Patents by Inventor Media Lario, S.R.L.

Media Lario, S.R.L. has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Source-collector modules for EUV lithography employing a GIC mirror and a LPP source
    Publication number: 20130207004
    Abstract: Source-collector modules for use with EUV lithography systems are disclosed, wherein the source-collector modules employ a laser-produced plasma EUV radiation source and a grazing-incidence collector. The EUV radiation source is generated by first forming an under-dense plasma, and then irradiating the under-dense plasma with infrared radiation of sufficient intensity to create a final EUV-emitting plasma. The grazing incidence collector can include a grating configured to prevent infrared radiation from reaching the intermediate focus. Use of debris mitigation devices preserves the longevity of operation of the source-collector modules.
    Type: Application
    Filed: February 7, 2013
    Publication date: August 15, 2013
    Applicant: Media Lario, S.R.L.
    Inventor: Media Lario, S.R.L.