Patents by Inventor MAZEN SAIED

MAZEN SAIED has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Simulation of the image projected by a mask
    Patent number: 8423927
    Abstract: The disclosure concerns a method of simulating the image projected by a mask during photolithography including determining by a processor (702), taking into account the thickness of a masking layer of a mask, a near-field transmission amplitude curve of light passing through the mask across at least one pattern boundary in the initial mask layout; calculating by the processor, for each of a plurality of zones, average values of the curve; and simulating by a simulator (708) the image projected by the initial mask layout during the photolithography based on the average values.
    Type: Grant
    Filed: July 20, 2010
    Date of Patent: April 16, 2013
    Assignee: STMicroelectronics (Crolles 2) SAS
    Inventors: Mazen Saied, Emek Yesilada
  • SIMULATION OF THE IMAGE PROJECTED BY A MASK
    Publication number: 20110022219
    Abstract: The disclosure concerns a method of simulating the image projected by a mask during photolithography including determining by a processor (702), taking into account the thickness of a masking layer of a mask, a near-field transmission amplitude curve of light passing through the mask across at least one pattern boundary in the initial mask layout; calculating by the processor, for each of a plurality of zones, average values of the curve; and simulating by a simulator (708) the image projected by the initial mask layout during the photolithography based on the average values.
    Type: Application
    Filed: July 20, 2010
    Publication date: January 27, 2011
    Inventors: MAZEN SAIED, Emek Yesilada