amine, and two or more water-miscible organic solvents. The composition may further contain a surfactant. Use of this composition reduces resist reattachment, reduces corrosion, and improves peelability.