Patents by Inventor Maziar Aghvami

Maziar Aghvami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • REACTOR WITH INDUCTIVELY COUPLED PLASMA SOURCE
    Publication number: 20230033058
    Abstract: Exemplary semiconductor processing systems may include an inductively coupled plasma source. The systems may include an RF power source that is electrically coupled with the inductively coupled plasma source. The systems may include a first gas source fluidly coupled with the inductively coupled plasma source. The systems may include a second gas source. The systems may include a dual-channel showerhead assembly defining a first plurality of apertures and a second plurality of apertures. The first plurality of apertures may be fluidly coupled with the inductively coupled plasma source. The second plurality of apertures are fluidly coupled with the second gas source.
    Type: Application
    Filed: July 29, 2021
    Publication date: February 2, 2023
    Applicant: Applied Materials, Inc.
    Inventors: Khokan Chandra Paul, Truong Van Nguyen, Diwakar Kedlaya, Maziar Aghvami, Vijet Patil, Shashank Sharma