Patents by Inventor Mee-Young Yoon
Mee-Young Yoon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140259452Abstract: Described are compositions and methods for enzymatic bleaching of textiles. A perhydrolase enzyme is used in combination with an ester substrate and hydrogen peroxide to produce a peracid for textile bleaching. Textiles bleached by the exhibit increased dye uptake, decreased textile damage, and/or bulkier softer handle than textiles bleached by conventional chemical bleaching processes.Type: ApplicationFiled: March 20, 2014Publication date: September 18, 2014Applicant: DANISCO US INC.Inventors: Anna-Liisa Auterinen, Biancamari Prozzo, Erwin Redling, Lode Vermeersch, Mee-Young Yoon
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Patent number: 8834865Abstract: The invention provides methods, compositions, systems, and kits that include an enzyme/substrate co-delivery system. The liquid delivery system includes at least one enzyme encapsulated in a water-soluble polymeric matrix and a substrate for the enzyme in a carrier liquid in which the polymeric matrix is insoluble. When water is added, the polymeric matrix is solubilized and enzyme is released from the matrix, permitting catalytic action upon the substrate.Type: GrantFiled: November 3, 2009Date of Patent: September 16, 2014Assignee: Danisco US Inc.Inventors: Nathaniel T. Becker, Michael Stoner, Mee-Young Yoon
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Publication number: 20130111674Abstract: Described are compositions and methods relating to the treatment of keratinous fibers and textiles comprising such fibers with enzymatically-generated peracids in aqueous media. The treatment has beneficial effects, including reducing felting, increasing dye uptake, and reducing prickling tendency.Type: ApplicationFiled: March 1, 2011Publication date: May 9, 2013Applicant: Danisco US Inc.Inventor: Mee-Young Yoon
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Publication number: 20120036649Abstract: Described are compositions and methods for enzymatic bleaching of textiles. A perhydrolase enzyme is used in combination with an ester substrate and hydrogen peroxide to produce a peracid for textile bleaching. Textiles bleached by the methods herein exhibit increased dye uptake, decreased textile damage, and/or bulkier softer handle than textiles bleached by conventional chemical bleaching processes.Type: ApplicationFiled: September 10, 2009Publication date: February 16, 2012Applicant: DANISCO US INC.Inventors: Anna-Liisa Auterinen, Biancamari Prozzo, Erwin Redling, Lode Vermeersch, Mee-Young Yoon
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Publication number: 20110300201Abstract: The invention provides methods, compositions, systems, and kits that include an enzyme/substrate co-delivery system. The liquid delivery system includes at least one enzyme encapsulated in a water-soluble polymeric matrix and a substrate for the enzyme in a carrier liquid in which the polymeric matrix is insoluble. When water is added, the polymeric matrix is solubilized and enzyme is released from the matrix, permitting catalytic action upon the substrate.Type: ApplicationFiled: November 3, 2009Publication date: December 8, 2011Applicant: DANISCO US INC.Inventors: Nathaniel T. Becker, Michael Stoner, Mee-Young Yoon
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Publication number: 20110269210Abstract: Disclosed are compositions comprising variants of alpha-amylase that have alpha-amylase activity and that exhibit altered properties relative to a parent AmyS-like alpha-amylase from which they are derived. The compositions generally comprise at least one of an additional enzyme, a detergent,.a surfactant, a chelator, an oxidizing agent, an acidulant, an alkalizing agent, a source of peroxide, a source of hardness, a salt, a detergent complexing agent, a polymer, a stabilizing agent, or a fabric conditioner. Also disclosed are detergent formulations comprising the variants. Methods of using the compositions for desizing woven material and washing or cleaning items, such as dishes or laundry, are disclosed. Kits related thereto are also provided.Type: ApplicationFiled: June 2, 2011Publication date: November 3, 2011Applicant: Danisco US Inc.Inventor: Mee-Young Yoon
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Publication number: 20100029538Abstract: The present invention is directed to novel compositions and methods for enzymatic one-step pretreatment of cellulosic, cellulosic-containing (e.g., cotton and cotton-containing) and non-cellulosic textiles, fibers and fabrics. Pretreatment comprises scouring and bleaching, and optionally, desizing of the textiles.Type: ApplicationFiled: April 10, 2007Publication date: February 4, 2010Inventors: Anna-Liisa Auterinen, Ayrookaran J. Poulose, Mee-Young Yoon
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Publication number: 20090209026Abstract: Disclosed are compositions comprising variants of alpha-amylase that have alpha-amylase activity and that exhibit altered properties relative to a parent AmyS-like alpha-amylase from which they are derived. The compositions generally comprise at least one of an additional enzyme, a detergent, a surfactant, a chelator, an oxidizing agent, an acidulant, an alkalizing agent, a source of peroxide, a source of hardness, a salt, a detergent complexing agent, a polymer, a stabilizing agent, or a fabric conditioner. Also disclosed are detergent formulations comprising the variants. Methods of using the compositions for desizing woven material and washing or cleaning items, such as dishes or laundry, are disclosed. Kits related thereto are also provided.Type: ApplicationFiled: November 3, 2008Publication date: August 20, 2009Applicant: Danisco US Inc., Genencor DivisionInventor: Mee-Young Yoon
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Publication number: 20070134779Abstract: A method is provided for enzymatically modifying a polyester resin, film, fiber, yarn, fabric or textile to modify the characteristics thereof.Type: ApplicationFiled: October 18, 2006Publication date: June 14, 2007Inventors: Wade Dyson, James Kellis, Ayrookaran Poulose, Mee-Young Yoon
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Patent number: 6933140Abstract: A polyesterase enzyme which produces a positive result in an UV and/or MB assay is used to treat polyester to modify polyester properties such as pilling, pilling prevention, weight, feel, appearance and luster.Type: GrantFiled: November 5, 1999Date of Patent: August 23, 2005Assignee: Genencor International, Inc.Inventors: Wade Dyson, James T. Kellis, Jr., Ayrookaran J. Poulose, Mee-Young Yoon
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Publication number: 20030082755Abstract: A method is provided for enzymatically modifying a polyester resin, film, fiber, yarn, fabric or textile to modify the characteristics thereof.Type: ApplicationFiled: September 4, 2002Publication date: May 1, 2003Inventors: Wade Dyson, James T. Kellis, Ayrookaran J. Poulose, Mee-Young Yoon
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Patent number: 6376355Abstract: A method for forming a metal interconnection filing a contact hole or a groove having a high aspect ratio. An interdielectric layer pattern having a recessed region corresponding to the contact hole or the groove is formed on a semiconductor substrate, and a barrier metal layer is formed on the entire surface of the resultant structure where the interdielectric layer pattern is formed. An anti-nucleation layer is selectively formed only on the non-recessed region of the barrier metal layer, thereby exposing the barrier metal layer formed on the sidewalls and the bottom of the recessed region. Subsequently, a metal plug is selectively formed in the recessed region, surrounded by the barrier metal layer, thereby forming a metal interconnection for completely filling the contact hole or the groove having a high aspect ratio.Type: GrantFiled: August 19, 1998Date of Patent: April 23, 2002Assignee: Samsung Electronics Co., Ltd.Inventors: Mee-young Yoon, Sang-in Lee
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Patent number: 6372598Abstract: A selective metal layer formation method, a capacitor formation method using the same, and a method of forming an ohmic layer on a contact hole and filling the contact hole using the same, are provided. A sacrificial metal layer is selectively deposited on a conductive layer by supplying a sacrificial metal source gas which deposits selectively on a semiconductor substrate having an insulating film and the conductive layer. Sacrificial metal atoms and a halide are formed, and the sacrificial metal layer is replaced with a deposition metal layer such as titanium Ti or platinum Pt, by supplying a metal halide gas having a halogen coherence smaller than the halogen coherence of the metal atoms in the sacrificial metal layer. If such a process is used to form a capacitor lower electrode or form an ohmic layer on the bottom of a contact hole, a metal layer can be selectively formed at a temperature of 500° C. or lower.Type: GrantFiled: June 16, 1999Date of Patent: April 16, 2002Assignee: Samsung Electronics Co., Ltd.Inventors: Sang-bum Kang, Yun-sook Chae, Sang-in Lee, Hyun-seok Lim, Mee-young Yoon
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Patent number: 6358829Abstract: A method for fabricating a semiconductor device having an aluminum (Al) interconnection layer with excellent surface morphology forms an interface control layer having a plurality of atomic layers before forming the Al interconnection layer. In the fabrication method, an interlayer dielectric (ILD) film having a contact hole which exposes a conductive region of the semiconductor substrate is formed on a semiconductor substrate, and an interface control layer having a plurality of atomic layers continuously deposited is formed on the inner wall of the contact hole and the upper surface of the interlayer dielectric film, to a thickness on the order of several angstroms to several tens of angstroms. Then, chemical vapor deposition (CVD) completes an Al blanket deposition on the resultant structure, including the interface control layer, to form a contact plug in the contact hole and an interconnection layer on the interlayer dielectric film.Type: GrantFiled: September 16, 1999Date of Patent: March 19, 2002Assignee: Samsung Electronics Company., Ltd.Inventors: Mee-Young Yoon, Sang-In Lee, Hyun-Seok Lim
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Publication number: 20020007518Abstract: A method is provided for improving the uptake of a cationic compound onto a polyester article starting material, comprising the steps of: (a) obtaining a polyesterase enzyme; (b) contacting said polyesterase enzyme with said polyester article starting material under conditions and for a time suitable for said polyesterase to produce surface modification of said polyester article starting material and produce a surface modified polyester; (c) contacting said modified polyester article, subsequently or simultaneously with said step (b) with a cationic compound whereby adherence of said cationic compound to said modified polyester is increased compared to said polyester starting material. Also disclosed is a method for increasing the hydrophilicity of a polyester to improve fabric characteristics such as stain resistance, wettability and/or dyeability.Type: ApplicationFiled: July 3, 2001Publication date: January 24, 2002Inventors: James T. Kellis, Ayrookaran J. Poulose, Mee-Young Yoon
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Publication number: 20020006708Abstract: A selective metal layer formation method, a capacitor formation method using the same, and a method of forming an ohmic layer on a contact hole and filling the contact hole using the same, are provided. A sacrificial metal layer is selectively deposited on a conductive layer by supplying a sacrificial metal source gas which deposits selectively on a semiconductor substrate having an insulating film and the conductive layer. Sacrificial metal atoms and a halide are formed, and the sacrificial metal layer is replaced with a deposition metal layer such as titanium Ti or platinum Pt, by supplying a metal halide gas having a halogen coherence smaller than the halogen coherence of the metal atoms in the sacrificial metal layer. If such a process is used to form a capacitor lower electrode or form an ohmic layer on the bottom of a contact hole, a metal layer can be selectively formed at a temperature of 500° C. or lower.Type: ApplicationFiled: June 16, 1999Publication date: January 17, 2002Inventors: SANG-BUM KANG, YUN-SOOK CHAE, SANG-IN LEE, HYUN-SEOK LIM, MEE-YOUNG YOON
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Patent number: 6254645Abstract: A method is provided for improving the uptake of a cationic compound onto a polyester article starting material, comprising the steps of: (a) obtaining a polyesterase enzyme; (b) contacting said polyesterase enzyme with said polyester article starting material under conditions and for a time suitable for said polyesterase to produce surface modification of said polyester article starting material and produce a surface modified polyester; (c) contacting said modified polyester article, subsequently or simultaneously with said step (b) with a cationic compound whereby adherence of said cationic compound to said modified polyester is increased compared to said polyester starting material. Also disclosed is a method for increasing the hydrophilicity of a polyester to improve fabric characteristics such as stain resistance, wettability and/or dyeability.Type: GrantFiled: November 5, 1999Date of Patent: July 3, 2001Assignee: Genencor International, Inc.Inventors: James T. Kellis, Jr., Ayrookaran J. Poulose, Mee-Young Yoon
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Patent number: 5980579Abstract: A method is provided for reducing the shrinkage of wool comprising the steps of: (a) preparing an aqueous solution comprising an oxidase or a peroxidase; and (b) contacting a wool containing article with said aqueous solution under conditions suitable for reacting said oxidase or peroxidase with said wool.Type: GrantFiled: December 17, 1996Date of Patent: November 9, 1999Assignee: Genencor International, Inc.Inventor: Mee-Young Yoon
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Patent number: 5871550Abstract: A mutant cellulase obtainable from Thermomonospora spp is provided which differs from a precursor cellulase in that it has been genetically engineered to introduce a substitution, deletion or addition of an amino acid residue to said precursor cellulase which provided improved activity in a detergent. Preferably, the substitution is at a residue corresponding to T140 in Thermomonospora fusca.Type: GrantFiled: August 26, 1997Date of Patent: February 16, 1999Assignee: Genencor International, Inc.Inventors: Frits Goedegebuur, Scott D. Power, Deborah Winetzky, Anita Van Kimmenade, Mee-Young Yoon
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Patent number: 5686350Abstract: A method for fabricating a defect-free compound semiconductor thin film on a dielectric thin film which oxidizes multi-semiconductor layers consisting of a hetero compound semiconductor thin film made of one of GaAs, InGaAs or InAs over a thin film containing a carbon impurity of a high concentration and made of AlGaAs series by an annealing at a vapor ambient, thereby rapidly growing a hetero-semiconductor thin film over a dielectric thin film made of Al.sub.2 O.sub.3 with no defect.Type: GrantFiled: November 29, 1994Date of Patent: November 11, 1997Assignee: Electronics and Telecommunications Research InstituteInventors: Bun Lee, Mee-Young Yoon, Jong-Hyeob Baek