Patents by Inventor Meei-Yu Hsu
Meei-Yu Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230234933Abstract: An epoxy compound, composition and cured product thereof are provided. The epoxy compound has a structure represented by Formula (I) wherein R1 and R2 are each independently cyano group, isocyanate group, oxiranyl, methyloxiranyl group, glycidyl group, methylglycidyl group, epoxypropyl group, oxetanyl group, oxetanemethyl group, or C1-C10 alkoxy group; Z is —O—, R3 and R4 are each independently hydrogen, fluorine, methyl, fluoromethyl, or ethyl; n and m are each independently 3, 4, 5, 6, 7, 8, 9, or 10; and i and j are each independently 1, 2, or 3.Type: ApplicationFiled: December 28, 2022Publication date: July 27, 2023Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Meei-Yu HSU, Chih-Hao LIN, Kai-Chi CHEN
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Publication number: 20230174709Abstract: A resin compound has a structure represented by a chemical formula (I): In the chemical formula (I), each R1 independently represents a C1-C20 alkylene group or a C7-C40 alkylarylene group, and R1 are the same or different from each other; n independently represents an integer of 1-4; each R2 independently represents a C1-C20 alkyl group or a C2-C20 terminal alkenyl group, and R2 are the same or different from each other. When at least one of R1 represents a C1-C20 alkylene group, at least one of R2 is a C2-C20 terminal alkenyl group.Type: ApplicationFiled: February 1, 2022Publication date: June 8, 2023Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Meei-Yu HSU, Chih-Hao LIN, Kai-Chi CHEN, Yi-Chun CHEN
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Patent number: 11319434Abstract: A block copolymer is provided. The block copolymer includes a first block including repeat units represented by formula (I), and a second block connected to the first block and including repeat units represented by formula (II) or (III). The disclosure also provides a method for preparing the block copolymer and a thin film structure including the same.Type: GrantFiled: December 31, 2019Date of Patent: May 3, 2022Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Meei-Yu Hsu, Yi-Chun Chen, Kai-Chi Chen
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Publication number: 20210198474Abstract: A block copolymer is provided. The block copolymer includes a first block including repeat units represented by formula (I), and a second block connected to the first block and including repeat units represented by formula (II) or (III). The disclosure also provides a method for preparing the block copolymer and a thin film structure including the same.Type: ApplicationFiled: December 31, 2019Publication date: July 1, 2021Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Meei-Yu HSU, Yi-Chun CHEN, Kai-Chi CHEN
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Patent number: 10584139Abstract: A multi-branched cationic phosphonium salt is provided. The multi-branched cationic phosphonium salt has a structure represented by formula (I): {Z[P+(R1)(R2)(R3)]n}(X?)n??(I) wherein each of R1, R2, and R3 is independently a linear or branched C1˜C10 alkyl group, X? is an organic or inorganic anion, and Z has a structure represented by Formula (IIb) or Formula (IIc): wherein a is an integer of 1˜15. In Formulas (IIb) and (IIc), Z is connected to [P+(R1)(R2)(R3)] at the position marked by an asterisk (*), and n is an integer of 3˜4.Type: GrantFiled: May 31, 2018Date of Patent: March 10, 2020Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Yi-Chun Chen, Meei-Yu Hsu, Ya-Huei Ho, Kai-Chi Chen
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Publication number: 20180346496Abstract: A multi-branched cationic phosphonium salt is provided. The multi-branched cationic phosphonium salt has a structure represented by formula (I): {Z[P+(R1)(R2)(R3)]n}(X?)n??(I) wherein each of R1, R2, and R3 is independently a linear or branched C1˜C10 alkyl group, X? is an organic or inorganic anion, and Z has a structure represented by Formula (IIb) or Formula (IIc): wherein a is an integer of 1˜15. In Formulas (IIb) and (IIc), Z is connected to [P+(R1)(R2)(R3)] at the position marked by an asterisk (*), and n is an integer of 3˜4.Type: ApplicationFiled: May 31, 2018Publication date: December 6, 2018Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Yi-Chun CHEN, Meei-Yu HSU, Ya-Huei HO, Kai-Chi CHEN
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Patent number: 8436068Abstract: A composition and a polymer are provided. The composition includes the polymer and a melamine derivative. The polymer has a formula of R is hydrogen, halide, alkyl group, alkoxyl group, haloalkyl group or nitro group. n is 1-5 of integer. x+y+z=1, x>0, y?0, z?0. The melamine derivative includes R1 is hydrogen, CqH2q+1, or m and q independently is 1-10 of integer. R2, R3 and R4 independently is hydrogen, halide, or C1-C54 alkyl group.Type: GrantFiled: April 26, 2011Date of Patent: May 7, 2013Assignee: Industrial Technology Research InstituteInventors: Feng-Yu Yang, Meei-Yu Hsu, Gue-Wuu Hwang, Po-Yuan Lo
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Publication number: 20120108697Abstract: A composition and a polymer are provided. The composition includes the polymer and a melamine derivative. The polymer has a formula of R is hydrogen, halide, alkyl group, alkoxyl group, haloalkyl group or nitro group. n is 1-5 of integer. x+y+z=1, x>0, y?0, z?0. The melamine derivative includes R1 is hydrogen, CqH2q+1, or m and q independently is 1-10 of integer. R2, R3 and R4 independently is hydrogen, halide, or C1-C54 alkyl group.Type: ApplicationFiled: April 26, 2011Publication date: May 3, 2012Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Feng-Yu Yang, Meei-Yu Hsu, Gue-Wuu Hwang, Po-Yuan Lo
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Patent number: 7932186Abstract: A method for fabricating an electronic device is provided. The method for fabricating the electrical device comprises providing a substrate. A patterned first self-assembled monolayer (SAM) and an adjacent patterned second SAM are formed on the substrate, wherein the patterned first SAM has a higher affinity then that of the patterned second SAM. A conductive, semiconductor or insulating material is dissolved or suspended in a solvent to form a solution. The solution is coated on the substrate. The solvent in the solution is removed to selectively form a patterned conductive, semiconductor or insulating layer on the patterned first SAM.Type: GrantFiled: April 3, 2008Date of Patent: April 26, 2011Assignee: Industrial Technology Research InstituteInventors: Kuo-Jui Chang, Meei-Yu Hsu, Feng-Yu Yang
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Publication number: 20100101651Abstract: A polymer solar cell is provided. The polymer solar cell includes a cathode and an anode, an active layer having a first surface and a second surface disposed between the cathode and the anode, and a titanium dioxide layer formed on one of the first and second surfaces of the active layer.Type: ApplicationFiled: December 8, 2008Publication date: April 29, 2010Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Ching-Yen WEI, Feng-Yu YANG, Meei-Yu HSU, Gue-Wuu HWANG, Yi-Ling CHEN
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Publication number: 20090155964Abstract: A method for fabricating an electronic device is provided. The method for fabricating the electrical device comprises providing a substrate. A patterned first self-assembled monolayer (SAM) and an adjacent patterned second SAM are formed on the substrate, wherein the patterned first SAM has a higher affinity then that of the patterned second SAM. A conductive, semiconductor or insulating material is dissolved or suspended in a solvent to form a solution. The solution is coated on the substrate. The solvent in the solution is removed to selectively form a patterned conductive, semiconductor or insulating layer on the patterned first SAM.Type: ApplicationFiled: April 3, 2008Publication date: June 18, 2009Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Kuo-Jui Chang, Meei-Yu Hsu, Feng-Yu Yang
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Publication number: 20050032997Abstract: A resin with low polydispersity index and a process for preparing the same. The process includes polymerizing at least one monomer with an initiator and a chain transfer reagent, wherein the monomer is an acrylate monomer having at least one ethylenically unsaturated bonds or norbornene derivatives. Furthermore, a photoresist composition containing the resin composition according to the present invention can increase pattern resolution in lithography process.Type: ApplicationFiled: November 14, 2003Publication date: February 10, 2005Inventors: Ting-Yu Lee, Choa-Ying Yu, Meei-Yu Hsu, Shian-Jy Wang, Ching Ting, Kuo-Chen Shih
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Patent number: 6774195Abstract: A catalyst composition and process for preparing norbornene-type homopolymers or copolymers. The norbornene-type homopolymers or copolymers can be prepared using an in-situ catalyst composition including: (a) a transition metal compound of ML4, wherein M is a Group 10 metal and L is a neutral electron donor ligand; (b) a hydrocarbyl halogen containing a double bond or a triple bond; and (c) a salt of a non or weakly coordinative anion that can replace a halogen bonded to a metal. The catalyst composition is in a mixing state of components (a), (b), and (c), or in a mixing state of a reaction product of components (a) and (b) together with component (c).Type: GrantFiled: July 2, 2002Date of Patent: August 10, 2004Assignee: Industrial Technology Research InstituteInventors: Ting-Yu Lee, Meei-Yu Hsu, Mei-Hua Wang
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Publication number: 20030162922Abstract: A catalyst composition and process for preparing norbornene-type homopolymers or copolymers. The norbornene-type homopolymers or copolymers can be prepared using an in-situ catalyst composition including: (a) a transition metal compound of ML4, wherein M is a Group 10 metal and L is a neutral electron donor ligand; (b) a hydrocarbyl halogen containing a double bond or a triple bond; and (c) a salt of a non or weakly coordinative anion that can replace a halogen bonded to a metal. The catalyst composition is in a mixing state of components (a), (b), and (c), or in a mixing state of a reaction product of components (a) and (b) together with component (c).Type: ApplicationFiled: July 2, 2002Publication date: August 28, 2003Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Ting-Yu Lee, Meei-Yu Hsu, Mei-Hua Wang