Patents by Inventor Mee-Young Yoon

Mee-Young Yoon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20140259452
    Abstract: Described are compositions and methods for enzymatic bleaching of textiles. A perhydrolase enzyme is used in combination with an ester substrate and hydrogen peroxide to produce a peracid for textile bleaching. Textiles bleached by the exhibit increased dye uptake, decreased textile damage, and/or bulkier softer handle than textiles bleached by conventional chemical bleaching processes.
    Type: Application
    Filed: March 20, 2014
    Publication date: September 18, 2014
    Applicant: DANISCO US INC.
    Inventors: Anna-Liisa Auterinen, Biancamari Prozzo, Erwin Redling, Lode Vermeersch, Mee-Young Yoon
  • Patent number: 8834865
    Abstract: The invention provides methods, compositions, systems, and kits that include an enzyme/substrate co-delivery system. The liquid delivery system includes at least one enzyme encapsulated in a water-soluble polymeric matrix and a substrate for the enzyme in a carrier liquid in which the polymeric matrix is insoluble. When water is added, the polymeric matrix is solubilized and enzyme is released from the matrix, permitting catalytic action upon the substrate.
    Type: Grant
    Filed: November 3, 2009
    Date of Patent: September 16, 2014
    Assignee: Danisco US Inc.
    Inventors: Nathaniel T. Becker, Michael Stoner, Mee-Young Yoon
  • Publication number: 20130111674
    Abstract: Described are compositions and methods relating to the treatment of keratinous fibers and textiles comprising such fibers with enzymatically-generated peracids in aqueous media. The treatment has beneficial effects, including reducing felting, increasing dye uptake, and reducing prickling tendency.
    Type: Application
    Filed: March 1, 2011
    Publication date: May 9, 2013
    Applicant: Danisco US Inc.
    Inventor: Mee-Young Yoon
  • Publication number: 20120036649
    Abstract: Described are compositions and methods for enzymatic bleaching of textiles. A perhydrolase enzyme is used in combination with an ester substrate and hydrogen peroxide to produce a peracid for textile bleaching. Textiles bleached by the methods herein exhibit increased dye uptake, decreased textile damage, and/or bulkier softer handle than textiles bleached by conventional chemical bleaching processes.
    Type: Application
    Filed: September 10, 2009
    Publication date: February 16, 2012
    Applicant: DANISCO US INC.
    Inventors: Anna-Liisa Auterinen, Biancamari Prozzo, Erwin Redling, Lode Vermeersch, Mee-Young Yoon
  • Publication number: 20110300201
    Abstract: The invention provides methods, compositions, systems, and kits that include an enzyme/substrate co-delivery system. The liquid delivery system includes at least one enzyme encapsulated in a water-soluble polymeric matrix and a substrate for the enzyme in a carrier liquid in which the polymeric matrix is insoluble. When water is added, the polymeric matrix is solubilized and enzyme is released from the matrix, permitting catalytic action upon the substrate.
    Type: Application
    Filed: November 3, 2009
    Publication date: December 8, 2011
    Applicant: DANISCO US INC.
    Inventors: Nathaniel T. Becker, Michael Stoner, Mee-Young Yoon
  • Publication number: 20110269210
    Abstract: Disclosed are compositions comprising variants of alpha-amylase that have alpha-amylase activity and that exhibit altered properties relative to a parent AmyS-like alpha-amylase from which they are derived. The compositions generally comprise at least one of an additional enzyme, a detergent,.a surfactant, a chelator, an oxidizing agent, an acidulant, an alkalizing agent, a source of peroxide, a source of hardness, a salt, a detergent complexing agent, a polymer, a stabilizing agent, or a fabric conditioner. Also disclosed are detergent formulations comprising the variants. Methods of using the compositions for desizing woven material and washing or cleaning items, such as dishes or laundry, are disclosed. Kits related thereto are also provided.
    Type: Application
    Filed: June 2, 2011
    Publication date: November 3, 2011
    Applicant: Danisco US Inc.
    Inventor: Mee-Young Yoon
  • Publication number: 20100029538
    Abstract: The present invention is directed to novel compositions and methods for enzymatic one-step pretreatment of cellulosic, cellulosic-containing (e.g., cotton and cotton-containing) and non-cellulosic textiles, fibers and fabrics. Pretreatment comprises scouring and bleaching, and optionally, desizing of the textiles.
    Type: Application
    Filed: April 10, 2007
    Publication date: February 4, 2010
    Inventors: Anna-Liisa Auterinen, Ayrookaran J. Poulose, Mee-Young Yoon
  • Publication number: 20090209026
    Abstract: Disclosed are compositions comprising variants of alpha-amylase that have alpha-amylase activity and that exhibit altered properties relative to a parent AmyS-like alpha-amylase from which they are derived. The compositions generally comprise at least one of an additional enzyme, a detergent, a surfactant, a chelator, an oxidizing agent, an acidulant, an alkalizing agent, a source of peroxide, a source of hardness, a salt, a detergent complexing agent, a polymer, a stabilizing agent, or a fabric conditioner. Also disclosed are detergent formulations comprising the variants. Methods of using the compositions for desizing woven material and washing or cleaning items, such as dishes or laundry, are disclosed. Kits related thereto are also provided.
    Type: Application
    Filed: November 3, 2008
    Publication date: August 20, 2009
    Applicant: Danisco US Inc., Genencor Division
    Inventor: Mee-Young Yoon
  • Publication number: 20070134779
    Abstract: A method is provided for enzymatically modifying a polyester resin, film, fiber, yarn, fabric or textile to modify the characteristics thereof.
    Type: Application
    Filed: October 18, 2006
    Publication date: June 14, 2007
    Inventors: Wade Dyson, James Kellis, Ayrookaran Poulose, Mee-Young Yoon
  • Patent number: 6933140
    Abstract: A polyesterase enzyme which produces a positive result in an UV and/or MB assay is used to treat polyester to modify polyester properties such as pilling, pilling prevention, weight, feel, appearance and luster.
    Type: Grant
    Filed: November 5, 1999
    Date of Patent: August 23, 2005
    Assignee: Genencor International, Inc.
    Inventors: Wade Dyson, James T. Kellis, Jr., Ayrookaran J. Poulose, Mee-Young Yoon
  • Publication number: 20030082755
    Abstract: A method is provided for enzymatically modifying a polyester resin, film, fiber, yarn, fabric or textile to modify the characteristics thereof.
    Type: Application
    Filed: September 4, 2002
    Publication date: May 1, 2003
    Inventors: Wade Dyson, James T. Kellis, Ayrookaran J. Poulose, Mee-Young Yoon
  • Patent number: 6376355
    Abstract: A method for forming a metal interconnection filing a contact hole or a groove having a high aspect ratio. An interdielectric layer pattern having a recessed region corresponding to the contact hole or the groove is formed on a semiconductor substrate, and a barrier metal layer is formed on the entire surface of the resultant structure where the interdielectric layer pattern is formed. An anti-nucleation layer is selectively formed only on the non-recessed region of the barrier metal layer, thereby exposing the barrier metal layer formed on the sidewalls and the bottom of the recessed region. Subsequently, a metal plug is selectively formed in the recessed region, surrounded by the barrier metal layer, thereby forming a metal interconnection for completely filling the contact hole or the groove having a high aspect ratio.
    Type: Grant
    Filed: August 19, 1998
    Date of Patent: April 23, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Mee-young Yoon, Sang-in Lee
  • Patent number: 6372598
    Abstract: A selective metal layer formation method, a capacitor formation method using the same, and a method of forming an ohmic layer on a contact hole and filling the contact hole using the same, are provided. A sacrificial metal layer is selectively deposited on a conductive layer by supplying a sacrificial metal source gas which deposits selectively on a semiconductor substrate having an insulating film and the conductive layer. Sacrificial metal atoms and a halide are formed, and the sacrificial metal layer is replaced with a deposition metal layer such as titanium Ti or platinum Pt, by supplying a metal halide gas having a halogen coherence smaller than the halogen coherence of the metal atoms in the sacrificial metal layer. If such a process is used to form a capacitor lower electrode or form an ohmic layer on the bottom of a contact hole, a metal layer can be selectively formed at a temperature of 500° C. or lower.
    Type: Grant
    Filed: June 16, 1999
    Date of Patent: April 16, 2002
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-bum Kang, Yun-sook Chae, Sang-in Lee, Hyun-seok Lim, Mee-young Yoon
  • Patent number: 6358829
    Abstract: A method for fabricating a semiconductor device having an aluminum (Al) interconnection layer with excellent surface morphology forms an interface control layer having a plurality of atomic layers before forming the Al interconnection layer. In the fabrication method, an interlayer dielectric (ILD) film having a contact hole which exposes a conductive region of the semiconductor substrate is formed on a semiconductor substrate, and an interface control layer having a plurality of atomic layers continuously deposited is formed on the inner wall of the contact hole and the upper surface of the interlayer dielectric film, to a thickness on the order of several angstroms to several tens of angstroms. Then, chemical vapor deposition (CVD) completes an Al blanket deposition on the resultant structure, including the interface control layer, to form a contact plug in the contact hole and an interconnection layer on the interlayer dielectric film.
    Type: Grant
    Filed: September 16, 1999
    Date of Patent: March 19, 2002
    Assignee: Samsung Electronics Company., Ltd.
    Inventors: Mee-Young Yoon, Sang-In Lee, Hyun-Seok Lim
  • Publication number: 20020007518
    Abstract: A method is provided for improving the uptake of a cationic compound onto a polyester article starting material, comprising the steps of: (a) obtaining a polyesterase enzyme; (b) contacting said polyesterase enzyme with said polyester article starting material under conditions and for a time suitable for said polyesterase to produce surface modification of said polyester article starting material and produce a surface modified polyester; (c) contacting said modified polyester article, subsequently or simultaneously with said step (b) with a cationic compound whereby adherence of said cationic compound to said modified polyester is increased compared to said polyester starting material. Also disclosed is a method for increasing the hydrophilicity of a polyester to improve fabric characteristics such as stain resistance, wettability and/or dyeability.
    Type: Application
    Filed: July 3, 2001
    Publication date: January 24, 2002
    Inventors: James T. Kellis, Ayrookaran J. Poulose, Mee-Young Yoon
  • Publication number: 20020006708
    Abstract: A selective metal layer formation method, a capacitor formation method using the same, and a method of forming an ohmic layer on a contact hole and filling the contact hole using the same, are provided. A sacrificial metal layer is selectively deposited on a conductive layer by supplying a sacrificial metal source gas which deposits selectively on a semiconductor substrate having an insulating film and the conductive layer. Sacrificial metal atoms and a halide are formed, and the sacrificial metal layer is replaced with a deposition metal layer such as titanium Ti or platinum Pt, by supplying a metal halide gas having a halogen coherence smaller than the halogen coherence of the metal atoms in the sacrificial metal layer. If such a process is used to form a capacitor lower electrode or form an ohmic layer on the bottom of a contact hole, a metal layer can be selectively formed at a temperature of 500° C. or lower.
    Type: Application
    Filed: June 16, 1999
    Publication date: January 17, 2002
    Inventors: SANG-BUM KANG, YUN-SOOK CHAE, SANG-IN LEE, HYUN-SEOK LIM, MEE-YOUNG YOON
  • Patent number: 6254645
    Abstract: A method is provided for improving the uptake of a cationic compound onto a polyester article starting material, comprising the steps of: (a) obtaining a polyesterase enzyme; (b) contacting said polyesterase enzyme with said polyester article starting material under conditions and for a time suitable for said polyesterase to produce surface modification of said polyester article starting material and produce a surface modified polyester; (c) contacting said modified polyester article, subsequently or simultaneously with said step (b) with a cationic compound whereby adherence of said cationic compound to said modified polyester is increased compared to said polyester starting material. Also disclosed is a method for increasing the hydrophilicity of a polyester to improve fabric characteristics such as stain resistance, wettability and/or dyeability.
    Type: Grant
    Filed: November 5, 1999
    Date of Patent: July 3, 2001
    Assignee: Genencor International, Inc.
    Inventors: James T. Kellis, Jr., Ayrookaran J. Poulose, Mee-Young Yoon
  • Patent number: 5980579
    Abstract: A method is provided for reducing the shrinkage of wool comprising the steps of: (a) preparing an aqueous solution comprising an oxidase or a peroxidase; and (b) contacting a wool containing article with said aqueous solution under conditions suitable for reacting said oxidase or peroxidase with said wool.
    Type: Grant
    Filed: December 17, 1996
    Date of Patent: November 9, 1999
    Assignee: Genencor International, Inc.
    Inventor: Mee-Young Yoon
  • Patent number: 5871550
    Abstract: A mutant cellulase obtainable from Thermomonospora spp is provided which differs from a precursor cellulase in that it has been genetically engineered to introduce a substitution, deletion or addition of an amino acid residue to said precursor cellulase which provided improved activity in a detergent. Preferably, the substitution is at a residue corresponding to T140 in Thermomonospora fusca.
    Type: Grant
    Filed: August 26, 1997
    Date of Patent: February 16, 1999
    Assignee: Genencor International, Inc.
    Inventors: Frits Goedegebuur, Scott D. Power, Deborah Winetzky, Anita Van Kimmenade, Mee-Young Yoon
  • Patent number: 5686350
    Abstract: A method for fabricating a defect-free compound semiconductor thin film on a dielectric thin film which oxidizes multi-semiconductor layers consisting of a hetero compound semiconductor thin film made of one of GaAs, InGaAs or InAs over a thin film containing a carbon impurity of a high concentration and made of AlGaAs series by an annealing at a vapor ambient, thereby rapidly growing a hetero-semiconductor thin film over a dielectric thin film made of Al.sub.2 O.sub.3 with no defect.
    Type: Grant
    Filed: November 29, 1994
    Date of Patent: November 11, 1997
    Assignee: Electronics and Telecommunications Research Institute
    Inventors: Bun Lee, Mee-Young Yoon, Jong-Hyeob Baek