Patents by Inventor Megumi ARAKAWA

Megumi ARAKAWA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Treatment composition for chemical mechanical polishing, chemical mechanical polishing method, and cleaning method
    Patent number: 10507563
    Abstract: Provided is a treatment composition for chemical mechanical polishing, for treating an object to be treated including a wiring layer containing a metal, the treatment composition for chemical mechanical polishing containing: (A) a nitrogen-containing compound; (B) at least one kind of compound selected from the group consisting of a surfactant and polyacrylic acid; and (D) a pH adjusting agent, in which in terms of electrode charge transfer resistance value obtained by AC impedance measurement using the metal for an electrode, a sum of electrode charge transfer resistance values RA+RB in aqueous solutions each containing the component (A) or (B) and the component (D), and an electrode charge transfer resistance value RC in an aqueous solution containing the components (A), (B), and (D) have a relationship of RC/(RA+RB)>1.
    Type: Grant
    Filed: March 30, 2016
    Date of Patent: December 17, 2019
    Assignee: JSR CORPORATION
    Inventors: Kiyotaka Mitsumoto, Tatsuyoshi Kawamoto, Tatsuya Yamanaka, Megumi Arakawa, Eiichirou Kunitani, Masashi Iida
  • TREATMENT COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, AND CLEANING METHOD
    Publication number: 20180111248
    Abstract: Provided is a treatment composition for chemical mechanical polishing, for treating an object to be treated including a wiring layer containing a metal, the treatment composition for chemical mechanical polishing containing: (A) a nitrogen-containing compound; (B) at least one kind of compound selected from the group consisting of a surfactant and polyacrylic acid; and (D) a pH adjusting agent, in which in terms of electrode charge transfer resistance value obtained by AC impedance measurement using the metal for an electrode, a sum of electrode charge transfer resistance values RA+RB in aqueous solutions each containing the component (A) or (B) and the component (D), and an electrode charge transfer resistance value RC in an aqueous solution containing the components (A), (B), and (D) have a relationship of RC/(RA+RB)>1.
    Type: Application
    Filed: March 30, 2016
    Publication date: April 26, 2018
    Applicant: JSR CORPORATION
    Inventors: Kiyotaka MITSUMOTO, Tatsuyoshi KAWAMOTO, Tatsuya YAMANAKA, Megumi ARAKAWA, Eiichirou KUNITANI, Masashi IIDA
  • Cleaning composition and cleaning method
    Patent number: 9920287
    Abstract: A cleaning composition includes (A) at least one compound selected from the group consisting of a fatty acid that includes a hydrocarbon group having 8 to 20 carbon atoms, a phosphonic acid that includes a hydrocarbon group having 3 to 20 carbon atoms, a sulfuric acid ester that includes a hydrocarbon group having 3 to 20 carbon atoms, an alkenylsuccinic acid that includes a hydrocarbon group having 3 to 20 carbon atoms, and salts thereof, (B) an organic acid, (C) a water-soluble amine, (D) a water-soluble polymer, and an aqueous medium, the cleaning composition having a pH of 9 or more.
    Type: Grant
    Filed: May 18, 2015
    Date of Patent: March 20, 2018
    Assignee: JSR CORPORATION
    Inventors: Takahiro Hayama, Megumi Arakawa, Yuki Kushida, Kiyotaka Mitsumoto, Yasutaka Kamei, Masahiro Noda, Tatsuya Yamanaka
  • CLEANING COMPOSITION AND CLEANING METHOD
    Publication number: 20150337245
    Abstract: A cleaning composition includes (A) at least one compound selected from the group consisting of a fatty acid that includes a hydrocarbon group having 8 to 20 carbon atoms, a phosphonic acid that includes a hydrocarbon group having 3 to 20 carbon atoms, a sulfuric acid ester that includes a hydrocarbon group having 3 to 20 carbon atoms, an alkenylsuccinic acid that includes a hydrocarbon group having 3 to 20 carbon atoms, and salts thereof, (B) an organic acid, (C) a water-soluble amine, (D) a water-soluble polymer, and an aqueous medium, the cleaning composition having a pH of 9 or more.
    Type: Application
    Filed: May 18, 2015
    Publication date: November 26, 2015
    Applicant: JSR Corporation
    Inventors: Takahiro HAYAMA, Megumi ARAKAWA, Yuki KUSHIDA, Kiyotaka MITSUMOTO, Yasutaka KAMEI, Masahiro NODA, Tatsuya YAMANAKA