Patents by Inventor Medhat A. Toukhy

Medhat A. Toukhy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200319555
    Abstract: A negative-acting, photoresist composition, imageable by 365 nm radiation that is developable in aqueous base. Apart from solvent, this composition comprises: a) an aqueous base soluble phenolic film-forming polymeric binder resin having ring bonded hydroxyl groups; b) a photoacid generator c) a crosslinking agent which comprises an etherified melamine; d) a dye as described herein; e) a quencher system consisting essentially of an amine quencher, or a mixture of such amine quenchers, as described. This invention also pertains to processes of using this composition as a photoresist.
    Type: Application
    Filed: April 23, 2018
    Publication date: October 8, 2020
    Inventors: Anupama MUKHERJEE, Medhat A. TOUKHY
  • Publication number: 20200183278
    Abstract: Environmentally stable, chemically amplified (CA) positive resist compositions are described. These resist compositions are based on a blend of at least two types of polymer platforms. The first platform is a low activation energy, acetal blocked polyhydroxystyrene (PHS) based resin; the second platform is an acrylate based resin containing a high activation energy acid labile group [such as tertiary-butyl acrylate(t-BA)]. The resist composition also contains a photo-acid generator (PAG), a base quencher, a surfactant dissolved in a suitable solvent. Also described, is the use of these resist composition in a method for forming a photoresist relief image on a substrate.
    Type: Application
    Filed: August 7, 2017
    Publication date: June 11, 2020
    Inventors: Medhat A. Toukhy, Weihong Liu, PingHung Lu
  • Patent number: 9012126
    Abstract: The invention relates to a novel positive working photosensitive composition having: at least one photoacid generator; at least one novolak polymer; at least one polymer, having a polymer backbone, said polymer comprising a structure of the following formula: wherein R1-R5 are, independently, —H or —CH3, A is a linear or branched C1-C10 alkylene group, B is a C1-C12 alkyl or alicyclic group, D is a linking group that may be a chemical bond, a carboxylate group, wherein the carbonyl carbon is bonded to the polymer backbone, or a —COOCH2— group, wherein the carbonyl carbon is bonded to the polymer backbone, Ar is a substituted or unsubstituted aromatic group or heteroaromatic group, E is a linear or branched C2-C10 alkylene group, G is an acid cleavable group. The invention further relates to a process for using the novel composition for forming an image.
    Type: Grant
    Filed: June 15, 2012
    Date of Patent: April 21, 2015
    Assignee: AZ Electronic Materials (Luxembourg) S.A.R.L.
    Inventors: Weihong Liu, PingHung Lu, Chunwei Chen, Stephen Meyer, Medhat Toukhy, SookMee Lai
  • Patent number: 8906594
    Abstract: Disclosed are compositions for negative-working thick film photophotoresists based on acrylic co-polymers. Also included are methods of using the compositions.
    Type: Grant
    Filed: June 15, 2012
    Date of Patent: December 9, 2014
    Assignee: AZ Electronic Materials (Luxembourg) S.A.R.L.
    Inventors: Chunwei Chen, PingHung Lu, Weihong Liu, Medhat Toukhy, SangChul Kim, SookMee Lai
  • Patent number: 8841062
    Abstract: Disclosed herein is a photosensitive composition comprising a heterocyclic thiol compound or tautomeric form thereof and its method of use on a substrate, which may include a chalcophile substrate.
    Type: Grant
    Filed: December 4, 2012
    Date of Patent: September 23, 2014
    Assignee: AZ Electronic Materials (Luxembourg) S.A.R.L.
    Inventors: Weihong Liu, Ping-Hung Lu, Medhat Toukhy, SookMee Lai, Yoshiharu Sakurai, Aritaka Hishida
  • Publication number: 20140154624
    Abstract: Disclosed herein is a photosensitive composition comprising a heterocyclic thiol compound or tautomeric form thereof and its method of use on a substrate, which may include a chalcophile substrate.
    Type: Application
    Filed: December 4, 2012
    Publication date: June 5, 2014
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Weihong LIU, Ping-Hung LU, Medhat TOUKHY, SookMee LAI, Yoshiharu SAKURAI, Aritaka HISHIDA
  • Patent number: 8715918
    Abstract: Thick film photoresist compositions are disclosed.
    Type: Grant
    Filed: September 25, 2007
    Date of Patent: May 6, 2014
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Medhat A. Toukhy, Margareta Paunescu
  • Publication number: 20130337380
    Abstract: The invention relates to a novel positive working photosensitive composition having: at least one photoacid generator; at least one novolak polymer; at least one polymer, having a polymer backbone, said polymer comprising a structure of the following formula: wherein R1-R5 are, independently, —H or —CH3, A is a linear or branched C1-C10 alkylene group, B is a C1-C12 alkyl or alicyclic group, D is a linking group that may be a chemical bond, a carboxylate group, wherein the carbonyl carbon is bonded to the polymer backbone, or a —COOCH2— group, wherein the carbonyl carbon is bonded to the polymer backbone, Ar is a substituted or unsubstituted aromatic group or heteroaromatic group, E is a linear or branched C2-C10 alkylene group, G is an acid cleavable group. The invention further relates to a process for using the novel composition for forming an image.
    Type: Application
    Filed: June 15, 2012
    Publication date: December 19, 2013
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Weihong LIU, PingHung LU, Chunwei CHEN, Stephen MEYER, Medhat TOUKHY, SookMee LAI
  • Publication number: 20130337381
    Abstract: Disclosed are compositions for negative-working thick film photophotoresists based on acrylic co-polymers. Also included are methods of using the compositions.
    Type: Application
    Filed: June 15, 2012
    Publication date: December 19, 2013
    Applicant: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L.
    Inventors: Chunwei CHEN, PingHung LU, Weihong LIU, Medhat TOUKHY, SangChul KIM, SookMee LAI
  • Publication number: 20090081589
    Abstract: Thick film photoresist compositions are disclosed.
    Type: Application
    Filed: September 25, 2007
    Publication date: March 26, 2009
    Inventors: Medhat A. Toukhy, Margareta Paunescu
  • Publication number: 20080090184
    Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
    Type: Application
    Filed: October 24, 2007
    Publication date: April 17, 2008
    Inventors: Yu Sui, Hengpeng Wu, Wenbing Kang, Mark Neisser, Tomohide Katayama, Shuji Ding-Lee, Aritaka Hishida, Joseph Oberlander, Medhat Toukhy
  • Publication number: 20080038666
    Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
    Type: Application
    Filed: October 22, 2007
    Publication date: February 14, 2008
    Inventors: Hengpeng Wu, Mark Neisser, Shuji Ding-Lee, Aritaka Hishida, Joseph Oberlander, Medhat Toukhy
  • Publication number: 20080032229
    Abstract: The present invention relates to bottom antireflective coatings.
    Type: Application
    Filed: October 17, 2007
    Publication date: February 7, 2008
    Inventors: Medhat Toukhy, Joseph Oberlander
  • Patent number: 7255970
    Abstract: The present invention provides for a light-sensitive photoresist composition useful for imaging thick films, comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, a photoacid generator which produces a strong acid upon irradiation and a photobleachable dye. The invention further provides for a process for imaging the photoresist of the present invention, especially where the thickness of the photoresist is up to 200 microns and where the process comprises a single exposure step.
    Type: Grant
    Filed: July 12, 2005
    Date of Patent: August 14, 2007
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Medhat A. Toukhy, Ping-Hung Lu, Salem K. Mullen
  • Publication number: 20070105040
    Abstract: The present invention relates to an undercoating composition for a photoresist comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, and a photoacid generator which produces a strong acid upon exposure to radiation, and further where the polymer is transparent at the exposure radiation. The invention also relates to a process for imaging the undercoating composition.
    Type: Application
    Filed: November 10, 2005
    Publication date: May 10, 2007
    Inventors: Medhat Toukhy, Joseph Oberlander, Salem Mullen
  • Publication number: 20070015080
    Abstract: The present invention provides for a light-sensitive photoresist composition useful for imaging thick films, comprising a polymer which is insoluble in an aqueous alkali developer but becomes soluble prior to development, a photoacid generator which produces a strong acid upon irradiation and a photobleachable dye. The invention further provides for a process for imaging the photoresist of the present invention, especially where the thickness of the photoresist is up to 200 microns and where the process comprises a single exposure step.
    Type: Application
    Filed: July 12, 2005
    Publication date: January 18, 2007
    Inventors: Medhat Toukhy, Ping-Hung Lu, Salem Mullen
  • Publication number: 20060199103
    Abstract: Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of ?/2n wherein ? is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.
    Type: Application
    Filed: May 2, 2006
    Publication date: September 7, 2006
    Inventors: Mark Neisser, Joseph Oberlander, Medhat Toukhy, Raj Sakamuri, Shuji Ding-Lee
  • Patent number: 7070914
    Abstract: Disclosed is a process for forming an image on a substrate, comprising the steps of: (a) coating on the substrate a first layer of a radiation sensitive, antireflective composition; (b) coating a second layer of a photoresist composition onto the first layer of the antireflective composition; (c) selectively exposing the coated substrate from step (b) to actinic radiation; and (d) developing the exposed coated substrate from step (c) to form an image; wherein both the photoresist composition and the antireflective composition are exposed in step (c); both are developed in step (d) using a single developer; wherein the antireflective composition of step (a) is a first minimum bottom antireflective coating (B.A.R.C.) composition, having a solids content of up to about 8% solids, and a maximum coating thickness of the coated substrate of ? 2 ? n wherein ? is the wavelength of the actinic radiation of step (c) and n is the refractive index of the B.A.R.C. composition.
    Type: Grant
    Filed: January 9, 2002
    Date of Patent: July 4, 2006
    Assignee: AZ Electronic Materials USA Corp.
    Inventors: Mark O. Neisser, Joseph E. Oberlander, Medhat A. Toukhy, Raj Sakamuri, Shuji Ding-Lee
  • Publication number: 20060063105
    Abstract: The present invention relates to novel negative-working, photoimageable, and aqueous developable antireflective coating compositions and their use in image processing by forming a thin layer of the novel antireflective coating composition between a reflective substrate and a photoresist coating. The negative bottom photoimageable antireflective coating composition is capable of being developed in an alkaline developer and is coated below a negative photoresist.
    Type: Application
    Filed: October 27, 2005
    Publication date: March 23, 2006
    Inventors: Joseph Oberlander, Ralph Dammel, Shuji Ding-Lee, Mark Neisser, Medhat Toukhy
  • Publication number: 20050214674
    Abstract: The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.
    Type: Application
    Filed: March 25, 2004
    Publication date: September 29, 2005
    Inventors: Yu Sui, Hengpeng Wu, Wenbing Kang, Mark Neisser, Tomohide Katayama, Shuji Ding-Lee, Aritaka Hishida, Joseph Oberlander, Medhat Toukhy