Patents by Inventor Meei-Yn LIN

Meei-Yn LIN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11931388
    Abstract: Disclosed herein is a process for producing a postbiotic extract, which includes providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to form a mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract. Use of the postbiotic extract is also disclosed.
    Type: Grant
    Filed: November 2, 2022
    Date of Patent: March 19, 2024
    Assignee: CHAMBIO CO., LTD.
    Inventors: Meei-Yn Lin, Hung-Pin Chiu, Yi-Heng Chiu
  • Patent number: 11925668
    Abstract: Disclosed herein is a process for producing a postbiotic extract, which includes providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to form a mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract. Use of the postbiotic extract is also disclosed.
    Type: Grant
    Filed: November 2, 2022
    Date of Patent: March 12, 2024
    Assignee: CHAMBIO CO., LTD.
    Inventors: Meei-Yn Lin, Hung-Pin Chiu, Yi-Heng Chiu
  • Publication number: 20240000866
    Abstract: The present disclosure provides a novel Streptococcus thermophilus strain, and the probiotic composition thereof and the use thereof for producing sialic acid and hyaluronic acid, anti-oxidation, anti-inflammatory, and alleviating dry eye syndrome. The novel Streptococcus thermophilus strain and/or metabolites thereof of the present disclosure can be used to prepare medicaments, food products, health food, and/or external products for anti-oxidation, anti-inflammation, and alleviating dry eye syndrome.
    Type: Application
    Filed: January 10, 2023
    Publication date: January 4, 2024
    Inventors: Meei-Yn Lin, Pin-Chao Huang, Pei-Cheng Lin, Tsung-Han Lu
  • Publication number: 20230293606
    Abstract: Disclosed herein is a process for producing a postbiotic extract, which includes providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to form a mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract. Use of the postbiotic extract is also disclosed.
    Type: Application
    Filed: November 2, 2022
    Publication date: September 21, 2023
    Inventors: Meei-Yn LIN, Hung-Pin CHIU, Yi-Heng CHIU
  • Publication number: 20230285479
    Abstract: Disclosed herein is a process for producing a postbiotic extract, which includes providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to form a mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract. Use of the postbiotic extract is also disclosed.
    Type: Application
    Filed: November 2, 2022
    Publication date: September 14, 2023
    Inventors: Meei-Yn LIN, Hung-Pin CHIU, Yi-Heng CHIU
  • Publication number: 20230079590
    Abstract: Disclosed herein is a method for preventing or alleviating particulate matter-induced lung injury. The method includes administering to a subject in need thereof a pharmaceutical composition including at least one heat-killed lactic acid bacterial strain that is selected from the group consisting of Lactobacillus plantarum CB102 which is deposited at the Deutsche Sammlung von Mikroorganismen und Zellkulturen (DSMZ) GmbH under an accession number DSM 33894, Lactobacillus acidophilus JCM 1132, Bifidobacterium longum CB108 which is deposited at the DSMZ GmbH under an accession number DSM 33895, Bifidobacterium animalis subsp. lactis JCM 10602, and combinations thereof.
    Type: Application
    Filed: November 18, 2021
    Publication date: March 16, 2023
    Inventors: Meei-Yn Lin, Hung-Pin Chiu, Yi-Heng Chiu
  • Patent number: 11541085
    Abstract: Disclosed herein is a process for producing a postbiotic extract, which includes providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to form a mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract. Use of the postbiotic extract is also disclosed.
    Type: Grant
    Filed: September 29, 2020
    Date of Patent: January 3, 2023
    Assignee: CHAMBIO CO., LTD.
    Inventors: Meei-Yn Lin, Hung-Pin Chiu, Yi-Heng Chiu
  • Patent number: 11517596
    Abstract: A method for alleviating arthritis includes administering to a subject in need thereof a postbiotic extract. The postbiotic extract is prepared by a process including the steps of providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to forma mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract.
    Type: Grant
    Filed: September 29, 2020
    Date of Patent: December 6, 2022
    Assignee: CHAMBIOCO., LTD.
    Inventors: Meei-Yn Lin, Hung-Pin Chiu, Yi-Heng Chiu
  • Patent number: 11517597
    Abstract: A method for improving skin condition includes administering to a subject in need thereof a postbiotic extract. The postbiotic extract is prepared by a process including the steps of providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to forma mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract.
    Type: Grant
    Filed: September 29, 2020
    Date of Patent: December 6, 2022
    Assignee: CHAMBIO CO., LTD.
    Inventors: Meei-Yn Lin, Hung-Pin Chiu, Yi-Heng Chiu
  • Publication number: 20220096572
    Abstract: A method for alleviating arthritis includes administering to a subject in need thereof a postbiotic extract. The postbiotic extract is prepared by a process including the steps of providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to forma mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract.
    Type: Application
    Filed: September 29, 2020
    Publication date: March 31, 2022
    Inventors: Meei-Yn LIN, Hung-Pin CHIU, Yi-Heng CHIU
  • Publication number: 20220096571
    Abstract: Disclosed herein is a process for producing a postbiotic extract, which includes providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to form a mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract. Use of the postbiotic extract is also disclosed.
    Type: Application
    Filed: September 29, 2020
    Publication date: March 31, 2022
    Inventors: Meei-Yn LIN, Hung-Pin CHIU, Yi-Heng CHIU
  • Publication number: 20220096573
    Abstract: A method for improving skin condition includes administering to a subject in need thereof a postbiotic extract. The postbiotic extract is prepared by a process including the steps of providing a first material having a first isoelectric point ranging from pH 1 to pH 6 and a second material having a second isoelectric point ranging from pH 4 to pH 8, admixing the first material and a probiotic microorganism with water having a pH greater than the second isoelectric point, so as to forma mixture, adding the second material into the mixture and then adjusting a pH of the second material-added mixture to between the first and second isoelectric points so that a precipitate is formed, and subjecting the precipitate to a cell wall isolation treatment to obtain the postbiotic extract.
    Type: Application
    Filed: September 29, 2020
    Publication date: March 31, 2022
    Inventors: Meei-Yn LIN, Hung-Pin CHIU, Yi-Heng CHIU