Patents by Inventor Megumi Aizawa

Megumi Aizawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220207508
    Abstract: An information processing device includes: a settlement request reception unit that receives a settlement request; an inquiry unit that inquires of an inquiry system in charge of permission determination for settlement using a first settlement method about the settlement permission determination related to the settlement request; a result acquisition unit that acquires a result of the settlement permission determination by the inquiry system; a settlement confirmation request reception unit that is able to receive settlement confirmation requests for inquiring about a settlement result related to the settlement request a plurality of times from a settlement request issuing source while awaiting the result of the settlement permission determination by the inquiry system; and an alternative processing start unit that starts alternative processing to the first settlement method at a timing at which a final settlement confirmation request is received among the settlement confirmation requests received by a first
    Type: Application
    Filed: December 10, 2021
    Publication date: June 30, 2022
    Applicant: Rakuten Group, Inc.
    Inventors: Tatsuya IKEDA, Hyojung Son, Yoshiro Matsuda, Megumi Aizawa
  • Patent number: 8912487
    Abstract: Observation using an FIB image is enabled without causing any damage to a designated region. To this end, an ion beam scanning-prohibited region is set in a sample by using an image acquired by a charged particle beam other than an ion beam, or an image prepared as external data as a peripheral image including the designated region of a sample. Thereafter, the image used to set the ion beam scanning-prohibited region is exactly superimposed on an FIB image acquired for regions except the ion beam scanning-prohibited region, thereby forming an image including the ion beam scanning-prohibited region on which ion beam scanning has not been performed.
    Type: Grant
    Filed: October 6, 2010
    Date of Patent: December 16, 2014
    Assignee: HItachi High-Technologies Corporation
    Inventors: Kunio Sakamoto, Megumi Aizawa, Satoshi Tomimatsu, Isamu Sekihara
  • Patent number: 8710464
    Abstract: Separation and the like of an excised specimen from a specimen are automatically performed. Marks for improving image recognition accuracy are provided in a region that becomes an excised specimen in a specimen and a region other than said region, or in a transfer means for transferring the excised specimen and a specimen holder capable of holding the excised specimen, and the relative movement of the excised specimen and the specimen, and the like are recognized with high accuracy by image recognition. In the sampling of a minute specimen using a focused ion beam, the detection of an end point of processing for separation of the excised specimen from the specimen, and the like are automatically performed. Thus, for example, unmanned specimen excision becomes possible, and preparation of a lot of specimens becomes possible.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: April 29, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuichi Madokoro, Tsuyoshi Onishi, Megumi Aizawa, Yukio Yoshizawa
  • Patent number: 8629394
    Abstract: An object of the present invention is to eliminate a distortion in an image even if there is an angular difference between the deflection direction of the charged particle beam and the tilt axis of a specimen, and to accurately observe and process the specimen. When the deflection direction of the charged particle beam is not parallel to the tilt axis of the specimen, the deflection rotation angle to the observation direction of the charged particle beam is determined, and the deflection pattern is changed. Thereby the distortion in the image is corrected. The deflection pattern is changed to a parallelogram. A distortion-free image is obtained even if the specimen is tilted, and the specimen can be observed and processed with high accuracy. This allows automatically recognizing the position correction mark to perform observation and processing after correcting the positional relation.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: January 14, 2014
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Yuichi Madokoro, Megumi Aizawa, Yukio Yoshizawa
  • Publication number: 20120211652
    Abstract: Observation using an FIB image is enabled without causing any damage to a designated region. To this end, an ion beam scanning-prohibited region is set in a sample by using an image acquired by a charged particle beam other than an ion beam, or an image prepared as external data as a peripheral image including the designated region of a sample. Thereafter, the image used to set the ion beam scanning-prohibited region is exactly superimposed on an FIB image acquired for regions except the ion beam scanning-prohibited region, thereby forming an image including the ion beam scanning-prohibited region on which ion beam scanning has not been performed.
    Type: Application
    Filed: October 6, 2010
    Publication date: August 23, 2012
    Inventors: Kunio Sakamoto, Megumi Aizawa, Satoshi Tomimatsu, Isamu Sekihara
  • Publication number: 20110309245
    Abstract: Separation and the like of an excised specimen from a specimen are automatically performed. Marks for improving image recognition accuracy are provided in a region that becomes an excised specimen in a specimen and a region other than said region, or in a transfer means for transferring the excised specimen and a specimen holder capable of holding the excised specimen, and the relative movement of the excised specimen and the specimen, and the like are recognized with high accuracy by image recognition. In the sampling of a minute specimen using a focused ion beam, the detection of an end point of processing for separation of the excised specimen from the specimen, and the like are automatically performed. Thus, for example, unmanned specimen excision becomes possible, and preparation of a lot of specimens becomes possible.
    Type: Application
    Filed: October 23, 2009
    Publication date: December 22, 2011
    Inventors: Yuichi Madokoro, Tsuyoshi Onishi, Megumi Aizawa, Yukio Yoshizawa
  • Publication number: 20110297826
    Abstract: An object of the present invention is to eliminate a distortion in an image even if there is an angular difference between the deflection direction of the charged particle beam and the tilt axis of a specimen, and to accurately observe and process the specimen. When the deflection direction of the charged particle beam is not parallel to the tilt axis of the specimen, the deflection rotation angle to the observation direction of the charged particle beam is determined, and the deflection pattern is changed. Thereby the distortion in the image is corrected. The deflection pattern is changed to a parallelogram. A distortion-free image is obtained even if the specimen is tilted, and the specimen can be observed and processed with high accuracy. This allows automatically recognizing the position correction mark to perform observation and processing after correcting the positional relation.
    Type: Application
    Filed: October 23, 2009
    Publication date: December 8, 2011
    Inventors: Yuichi Madokoro, Megumi Aizawa, Yukio Yoshizawa
  • Publication number: 20080203299
    Abstract: It is an object of this invention to improve contact precision and probe operability. This invention controls sample stage movement and probe movement on an observation image using a single coordinate system, thereby allowing positioning using a sample stage stop error as a probe control movement amount. This invention also figures out the position of the tip of a probe using the observation image and stores the coordinates of the probe at a reference position on the image. This invention facilitates precise probe contact operation to a sample position of the order of microns.
    Type: Application
    Filed: February 26, 2008
    Publication date: August 28, 2008
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Toshiaki Kozuma, Yukio Yoshizawa, Megumi Aizawa
  • Patent number: 6521890
    Abstract: When SIM image data D[n] of a mark is compared with reference SIM image data in calculating a displacement of machining position in the nth time, image data D[n−1] just before the nth time is employed as the reference image data and a position displacement of the image is obtained from matching processing of the two kinds of image data of D[n] and D[n−1] to calculate a displacement of machining position.
    Type: Grant
    Filed: July 1, 1999
    Date of Patent: February 18, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Tohru Ishitani, Tsuyoshi Ohnishi, Megumi Aizawa, Hiroji Iwata
  • Publication number: 20020092985
    Abstract: When SIM image data D[n] of a mark is compared with reference SIM image data in calculating a displacement of machining position in the nth time, image data D[n−1] just before the nth time is employed as the reference image data and a position displacement of the image is obtained from matching processing of the two kinds of image data of D[n] and D[n−1] to calculate a displacement of machining position.
    Type: Application
    Filed: July 1, 1999
    Publication date: July 18, 2002
    Inventors: TOHRU ISHITANI, TSUYOSHI OHNISHI, MEGUMI AIZAWA, HIROJI IWATA