Abstract: A pixel includes: a light emitting diode; a first transistor; a first capacitor connected between a first node and a gate electrode of the first transistor; a second transistor including a first electrode electrically connected to the gate electrode of the first transistor, a second electrode and a gate electrode which receives a first scan signal; and a third transistor including a first electrode electrically connected to the second electrode of the second transistor, a second electrode electrically connected to a third voltage line, and a gate electrode which receives a second scan signal. During an initialization period, an initialization voltage provided from the third voltage line is provided to the gate electrode of the first transistor through the third and second transistors, and, when the initialization period is terminated, at least one of the second transistor and the third transistor is turned off.

Abstract: Disclosed is a copolymer suitable for use as a resist for atomic force microscope (AFM) lithography or e-beam lithography. The copolymer contains fluoroalkylsulfonium salts as photoacid generators. The copolymer has high solubility in organic solvents and high coating ability. In addition, the copolymer can be patterned with high sensitivity and resolution by lithography. Further disclosed is a method of preparation for the copolymer.

Abstract: Disclosed is a copolymer suitable for use as a resist for atomic force microscope (AFM) lithography or e-beam lithography. The copolymer contains fluoroalkylsulfonium salts as photoacid generators. The copolymer has high solubility in organic solvents and high coating ability. In addition, the copolymer can be patterned with high sensitivity and resolution by lithography. Further disclosed is a method of preparation for the copolymer.